JPH0235445B2 - - Google Patents
Info
- Publication number
- JPH0235445B2 JPH0235445B2 JP56091800A JP9180081A JPH0235445B2 JP H0235445 B2 JPH0235445 B2 JP H0235445B2 JP 56091800 A JP56091800 A JP 56091800A JP 9180081 A JP9180081 A JP 9180081A JP H0235445 B2 JPH0235445 B2 JP H0235445B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- photo
- exposed
- suction
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 21
- 238000012856 packing Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56091800A JPS57205728A (en) | 1981-06-15 | 1981-06-15 | Exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56091800A JPS57205728A (en) | 1981-06-15 | 1981-06-15 | Exposure device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57205728A JPS57205728A (en) | 1982-12-16 |
JPH0235445B2 true JPH0235445B2 (zh) | 1990-08-10 |
Family
ID=14036687
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56091800A Granted JPS57205728A (en) | 1981-06-15 | 1981-06-15 | Exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57205728A (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2750554B2 (ja) * | 1992-03-31 | 1998-05-13 | 日本電信電話株式会社 | 真空吸着装置 |
JP2009206235A (ja) * | 2008-02-27 | 2009-09-10 | Fuji Electric Holdings Co Ltd | 薄膜太陽電池の製造方法 |
JP4952764B2 (ja) * | 2009-10-19 | 2012-06-13 | 株式会社村田製作所 | 露光装置及び露光方法 |
DE102012111114B4 (de) | 2012-11-19 | 2018-10-04 | Ev Group E. Thallner Gmbh | Halbleiterbearbeitungsvorrichtung und -verfahren |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888871A (zh) * | 1972-02-02 | 1973-11-21 | ||
JPS52143771A (en) * | 1976-05-26 | 1977-11-30 | Hitachi Ltd | Aligning method for reticle datum plane |
JPS5617354A (en) * | 1979-07-20 | 1981-02-19 | Nec Corp | Reticle frame for semiconductor device |
-
1981
- 1981-06-15 JP JP56091800A patent/JPS57205728A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888871A (zh) * | 1972-02-02 | 1973-11-21 | ||
JPS52143771A (en) * | 1976-05-26 | 1977-11-30 | Hitachi Ltd | Aligning method for reticle datum plane |
JPS5617354A (en) * | 1979-07-20 | 1981-02-19 | Nec Corp | Reticle frame for semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS57205728A (en) | 1982-12-16 |
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