JPS57205728A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS57205728A
JPS57205728A JP56091800A JP9180081A JPS57205728A JP S57205728 A JPS57205728 A JP S57205728A JP 56091800 A JP56091800 A JP 56091800A JP 9180081 A JP9180081 A JP 9180081A JP S57205728 A JPS57205728 A JP S57205728A
Authority
JP
Japan
Prior art keywords
photomask
holes
mask
pins
window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56091800A
Other languages
English (en)
Other versions
JPH0235445B2 (ja
Inventor
Takashi Ariga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56091800A priority Critical patent/JPS57205728A/ja
Publication of JPS57205728A publication Critical patent/JPS57205728A/ja
Publication of JPH0235445B2 publication Critical patent/JPH0235445B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56091800A 1981-06-15 1981-06-15 Exposure device Granted JPS57205728A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56091800A JPS57205728A (en) 1981-06-15 1981-06-15 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56091800A JPS57205728A (en) 1981-06-15 1981-06-15 Exposure device

Publications (2)

Publication Number Publication Date
JPS57205728A true JPS57205728A (en) 1982-12-16
JPH0235445B2 JPH0235445B2 (ja) 1990-08-10

Family

ID=14036687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56091800A Granted JPS57205728A (en) 1981-06-15 1981-06-15 Exposure device

Country Status (1)

Country Link
JP (1) JPS57205728A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283511A (ja) * 1992-03-31 1993-10-29 Nippon Telegr & Teleph Corp <Ntt> 真空吸着装置
JP2009206235A (ja) * 2008-02-27 2009-09-10 Fuji Electric Holdings Co Ltd 薄膜太陽電池の製造方法
JP2011085859A (ja) * 2009-10-19 2011-04-28 Murata Mfg Co Ltd 露光装置及び露光方法
AT517637A5 (de) * 2012-11-19 2017-03-15 Ev Group E Thallner Gmbh Halbleiterbearbeitungsvorrichtung und -verfahren

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4888871A (ja) * 1972-02-02 1973-11-21
JPS52143771A (en) * 1976-05-26 1977-11-30 Hitachi Ltd Aligning method for reticle datum plane
JPS5617354A (en) * 1979-07-20 1981-02-19 Nec Corp Reticle frame for semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4888871A (ja) * 1972-02-02 1973-11-21
JPS52143771A (en) * 1976-05-26 1977-11-30 Hitachi Ltd Aligning method for reticle datum plane
JPS5617354A (en) * 1979-07-20 1981-02-19 Nec Corp Reticle frame for semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283511A (ja) * 1992-03-31 1993-10-29 Nippon Telegr & Teleph Corp <Ntt> 真空吸着装置
JP2009206235A (ja) * 2008-02-27 2009-09-10 Fuji Electric Holdings Co Ltd 薄膜太陽電池の製造方法
JP2011085859A (ja) * 2009-10-19 2011-04-28 Murata Mfg Co Ltd 露光装置及び露光方法
AT517637A5 (de) * 2012-11-19 2017-03-15 Ev Group E Thallner Gmbh Halbleiterbearbeitungsvorrichtung und -verfahren
US9653329B2 (en) 2012-11-19 2017-05-16 Ev Group E. Thallner Gmbh Semiconductor treating device and method
AT517637B1 (de) * 2012-11-19 2023-07-15 Ev Group E Thallner Gmbh Halbleiterbearbeitungsvorrichtung

Also Published As

Publication number Publication date
JPH0235445B2 (ja) 1990-08-10

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