JPS52126171A - X-ray exposing process for semiconductor substrate - Google Patents

X-ray exposing process for semiconductor substrate

Info

Publication number
JPS52126171A
JPS52126171A JP4189776A JP4189776A JPS52126171A JP S52126171 A JPS52126171 A JP S52126171A JP 4189776 A JP4189776 A JP 4189776A JP 4189776 A JP4189776 A JP 4189776A JP S52126171 A JPS52126171 A JP S52126171A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
exposing process
ray exposing
air
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4189776A
Other languages
Japanese (ja)
Inventor
Yasutaka Ban
Moritaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4189776A priority Critical patent/JPS52126171A/en
Publication of JPS52126171A publication Critical patent/JPS52126171A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To avoid troubles due to the remaining air by removing simultaneously air between a mask and a semiconductor substrate when removing air from the circumferences of the mask and semiconductor substrates.
JP4189776A 1976-04-15 1976-04-15 X-ray exposing process for semiconductor substrate Pending JPS52126171A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4189776A JPS52126171A (en) 1976-04-15 1976-04-15 X-ray exposing process for semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4189776A JPS52126171A (en) 1976-04-15 1976-04-15 X-ray exposing process for semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS52126171A true JPS52126171A (en) 1977-10-22

Family

ID=12621065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4189776A Pending JPS52126171A (en) 1976-04-15 1976-04-15 X-ray exposing process for semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS52126171A (en)

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