JPH0230180B2 - - Google Patents
Info
- Publication number
- JPH0230180B2 JPH0230180B2 JP59032856A JP3285684A JPH0230180B2 JP H0230180 B2 JPH0230180 B2 JP H0230180B2 JP 59032856 A JP59032856 A JP 59032856A JP 3285684 A JP3285684 A JP 3285684A JP H0230180 B2 JPH0230180 B2 JP H0230180B2
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- layer
- upper layer
- layer wirings
- lower layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3285684A JPS60176251A (ja) | 1984-02-23 | 1984-02-23 | 半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3285684A JPS60176251A (ja) | 1984-02-23 | 1984-02-23 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60176251A JPS60176251A (ja) | 1985-09-10 |
JPH0230180B2 true JPH0230180B2 (enrdf_load_stackoverflow) | 1990-07-04 |
Family
ID=12370479
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3285684A Granted JPS60176251A (ja) | 1984-02-23 | 1984-02-23 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60176251A (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5462767A (en) * | 1985-09-21 | 1995-10-31 | Semiconductor Energy Laboratory Co., Ltd. | CVD of conformal coatings over a depression using alkylmetal precursors |
US5317185A (en) * | 1990-11-06 | 1994-05-31 | Motorola, Inc. | Semiconductor device having structures to reduce stress notching effects in conductive lines and method for making the same |
KR970004922B1 (ko) * | 1993-07-27 | 1997-04-08 | 삼성전자 주식회사 | 고집적 반도체 배선구조 및 그 제조방법 |
JP2930025B2 (ja) * | 1996-08-29 | 1999-08-03 | 日本電気株式会社 | 半導体装置及びその製造方法 |
JP2010034236A (ja) * | 2008-07-28 | 2010-02-12 | Panasonic Corp | 固体撮像装置及びその製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5791523A (en) * | 1980-11-28 | 1982-06-07 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1984
- 1984-02-23 JP JP3285684A patent/JPS60176251A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60176251A (ja) | 1985-09-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |