JPH0228894B2 - - Google Patents

Info

Publication number
JPH0228894B2
JPH0228894B2 JP58118519A JP11851983A JPH0228894B2 JP H0228894 B2 JPH0228894 B2 JP H0228894B2 JP 58118519 A JP58118519 A JP 58118519A JP 11851983 A JP11851983 A JP 11851983A JP H0228894 B2 JPH0228894 B2 JP H0228894B2
Authority
JP
Japan
Prior art keywords
resin
semiconductor device
sealed semiconductor
sealed
wiring portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58118519A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6010645A (ja
Inventor
Hisaharu Sakurai
Seiichi Hirata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58118519A priority Critical patent/JPS6010645A/ja
Priority to DE8484107525T priority patent/DE3483498D1/de
Priority to EP84107525A priority patent/EP0130591B1/en
Publication of JPS6010645A publication Critical patent/JPS6010645A/ja
Priority to US06/894,508 priority patent/US4654692A/en
Publication of JPH0228894B2 publication Critical patent/JPH0228894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W20/427
    • H10W20/43
    • H10W74/137

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Formation Of Insulating Films (AREA)
JP58118519A 1983-06-30 1983-06-30 樹脂封止型半導体装置 Granted JPS6010645A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58118519A JPS6010645A (ja) 1983-06-30 1983-06-30 樹脂封止型半導体装置
DE8484107525T DE3483498D1 (de) 1983-06-30 1984-06-29 Halbleiteranordnung des harzverkapselungstyps.
EP84107525A EP0130591B1 (en) 1983-06-30 1984-06-29 Semiconductor device of resin-seal type
US06/894,508 US4654692A (en) 1983-06-30 1986-08-06 Semiconductor device of resin-seal type

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58118519A JPS6010645A (ja) 1983-06-30 1983-06-30 樹脂封止型半導体装置

Publications (2)

Publication Number Publication Date
JPS6010645A JPS6010645A (ja) 1985-01-19
JPH0228894B2 true JPH0228894B2 (enExample) 1990-06-27

Family

ID=14738627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58118519A Granted JPS6010645A (ja) 1983-06-30 1983-06-30 樹脂封止型半導体装置

Country Status (4)

Country Link
US (1) US4654692A (enExample)
EP (1) EP0130591B1 (enExample)
JP (1) JPS6010645A (enExample)
DE (1) DE3483498D1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61129014U (enExample) * 1985-01-30 1986-08-13
JPS6457732A (en) * 1987-08-28 1989-03-06 Matsushita Electronics Corp Semiconductor device
US4835591A (en) * 1987-12-29 1989-05-30 Mitsubishi Denki Kabushiki Kaisha Wiring arrangement for semiconductor devices
EP0327336B1 (en) * 1988-02-01 1997-12-10 Semiconductor Energy Laboratory Co., Ltd. Electronic devices incorporating carbon films
JPH0274039A (ja) * 1988-09-09 1990-03-14 Texas Instr Japan Ltd 電子回路装置
JPH02192146A (ja) * 1989-01-20 1990-07-27 Toshiba Corp 半導体装置
JPH03129738A (ja) * 1989-07-10 1991-06-03 Nec Corp 半導体装置
NL8901822A (nl) * 1989-07-14 1991-02-01 Philips Nv Geintegreerde schakeling met stroomdetectie.
US5317194A (en) * 1989-10-17 1994-05-31 Kabushiki Kaisha Toshiba Resin-sealed semiconductor device having intermediate silicon thermal dissipation means and embedded heat sink
US5289036A (en) * 1991-01-22 1994-02-22 Nec Corporation Resin sealed semiconductor integrated circuit
US5686356A (en) * 1994-09-30 1997-11-11 Texas Instruments Incorporated Conductor reticulation for improved device planarity
KR0170316B1 (ko) * 1995-07-13 1999-02-01 김광호 반도체 장치의 패드 설계 방법
JP3500308B2 (ja) 1997-08-13 2004-02-23 インターナショナル・ビジネス・マシーンズ・コーポレーション 集積回路
JP3826022B2 (ja) 2000-12-15 2006-09-27 キヤノン株式会社 配線を有する基板及び電子源及び画像表示装置
US20030122258A1 (en) * 2001-12-28 2003-07-03 Sudhakar Bobba Current crowding reduction technique using slots
US6818996B2 (en) * 2002-12-20 2004-11-16 Lsi Logic Corporation Multi-level redistribution layer traces for reducing current crowding in flipchip solder bumps
US7388279B2 (en) * 2003-11-12 2008-06-17 Interconnect Portfolio, Llc Tapered dielectric and conductor structures and applications thereof
US7466021B2 (en) * 2003-11-17 2008-12-16 Interconnect Portfolio, Llp Memory packages having stair step interconnection layers
US7253528B2 (en) * 2005-02-01 2007-08-07 Avago Technologies General Ip Pte. Ltd. Trace design to minimize electromigration damage to solder bumps
US9177914B2 (en) * 2012-11-15 2015-11-03 Taiwan Semiconductor Manufacturing Company, Ltd. Metal pad structure over TSV to reduce shorting of upper metal layer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3766448A (en) * 1972-02-04 1973-10-16 Gen Instrument Corp Integrated igfet circuits with increased inversion voltage under metallization runs
US4438450A (en) * 1979-11-30 1984-03-20 Bell Telephone Laboratories, Incorporated Solid state device with conductors having chain-shaped grain structure
JPS56150830A (en) * 1980-04-25 1981-11-21 Hitachi Ltd Semiconductor device
JPS5772349A (en) * 1980-10-23 1982-05-06 Nec Corp Semiconductor integrated circuit device
DE3115406A1 (de) * 1981-04-16 1982-11-25 Robert Bosch Gmbh, 7000 Stuttgart Anordnung zur erhoehung des ausgangsstroms von verstaerkern

Also Published As

Publication number Publication date
EP0130591A2 (en) 1985-01-09
EP0130591A3 (en) 1986-09-17
JPS6010645A (ja) 1985-01-19
US4654692A (en) 1987-03-31
DE3483498D1 (de) 1990-12-06
EP0130591B1 (en) 1990-10-31

Similar Documents

Publication Publication Date Title
JPH0228894B2 (enExample)
US4625227A (en) Resin molded type semiconductor device having a conductor film
US5371411A (en) Resin molded type semiconductor device having a conductor film
US5229642A (en) Resin molded type semiconductor device having a conductor film
JPH05226339A (ja) 樹脂封止半導体装置
US5552639A (en) Resin molded type semiconductor device having a conductor film
JPS6018934A (ja) 半導体装置
JP2567870B2 (ja) 半導体記憶装置
JPH08204066A (ja) 半導体装置
JP2533293B2 (ja) 樹脂封止型半導体装置の製造方法
JP3098333B2 (ja) 半導体装置
JPS6214944B2 (enExample)
JPH0815150B2 (ja) 樹脂封止型半導体装置の製造方法
JPS615562A (ja) 半導体装置
JPS6025902B2 (ja) 樹脂封止型半導体装置
JP2865224B2 (ja) 樹脂封止型半導体装置
JPS6148939A (ja) 樹脂封止型半導体装置
JPS6367751A (ja) 半導体装置
JPH0652735B2 (ja) 樹脂封止型半導体装置
JPH0345898B2 (enExample)
JPS62282453A (ja) 樹脂封止型半導体装置
JPH05299445A (ja) 樹脂封止型半導体装置
JPH065781A (ja) 半導体装置
JPS6079762A (ja) 電子装置
JPH05206137A (ja) 樹脂封止型半導体装置