JPH0225431B2 - - Google Patents

Info

Publication number
JPH0225431B2
JPH0225431B2 JP58166674A JP16667483A JPH0225431B2 JP H0225431 B2 JPH0225431 B2 JP H0225431B2 JP 58166674 A JP58166674 A JP 58166674A JP 16667483 A JP16667483 A JP 16667483A JP H0225431 B2 JPH0225431 B2 JP H0225431B2
Authority
JP
Japan
Prior art keywords
plating
powder
core material
aqueous suspension
electroless plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58166674A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6059070A (ja
Inventor
Hiroshi Kawakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP58166674A priority Critical patent/JPS6059070A/ja
Publication of JPS6059070A publication Critical patent/JPS6059070A/ja
Publication of JPH0225431B2 publication Critical patent/JPH0225431B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)
  • Chemically Coating (AREA)
JP58166674A 1983-09-12 1983-09-12 粉粒体メツキ品の製造法 Granted JPS6059070A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58166674A JPS6059070A (ja) 1983-09-12 1983-09-12 粉粒体メツキ品の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58166674A JPS6059070A (ja) 1983-09-12 1983-09-12 粉粒体メツキ品の製造法

Publications (2)

Publication Number Publication Date
JPS6059070A JPS6059070A (ja) 1985-04-05
JPH0225431B2 true JPH0225431B2 (zh) 1990-06-04

Family

ID=15835617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58166674A Granted JPS6059070A (ja) 1983-09-12 1983-09-12 粉粒体メツキ品の製造法

Country Status (1)

Country Link
JP (1) JPS6059070A (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61276979A (ja) * 1985-05-30 1986-12-06 Nippon Chem Ind Co Ltd:The ニッケルめっき材料の製造法
JPS62107073A (ja) * 1985-11-01 1987-05-18 Nippon Chem Ind Co Ltd:The 貴金属めっき材料の製造法
JPS6421082A (en) * 1987-07-15 1989-01-24 Nippon Chemical Ind Production of powdery plated material
JPH01225776A (ja) * 1988-03-07 1989-09-08 Mitsubishi Metal Corp 銀被覆球状フエノール樹脂粉末
JP5363989B2 (ja) 2007-10-22 2013-12-11 日本化学工業株式会社 被覆導電性粉体およびそれを用いた導電性接着剤。
JP5425636B2 (ja) 2007-10-22 2014-02-26 日本化学工業株式会社 被覆導電性粉体およびそれを用いた導電性接着剤
KR101586659B1 (ko) 2013-09-10 2016-01-20 한국기계연구원 고반응성 금속분말의 산화막 제어방법
JP6863170B2 (ja) * 2016-12-21 2021-04-21 住友金属鉱山株式会社 無電解めっき液のめっき処理時間の測定方法、無電解めっき液を評価するための試料を作製する試料作製方法、および無電解めっき液の評価方法
KR102568485B1 (ko) * 2020-12-30 2023-08-21 한국수력원자력 주식회사 원전 주제어실의 냉각을 위한 피동형 냉각장치

Also Published As

Publication number Publication date
JPS6059070A (ja) 1985-04-05

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