JPH0220211Y2 - - Google Patents

Info

Publication number
JPH0220211Y2
JPH0220211Y2 JP1985142056U JP14205685U JPH0220211Y2 JP H0220211 Y2 JPH0220211 Y2 JP H0220211Y2 JP 1985142056 U JP1985142056 U JP 1985142056U JP 14205685 U JP14205685 U JP 14205685U JP H0220211 Y2 JPH0220211 Y2 JP H0220211Y2
Authority
JP
Japan
Prior art keywords
chamber
film
sputtering
unwinding
roll
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1985142056U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6251172U (en, 2012
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985142056U priority Critical patent/JPH0220211Y2/ja
Publication of JPS6251172U publication Critical patent/JPS6251172U/ja
Application granted granted Critical
Publication of JPH0220211Y2 publication Critical patent/JPH0220211Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1985142056U 1985-09-19 1985-09-19 Expired JPH0220211Y2 (en, 2012)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985142056U JPH0220211Y2 (en, 2012) 1985-09-19 1985-09-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985142056U JPH0220211Y2 (en, 2012) 1985-09-19 1985-09-19

Publications (2)

Publication Number Publication Date
JPS6251172U JPS6251172U (en, 2012) 1987-03-30
JPH0220211Y2 true JPH0220211Y2 (en, 2012) 1990-06-01

Family

ID=31050422

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985142056U Expired JPH0220211Y2 (en, 2012) 1985-09-19 1985-09-19

Country Status (1)

Country Link
JP (1) JPH0220211Y2 (en, 2012)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0640589Y2 (ja) * 1987-11-24 1994-10-26 凸版印刷株式会社 真空蒸着装置
JP2010018828A (ja) * 2008-07-09 2010-01-28 Asahi Kasei E-Materials Corp 真空蒸着装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59173266A (ja) * 1983-03-23 1984-10-01 Fuji Photo Film Co Ltd 薄膜形成装置
JPS59173267A (ja) * 1983-03-23 1984-10-01 Fuji Photo Film Co Ltd 薄膜形成装置
JPS6067671A (ja) * 1983-09-24 1985-04-18 Anelva Corp 薄膜作成装置

Also Published As

Publication number Publication date
JPS6251172U (en, 2012) 1987-03-30

Similar Documents

Publication Publication Date Title
US6284382B1 (en) Antireflection film and manufacturing method thereof
CN104651791B (zh) 节能型柔性透明导电薄膜及其制备方法
US8236433B2 (en) Antireflection structure and manufacturing method thereof
CN204490985U (zh) 柔性透明导电薄膜及其制备装置
JPH0220211Y2 (en, 2012)
JP2002180247A (ja) 透明導電積層体の製造方法および製造装置
CN206127418U (zh) 一种用于柔性电子元件的卷对卷高真空溅镀系统
JPH0230444Y2 (en, 2012)
JPS62211378A (ja) スパツタ装置
JP4568994B2 (ja) ロールコーター式連続スパッタリング装置
JP2000192237A (ja) 高透明ガスバリア性フィルムの製造方法
US6667247B2 (en) Electrodes for electrolytic capacitors and production process thereof
JP4842416B2 (ja) 透明導電薄膜付きフィルムおよびその製造方法
JPH10160902A (ja) 反射防止膜及びその形成方法並びに形成装置
JP2001288562A (ja) シリコン化合物薄膜の被覆方法およびそれを用いて得られる物品
JP2000045063A (ja) 透明導電薄膜付きフィルムおよびその製造方法
JP3489844B2 (ja) 透明導電性フィルムおよびその製造方法
JPS62287074A (ja) ロ−ルコ−タ−装置
JPH01215969A (ja) 酸化タンタルの成膜方法
JP4553021B2 (ja) 反射防止膜およびその製造方法
JPS59173268A (ja) 薄膜形成装置
JP3240008B2 (ja) 酸化物薄膜の成膜方法
JPS62222518A (ja) 透明導電膜の製造方法
JPH03241617A (ja) 透明導電膜の形成方法
EP1045409A2 (en) Electrodes for electrolytic capacitors and production process thereof