JPH02114545A - ワイヤボンディング接続方法 - Google Patents

ワイヤボンディング接続方法

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Publication number
JPH02114545A
JPH02114545A JP63267509A JP26750988A JPH02114545A JP H02114545 A JPH02114545 A JP H02114545A JP 63267509 A JP63267509 A JP 63267509A JP 26750988 A JP26750988 A JP 26750988A JP H02114545 A JPH02114545 A JP H02114545A
Authority
JP
Japan
Prior art keywords
pellet
bonding
wire
ball
bond
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63267509A
Other languages
English (en)
Inventor
Toshihiro Kato
加藤 俊博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
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Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP63267509A priority Critical patent/JPH02114545A/ja
Publication of JPH02114545A publication Critical patent/JPH02114545A/ja
Pending legal-status Critical Current

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    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
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    • H01L2224/0554External layer
    • H01L2224/05599Material
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    • H01L2224/05617Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 [発明の目的]] 〈産業上の利用分野) 本発明は、半導体装置のペレット−ペレットボンディン
グ(pellet to pellet bondin
q )における、信頼性を損なわない接続方法に関する
ものである。
(従来の技術) 従来、ペレットからペレットへのワイヤボンディングに
は、通常、ボール・ウェッジ・ボンディング(単にポー
ルボンディングとも呼ばれる)が使用されているが、こ
の場合のボンディングを第3図に示す。
第3図において、1つの半導体装置内に第一ペレット1
及び第二ペレット2がリードフレームのそれぞれの電極
板31.32上に半田材31a32aにより接合されて
いる。 それぞれのペレット1,2上面にはAltiパ
ッドが形成されており、それらを接続する金属細線4に
は、Au線、Ai線、Cu線などが用いられるが、−a
的にはAu線が多く用いられている。 第1ボンドであ
る第一ペレット1の電極パッドでは、トーチで溶融して
金属細線4の一端に形成された金属ボール4aが押し付
けられること(ポールボンディング)によって接合し、
第2ボンドである第二ペレット2の″th極パッドでは
、金属細線4の他@4bが超音波振動と押し付は荷重を
利用すること(ウエツジボンディング)によって接合が
行われる。 第2ボンド側のウェッジボンディング終了
後、ボンダ(図示せず)のツールが金属細線他端4bを
抑えた状態でボンダのワイヤクランプが金属細線4を引
張り切断(グルカット)して、次の接続をするボンディ
ングの準備が始まる。
上記従来のペレット−ペレットボンディングにおいては
、下記のような問題点があるが、それを第3図における
第2ボンド側の破線円■部分を拡大した断面図である第
4図を参照して説明する。
第4図において、2は第二ペレット、5aは酸化膜であ
って、酸化膜5a上にはA1電極パッド6か形成されて
おり、電極パッド6を露出してさらに絶縁M5bが被覆
されている。 4bは前記金属細線4のfl!!端で、
電極パッド6にウェッジボンディングされている。
(1)従来のペレット−ペレットボンディングにおいて
、All線を用いたボール・ウェッジ・ボンディングを
行うと、特に高温放置寿命試験(例えば、150℃で1
000〜2000時間)において、All線の第2ボン
ド部分にAu−Al金属間化合物4C(網掛は部分)の
形成による接続部劣化(Allと金属間化合物境界部に
発生するマイクロクラック4dによるオープン現象)を
生じる。
〈2)金属細線4としてA1線を用いた場合は、A1電
極パッド6との間に形成される金属間化合物による劣化
の問題はないが、封止にプラスチックパッケージが使用
されるとき、A1線では200μl程度以上のワイヤを
用いないと温度サイクルテスト等の環境試験に合格しな
い、 ところが、集積回路では、一般に25〜50μt
の金a細線を用いることが多いため、A1線の適用が困
難である。
(3)従来のペレット−ペレットボンディングでは、第
二ペレット上にウェッジ・ボンディングをすることにな
るが、第2ボンド部分でウェッジボンドのf!I撃によ
り、第二へレッ!へにダメージを与えることがあった。
(発明が解決しようとする課題) 本発明の目的は、ペレット−ペレットボンディングにお
いて、特にウェッジボンディングされる第2ボンド側の
接合問題点を解決し、特に高温放置寿命において十分な
信頼性を有するワイヤボンディング接続方法を提供する
ことである。
[発明の構成] (課題を解決するための手段と作用) 本発明のワイヤボンディング接続方法は、半導体装置の
ペレットからペレットへ金属細線をボール・ウェッジ・
ボンディングをする場合において、第2ボンド側のペレ
ットにおけるボンディング箇所に、あらかじめ金属ボー
ルを形成させた後に、第1ボンド側のペレットにおける
ボンディング箇所に金属細線一端のボールボンディング
を行い、続いて第2ボンド側の前記金属ボール上に金属
細線他端のウェッジボンディングを行うことを特徴とす
る。
ベレヅトーペレットボンディングにおいて信頼性上問題
となるウェッジボンディング(第2ボンド側)部分にあ
らかじめ金属ボールを形成させておくことにより、第2
ボンド側のYs ’ffiff上に対する接合特性は、
該電極パッド上に形成した金属ボールによって第1ボン
ド側と同水準になるとともに、金属細線は同じ金属の金
属ボール上にウェッジボンディングなされるから、全体
として高温放置寿命を改善することになる。
(実施例) 以下、第1図(a>及び(b)を参照して本発明の詳細
な説明する。 両図において、第3図と同じ符号を用い
た部分は、従来例の部分と変りないことを示す。
第1図(a)に示すように、第二ペレット2の第2ボン
ドしようとするA1電極パッド上にあらかじめ、Auボ
ール7を形成しておく、  Auボール7の形成は、ポ
ールボンディングと同様に、ボンダにおけるAll線の
一端をトーチで溶融してAUボールを形成し、これを電
極パッドに押し付けて接合した後、Au線をプルカット
することにより形成させることができる。 次に、再度
ボンダのAu線に金属ボールを形成し、これを第1図(
b)に示すように、第一ペレット1の第1ボンドに金属
細線8の一端8aを常法によりポールボンディングを行
い、第二ペレット2の第2ボンドでは、先に形成したA
llボール7にAll線の他端8bをウェッジボンディ
ングすることにより、接続を行った。
実施例の半導体装置を従来例の半導体装置と対照させて
、高温放置寿命試験を行ったところ、実施例は有意に優
れていることが確認された。 なお、Au線以外にCu
線を用いても、同様に該寿命試験に潰れたボンディング
を行うことができる。
ペレット−ペレットボンディング以外に、例えばCOB
 (chip on board )などパッケージの
インナリードのボンダビリティが悪い場合にも、あらか
じめそのインナリードにAuボールを形成しておくこと
によって、ウェッジボンディングが容易になる。
第2図はガラスエポキシ銅張積層板を用いたCOBに適
用した場合を示す、 同図において、ガラスエポキシ基
板10上のパターン化されたCU導体11a、llbに
は、厚さ0.1μnのAuメツキ層12a、t2bが形
成されている。  導体パターンllaのAllメツキ
#12aiにはペレット1がマウントされ、一方、導体
パターン11bは厚さ0.1μnのAtlメツキ層12
bの形成されたインナリードとなっている。  そこで
、まず、インナリードのメツキ層12b上の第2ボンド
箇所にはAuボール17が形成され、しかる後に、金属
細線8の一端8aを、ペレット1の電極パッドにボール
ボンディングし、その他端8bを、Auボール17上に
ウェッジボンディングする。
従来インナリード上に直接ウェッジボンディングすると
きには、インナリードのメツキ層12bを1μm程度に
厚く付けなければならなかったが、あらかじめAuボー
ル17を形成するようにすれば、0.1μmという薄い
メツキ層でよく、コストダウンが可能となる。
[発明の効果] (1)従来のようにウェッジボンディング部のAu−A
l金属間化合物生成による信頼性劣化問題を解決できた
(2)第2ボンド側ウエツジボンデイング箇所に、あら
かじめボールボンディングを作っておくため、ウェッジ
ボンディング時の機械的衝撃力を緩和できる。
以上により、従来のペレットを用いてペレットペレット
のボンディングの信頼性を向上することができた。
その他、COBのガラスエポキシ基板等に適用すれば、
より薄いAllメツ−1i−厚で良好なボンディング接
続が可能となった。
【図面の簡単な説明】
第1図(a)及び(b)は本発明のワイヤボンディング
接続方法を示す正面図、第2図は本発明に関連する参考
例のワイヤボンディング接続方法を示す正面図、第3図
は従来のワイヤボンディング接続方法を示す正面図、第
4図は第3図における破線円IV部分を拡大して従来方
法の課題を示した断面図である。 1・・・第1ボンド側ペレツト、 2・・・第2ボンド
側ペレツト、 4.8・・・金属細線、4a 、8a・
・・ボールボンディング端、 4b 、8b・・・ウェ
ッジボンディング端、 6・・・電極パッド、 7.1
7・・・金属ボール、  llb・・・インナリード、
12b・・・Auメツキ層。

Claims (1)

    【特許請求の範囲】
  1. 1 半導体装置のペレットからペレットへ金属細線をボ
    ール・ウェッジ・ボンディングをする場合において、第
    2ボンド側のペレットにおけるボンディング箇所に、あ
    らかじめ金属ボールを形成させた後に、第1ボンド側の
    ペレットにおけるボンディング箇所に金属細線−端のボ
    ールボンディングを行い、続いて第2ボンド側の前記金
    属ボール上に金属細線他端のウェッジボンディングを行
    うことを特徴とするワイヤボンディング接続方法。
JP63267509A 1988-10-24 1988-10-24 ワイヤボンディング接続方法 Pending JPH02114545A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63267509A JPH02114545A (ja) 1988-10-24 1988-10-24 ワイヤボンディング接続方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63267509A JPH02114545A (ja) 1988-10-24 1988-10-24 ワイヤボンディング接続方法

Publications (1)

Publication Number Publication Date
JPH02114545A true JPH02114545A (ja) 1990-04-26

Family

ID=17445830

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH02114545A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04294552A (ja) * 1991-03-25 1992-10-19 Matsushita Electron Corp ワイヤーボンディング方法
JPH05160192A (ja) * 1991-12-06 1993-06-25 Toshiba Corp 半導体製造装置
US6079610A (en) * 1996-10-07 2000-06-27 Denso Corporation Wire bonding method
EP1065712A1 (en) * 1999-06-28 2001-01-03 Sumitomo Electric Industries, Ltd. Method of wire bonding in semiconductor device
US6601752B2 (en) 2000-03-13 2003-08-05 Denso Corporation Electronic part mounting method
JP2005294874A (ja) * 2005-07-06 2005-10-20 Nippon Steel Corp ワイヤをウェッジ接合した半導体装置及び金合金ボンディングワイヤ

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55118643A (en) * 1979-03-06 1980-09-11 Toshiba Corp Wire bonding process
JPS6041236A (ja) * 1983-08-17 1985-03-04 Nec Corp 電子部品の接続方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55118643A (en) * 1979-03-06 1980-09-11 Toshiba Corp Wire bonding process
JPS6041236A (ja) * 1983-08-17 1985-03-04 Nec Corp 電子部品の接続方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04294552A (ja) * 1991-03-25 1992-10-19 Matsushita Electron Corp ワイヤーボンディング方法
JPH05160192A (ja) * 1991-12-06 1993-06-25 Toshiba Corp 半導体製造装置
US5292050A (en) * 1991-12-06 1994-03-08 Kabushuki Kaisha Toshiba Wire bonder
US6079610A (en) * 1996-10-07 2000-06-27 Denso Corporation Wire bonding method
EP1065712A1 (en) * 1999-06-28 2001-01-03 Sumitomo Electric Industries, Ltd. Method of wire bonding in semiconductor device
US6426563B1 (en) 1999-06-28 2002-07-30 Sumitomo Electric Industries Semiconductor device and method for manufacturing the same
US6784090B2 (en) 1999-06-28 2004-08-31 Sumitomo Electric Industries, Ltd. Semiconductor device and method for manufacturing the same
US6601752B2 (en) 2000-03-13 2003-08-05 Denso Corporation Electronic part mounting method
JP2005294874A (ja) * 2005-07-06 2005-10-20 Nippon Steel Corp ワイヤをウェッジ接合した半導体装置及び金合金ボンディングワイヤ

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