JP2005531137A - 部分的にパターン形成したリードフレームならびに半導体パッケージングにおけるその製造および使用の方法 - Google Patents
部分的にパターン形成したリードフレームならびに半導体パッケージングにおけるその製造および使用の方法 Download PDFInfo
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- JP2005531137A JP2005531137A JP2004510023A JP2004510023A JP2005531137A JP 2005531137 A JP2005531137 A JP 2005531137A JP 2004510023 A JP2004510023 A JP 2004510023A JP 2004510023 A JP2004510023 A JP 2004510023A JP 2005531137 A JP2005531137 A JP 2005531137A
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- chip
- lead frame
- film
- lead
- partially patterned
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Abstract
【解決手段】 これは、製造工程段階の主要部分を、一方の側がウェブのようなリードフレームに形成された、部分的にパターン形成した金属ストリップ(100)で行うことによって、達成される。チップ(140)とワイヤ(160)とを含む表側が気密封止されて初めて、金属リードフレームの底側はパターニングされて、チップパッドおよびワイヤボンド接点(113)を絶縁する。結果として得られる絶縁されたパッケージによって、さらなる金属を切断する必要もなく、ストリップテストおよび高い信頼性の個片切断が可能である。
Description
本発明は包括的には電子パッケージングに関し、より詳細には、部分的にパターン形成したリードフレームならびにその製造および使用の方法に関する。部分的にパターン形成したリードフレームは、従来のリードフレームよりも強度が高く安定している。部分的にパターン形成したリードフレームは頑丈なので、リードフレームパッケージの製造工程が改良され、最終製品全体の信頼性が向上する。
リードフレームを用いる電子パッケージの製造において、リードフレームに機械的応力および熱応力をかける工程段階がいくつかある。今日のリードフレームは幾何学的形状がより精密になり、半導体チップ上の回路は絶えず集積化が進んでいるということが、リードフレームにいっそう大きな応力をかける処理をもたらした。精密に構成したリードフレームは、容易に湾曲、破断、変形、および歪曲してしまう非常に繊細な刺繍やステンシル状の金属構造に似ていることが多い。(図1aおよび図1bを参照されたい)。そのような従来のリードフレームが業界において用いられて、ワイヤボンディング接続の(wire bonded)パッケージおよびフリップチップ(FC)パッケージを含む、さまざまなチップパッケージが作成される。(図2a〜図2dおよび図3a〜図3bを参照されたい)。
本発明は、半導体パッケージングにおいて用いる部分的にパターン形成したリードフレームを提供する。リードフレームは、頂面と底面とを有するフィルム(film)から成っている。フィルムの第1の領域は、頂面から部分的にパターン形成されるが、フィルムを底面まで完全に貫くわけではない。フィルムの、頂面からパターン形成されない第2の領域は、集積回路(IC)チップを支持するチップ収容区域およびICチップに電気接続を行う複数のリード接点(contacts)を形成する。第1の領域は、フィルムにトレンチを形成し、頂面から部分的にパターン形成されない第2の領域を相互接続するウェブ状の構造を作成する。本発明はまた、部分的にパターン形成したリードフレームおよびそのリードフレームを利用して製造される電子パッケージの製造方法にも関する。本発明のリードフレームは、そのウェブのようなすなわちウェブ状の構造のために、構造的剛性が改善されている。
図4〜図15bおよび図16〜図24bは、リード部の総数が近チップ(near-chip)スケールパッケージ(CSP)のそれに匹敵する、部分的にパターン形成したリードフレームパッケージを形成する、種々の実施形態を示す。本発明の方法は、製造ラインの自動化ならびにそこから製造されるパッケージの品質および信頼性を改善する。これは、製造工程段階の主要部分を、一方の側がウェブのようなリードフレームに形成された、部分的にパターン形成した金属フィルムで行うことによって、達成される。ステンシル状のリードフレームを貫いて従来の方法でパンチングするのとは対照的に、本発明において用いるリードフレームは、一方の側が部分的にパターン形成され、他方の側が堅く平らである。この構成は機械的にも熱的にも改良されたものであり、チップ取付工程、ワイヤボンド工程、および封入工程中に、変形または歪曲なしに機能する。チップ取付工程段階とワイヤボンディング工程段階とが完了し、チップとワイヤボンドとをモールド材料内に貼り、気密封入した後に、フィルムを完全に貫いて底面をエッチングし、リード接点を、チップパッドからおよび互いから絶縁する。その後、結果として生じる封止したパッケージを、さらなる金属を切断する必要もなく、個片切断する。
Claims (49)
- 電子パッケージの製造において用いる部分的にパターン形成したリードフレームであって、
頂面と底面とを有するフィルム
を備え、
該フィルムは、前記頂面からしかし前記底面まで完全に貫くわけではなく部分的にパターン形成される、第1の領域を有し、
前記フィルムは、前記頂面から部分的にパターン形成されない第2の領域を有し、該第2の領域は、集積回路(IC)チップを支持するチップ収容区域および前記ICチップへの電気接続を行う複数の電気リード部を形成し、
前記第1の領域は、頂面からパターン形成されない前記第2の領域と相互接続させるウェブ状の構造を形成する
部分的にパターン形成したリードフレーム。 - 前記フィルムは銅またはその(its)銅合金を含む、請求項1に記載の部分的にパターン形成したリードフレーム。
- 前記フィルムは厚さが約0.05mm以上である、請求項1に記載の部分的にパターン形成したリードフレーム。
- 前記頂面はフリップチップ取付け用に裸銅である、請求項1に記載の部分的にパターン形成したリードフレーム。
- 前記頂面はボンディング可能材料で予めめっきされる、請求項1に記載の部分的にパターン形成したリードフレーム。
- 前記ボンディング可能材料はNi/Pd/AuのストライクまたはAgを含む、請求項5に記載の部分的にパターン形成したリードフレーム。
- 前記底面は組立後のめっき用に、または仕上げの浸漬めっき用に裸銅である、請求項1に記載の部分的にパターン形成したリードフレーム。
- 前記底面ははんだ付け可能材料で予めめっきされる、請求項1に記載の部分的にパターン形成したリードフレーム。
- 前記はんだ付け可能材料は、Sn/Pb、鉛フリーはんだ、浸漬スズ、無電解ニッケル、またはAuストライクを含む、請求項8に記載の部分的にパターン形成したリードフレーム。
- 前記フィルムは打ち抜き加工によって部分的にパターン形成される、請求項1に記載の部分的にパターン形成したリードフレーム。
- 前記フィルムはエッチングによって部分的にパターン形成される、請求項1に記載の部分的にパターン形成したリードフレーム。
- 前記第1の領域は、封止剤の接着を改善する粗面又は固着部を有する内部垂直壁を有する、請求項1に記載の部分的にパターン形成したリードフレーム。
- 部分的にパターン形成したリードフレームを形成する方法であって、
頂面と底面とを有するフィルムを形成する段階と、
第1の領域において、前記フィルムを前記頂面からしかし前記フィルムの前記底面を完全に貫くわけではなく部分的にパターン形成することであって、それによって、前記頂面から部分的にパターン形成されない第2の領域を相互接続するウェブ状の構造を形成する、部分的にパターン形成する段階と
を含み、
前記第2の領域は、チップ収容区域を有し集積回路(IC)チップを支持するとともに複数の電気リード部を有し前記ICチップへの電気接続を行う段階とを有する
方法。 - 前記フィルムは銅およびその合金を含む、請求項13に記載の方法。
- 前記フィルムは厚さが約0.05mm以上である、請求項13に記載の方法。
- 前記部分的にパターン形成する段階は、前記フィルムの厚さの約25%から90%を除去することを含む、請求項13に記載の方法。
- 前記フィルムの前記頂面を、特にワイヤボンディング用に予めめっきする段階をさらに含む、請求項13に記載の方法。
- 前記フィルムの前記底面を、特にワイヤボンディング用に予めめっきする段階をさらに含む、請求項13に記載の方法。
- 前記フィルムの前記頂面と前記底面とを予めめっきする段階をさらに含む、請求項13に記載の方法。
- 前記頂面を予めめっきする段階は、ワイヤボンディング可能材料を用いることを含む、請求項17または請求項19に記載の方法。
- 前記ボンディング可能材料はNi/Pd/AuまたはAgを含む、請求項20に記載の方法。
- 前記底面を予めめっきする段階は、はんだ付け可能材料を用いることを含む、請求項18または請求項19に記載の方法。
- 前記はんだ付け可能材料は、Sn/Pb、鉛フリーはんだ、浸漬スズ、無電解ニッケル、またはAuストライクである、請求項22に記載の方法。
- 前記第1の領域は、他の材料と係合する時にかみ合う表面を形成する、形状が不規則な露出した垂直壁を有する、請求項13に記載の方法。
- 前記チップ収容区域は、フリップチップのはんだバンプ接合に対応する、前記電気リード部の端部を備える、請求項13に記載の方法。
- 部分的にパターン形成したリードフレームを用いて複数の電子パッケージを形成する方法であって、
頂面と底面とを有するフィルムを設ける段階と、
第1の領域において、前記フィルムを前記頂面からしかし前記底面まで完全に貫くわけではなく部分的にパターン形成する段階であって、前記頂面から部分的にパターン形成されない第2の領域を前記フィルム上に残し、前記第2の領域は、それぞれ集積回路(IC)チップを支持するチップ収容区域および前記ICチップへの電気接続を行う複数の電気リード部を有する、複数の部分的にパターン形成したリードフレームを形成する、部分的にパターン形成する段階と、
なお、前記第1の領域は、それぞれの前記リードフレームの前記チップ収容区域と電気リード部とを相互接続するウェブ状の構造を形成し、前記フィルムのストリート部分において、前記複数のリードフレームを互いに接続する段階と、
対応するリードフレームに取り付ける複数の電気端子をそれぞれ有する、複数のチップを設ける段階と、
それぞれの前記チップを、対応するリードフレーム上の前記チップ収容区域に取り付ける段階と、
それぞれの前記チップの少なくとも1つの前記端子と前記リードフレームの前記電気リード部のうちの1つとの間に電気接続を形成する段階と、
前記フィルムの前記リードフレームと前記ストリート部分とを覆って封止剤材料を塗布することによって、前記リードフレームを封入する段階と、
前記第1の領域において前記フィルムの前記底面からバックパターン形成する段階であって、それによって、前記フィルムの前記ウェブ状の構造と前記ストリート部分とを除去する、バックパターン形成する段階と、
前記フィルムの前記ストリート部分を覆って配置された前記封止剤材料を個片切断する段階であって、それによって、個々のチップスケールパッケージを形成する、個片切断する段階と
を含む方法。 - それぞれの前記チップは半導体チップである、請求項26に記載の方法。
- 前記チップを取り付ける段階は、エポキシ樹脂を用いて前記チップをチップパッドにバックボンディング接続することによって行われ、それによって、エッチングしたリードフレームパッケージ(ELP)を形成する、請求項26に記載の方法。
- 前記相互接続を形成する段階は、ワイヤボンディング技法を用いることによって行われる、請求項26に記載の方法。
- 前記チップを取り付ける段階は、前記チップ上の前記端子を、前記チップ収容区域へと延びる前記3本の電気リード部の端部に接続することによって行われ、それによって、フリップチップを有するELP(ELPF)を形成する、請求項26に記載の方法。
- 前記電気接続を形成する段階は、前記チップ上の前記端子を、前記チップ収容区域へと延びる前記電気リード部の端部に接続することによって行われる、請求項26に記載の方法。
- 前記封止剤材料は樹脂である、請求項26に記載の方法。
- それぞれの前記リードフレームは、露出した垂直壁を有する第1の領域をさらに備え、前記封止剤材料は前記露出した垂直壁とかみ合う、請求項26に記載の方法。
- それぞれの前記パッケージの底面は、前記電気リード部を二次的接続部品(attachment)に接続する電気コネクタを有して形成される、請求項26に記載の方法。
- 前記複数のリードフレームは、ブロック/ウインドウのパターンのマトリクスで置かれる、請求項26に記載の方法。
- 前記パッケージはチップスケールパッケージである、請求項26に記載の方法。
- 超音波ボンディング接続のワイヤを有する電子パッケージの形成方法であって、
部分的にエッチングしたリードフレームのブロックを形成する段階であって、ウェブ状の部分を備えストリート部分によって互いに分離された前記リードフレームは底面を有する、ブロックを形成する段階と、
対応するリードフレーム上のチップ収容区域にチップを取り付ける段階と、
それぞれの前記チップの端子と、前記対応するリードフレームの電気リード部部分との間に、電気接続を形成する段階と、
前記リードフレームの前記底面に、超音波を用いてワイヤをボンディングする段階と、
前記リードフレームと該リードフレーム同士を分離する前記ストリート部分とを覆って封止剤材料を塗布することによって、前記リードフレームを封入する段階と、
前記底面のバックパターン形成を行う段階であって、それによって、前記ウェブ状の部分および前記ストリート部分を除去し、バックパターン形成を行う段階と、
前記ストリート部分の上に配設された前記封止剤材料を個片切断する段階であって、それによって、前記底面上にワイヤを有する個々のチップスケールパッケージを形成し、個片切断する段階と
を含む方法。 - 前記リードフレームは銅または銅合金でできたフィルムを備える、請求項1に記載の方法。
- 前記リードフレームは打ち抜き加工または圧印加工によって形成される、請求項1に記載の方法。
- 銅でできた前記フィルムは、厚さが約0.05mm以上である、請求項2に記載の方法。
- 前記チップは半導体デバイスを備える、請求項1に記載の方法。
- 前記チップを取り付ける段階は、エポキシ樹脂を用いて前記チップを前記チップ収容区域にバンクボンディング接続することによって行われる、請求項1に記載の方法。
- 前記チップを取り付ける段階は、はんだペーストを用いて前記チップを前記チップ収容区域にバックボンディング接続することによって行われる、請求項1に記載の方法。
- 前記電気接続を形成する段階はワイヤボンディング技法を用いて行われる、請求項1に記載の方法。
- 前記電気接続を形成する段階は、前記チップ上の前記端子を、前記チップ区域へと延びる前記電気リード部の端部に接続することによって行われる、請求項1に記載の方法。
- 前記超音波ボンディング接続のワイヤはアルミニウムのワイヤを含む、請求項1に記載の方法。
- 前記封止剤材料は樹脂である、請求項1に記載の方法。
- 前記バックパターン形成はエッチングによって行われる、請求項1に記載の方法。
- 前記個片切断する段階は、前記封止剤をスライスすることによって行われる、請求項1に記載の方法。
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US10/134,882 US6812552B2 (en) | 2002-04-29 | 2002-04-29 | Partially patterned lead frames and methods of making and using the same in semiconductor packaging |
US10/342,732 US6777265B2 (en) | 2002-04-29 | 2003-01-15 | Partially patterned lead frames and methods of making and using the same in semiconductor packaging |
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EP (1) | EP1500130A1 (ja) |
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KR (1) | KR100789348B1 (ja) |
CN (1) | CN100380614C (ja) |
AU (1) | AU2003239183A1 (ja) |
TW (1) | TWI239054B (ja) |
WO (1) | WO2003103038A1 (ja) |
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2003
- 2003-04-28 KR KR1020047017388A patent/KR100789348B1/ko not_active IP Right Cessation
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- 2003-04-28 AU AU2003239183A patent/AU2003239183A1/en not_active Abandoned
- 2003-04-28 JP JP2004510023A patent/JP2005531137A/ja active Pending
- 2003-04-28 EP EP03733901A patent/EP1500130A1/en not_active Withdrawn
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JP2009131144A (ja) * | 2007-11-21 | 2009-06-11 | Gem Services Inc | 双方向逆阻止バッテリスイッチ |
JP2011096892A (ja) * | 2009-10-30 | 2011-05-12 | Mitsui High Tec Inc | 半導体装置の製造方法 |
KR101411894B1 (ko) | 2012-10-23 | 2014-06-25 | 주식회사 엠디티 | 전기 소자-패키지 유닛 제조 방법 및 그 방법에 사용되는 패키지 세트 조립체 |
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TW200405480A (en) | 2004-04-01 |
TWI239054B (en) | 2005-09-01 |
CN100380614C (zh) | 2008-04-09 |
EP1500130A1 (en) | 2005-01-26 |
WO2003103038A1 (en) | 2003-12-11 |
KR100789348B1 (ko) | 2007-12-28 |
AU2003239183A1 (en) | 2003-12-19 |
CN1650410A (zh) | 2005-08-03 |
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