JPH0159522B2 - - Google Patents

Info

Publication number
JPH0159522B2
JPH0159522B2 JP54057126A JP5712679A JPH0159522B2 JP H0159522 B2 JPH0159522 B2 JP H0159522B2 JP 54057126 A JP54057126 A JP 54057126A JP 5712679 A JP5712679 A JP 5712679A JP H0159522 B2 JPH0159522 B2 JP H0159522B2
Authority
JP
Japan
Prior art keywords
wavelength
wafer
laser beam
optical system
reflected light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54057126A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55149829A (en
Inventor
Nobuyuki Akyama
Yoshimasa Ooshima
Mitsuyoshi Koizumi
Yoshitada Oshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5712679A priority Critical patent/JPS55149829A/ja
Publication of JPS55149829A publication Critical patent/JPS55149829A/ja
Publication of JPH0159522B2 publication Critical patent/JPH0159522B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP5712679A 1979-05-11 1979-05-11 Detector for foreign matter in wafer Granted JPS55149829A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5712679A JPS55149829A (en) 1979-05-11 1979-05-11 Detector for foreign matter in wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5712679A JPS55149829A (en) 1979-05-11 1979-05-11 Detector for foreign matter in wafer

Publications (2)

Publication Number Publication Date
JPS55149829A JPS55149829A (en) 1980-11-21
JPH0159522B2 true JPH0159522B2 (enrdf_load_stackoverflow) 1989-12-18

Family

ID=13046862

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5712679A Granted JPS55149829A (en) 1979-05-11 1979-05-11 Detector for foreign matter in wafer

Country Status (1)

Country Link
JP (1) JPS55149829A (enrdf_load_stackoverflow)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57128834A (en) * 1981-02-04 1982-08-10 Nippon Kogaku Kk <Nikon> Inspecting apparatus of foreign substance
JPS5887819A (ja) * 1981-11-20 1983-05-25 Hitachi Ltd マスクパタ−ン欠陥検査装置
JPS5982727A (ja) * 1982-11-04 1984-05-12 Hitachi Ltd 異物検出方法及びその装置
JPS60220940A (ja) * 1983-05-20 1985-11-05 Hitachi Ltd 異物自動検査装置
JPS61104658A (ja) * 1984-10-29 1986-05-22 Hitachi Ltd 半導体固体撮像素子アレイ
JPS61104659A (ja) * 1984-10-29 1986-05-22 Hitachi Ltd 半導体固体撮像素子アレイ
US4740079A (en) * 1984-10-29 1988-04-26 Hitachi, Ltd. Method of and apparatus for detecting foreign substances
JPH0743322B2 (ja) * 1985-07-19 1995-05-15 株式会社日立製作所 検査方法および装置
JPS6270738A (ja) * 1985-09-25 1987-04-01 Hitachi Electronics Eng Co Ltd 異物検出方法
JPS6270739A (ja) * 1985-09-25 1987-04-01 Hitachi Electronics Eng Co Ltd 異物検査装置
JPH0641920B2 (ja) * 1986-12-18 1994-06-01 株式会社日立製作所 異物検出方法およびその装置
JPH0715441B2 (ja) * 1989-11-27 1995-02-22 株式会社日立製作所 異物検出方法及びその装置
JP3699776B2 (ja) * 1996-04-02 2005-09-28 株式会社日立製作所 電子部品の製造方法
JP3671822B2 (ja) 2000-07-26 2005-07-13 株式会社日立製作所 欠陥検査方法および欠陥検査システム
US7480050B2 (en) * 2006-02-09 2009-01-20 Asml Netherlands B.V. Lithographic system, sensor, and method of measuring properties of a substrate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154688A (en) * 1976-06-18 1977-12-22 Nippon Steel Corp Detection of faults on surface of metal plate moving at high speed

Also Published As

Publication number Publication date
JPS55149829A (en) 1980-11-21

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