JPH0523620B2 - - Google Patents

Info

Publication number
JPH0523620B2
JPH0523620B2 JP60211644A JP21164485A JPH0523620B2 JP H0523620 B2 JPH0523620 B2 JP H0523620B2 JP 60211644 A JP60211644 A JP 60211644A JP 21164485 A JP21164485 A JP 21164485A JP H0523620 B2 JPH0523620 B2 JP H0523620B2
Authority
JP
Japan
Prior art keywords
polarized
polarized light
foreign object
level
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60211644A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6270738A (ja
Inventor
Toshiaki Yanai
Ryoji Nemoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP21164485A priority Critical patent/JPS6270738A/ja
Publication of JPS6270738A publication Critical patent/JPS6270738A/ja
Publication of JPH0523620B2 publication Critical patent/JPH0523620B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP21164485A 1985-09-25 1985-09-25 異物検出方法 Granted JPS6270738A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21164485A JPS6270738A (ja) 1985-09-25 1985-09-25 異物検出方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21164485A JPS6270738A (ja) 1985-09-25 1985-09-25 異物検出方法

Publications (2)

Publication Number Publication Date
JPS6270738A JPS6270738A (ja) 1987-04-01
JPH0523620B2 true JPH0523620B2 (enrdf_load_stackoverflow) 1993-04-05

Family

ID=16609194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21164485A Granted JPS6270738A (ja) 1985-09-25 1985-09-25 異物検出方法

Country Status (1)

Country Link
JP (1) JPS6270738A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011001687A1 (ja) * 2009-07-01 2011-01-06 株式会社日立ハイテクノロジーズ 欠陥検査方法およびその装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5835220A (en) * 1995-10-27 1998-11-10 Nkk Corporation Method and apparatus for detecting surface flaws
KR101346492B1 (ko) * 2003-10-27 2013-12-31 가부시키가이샤 니콘 패턴 검사장치 및 패턴 검사방법
FR2878041B1 (fr) * 2004-11-18 2007-10-26 Eads Astrium Sas Soc Par Actio Dispositif de separation optique et terminal de communication optique comprenant un tel dispositif
JP2008096430A (ja) * 2006-09-13 2008-04-24 Hitachi High-Technologies Corp 欠陥検査方法およびその装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52138183A (en) * 1976-05-14 1977-11-18 Toshiba Corp Inspecting apparatus for flaw
JPS55149829A (en) * 1979-05-11 1980-11-21 Hitachi Ltd Detector for foreign matter in wafer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011001687A1 (ja) * 2009-07-01 2011-01-06 株式会社日立ハイテクノロジーズ 欠陥検査方法およびその装置
JP2011013077A (ja) * 2009-07-01 2011-01-20 Hitachi High-Technologies Corp 欠陥検査方法およびその装置

Also Published As

Publication number Publication date
JPS6270738A (ja) 1987-04-01

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