JPH054026B2 - - Google Patents

Info

Publication number
JPH054026B2
JPH054026B2 JP17838386A JP17838386A JPH054026B2 JP H054026 B2 JPH054026 B2 JP H054026B2 JP 17838386 A JP17838386 A JP 17838386A JP 17838386 A JP17838386 A JP 17838386A JP H054026 B2 JPH054026 B2 JP H054026B2
Authority
JP
Japan
Prior art keywords
inspected
laser
hold instruction
laser oscillator
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP17838386A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6336135A (ja
Inventor
Toshiaki Yanai
Ryoji Nemoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP17838386A priority Critical patent/JPS6336135A/ja
Publication of JPS6336135A publication Critical patent/JPS6336135A/ja
Publication of JPH054026B2 publication Critical patent/JPH054026B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP17838386A 1986-07-29 1986-07-29 表面検査装置 Granted JPS6336135A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17838386A JPS6336135A (ja) 1986-07-29 1986-07-29 表面検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17838386A JPS6336135A (ja) 1986-07-29 1986-07-29 表面検査装置

Publications (2)

Publication Number Publication Date
JPS6336135A JPS6336135A (ja) 1988-02-16
JPH054026B2 true JPH054026B2 (enrdf_load_stackoverflow) 1993-01-19

Family

ID=16047531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17838386A Granted JPS6336135A (ja) 1986-07-29 1986-07-29 表面検査装置

Country Status (1)

Country Link
JP (1) JPS6336135A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024134724A1 (ja) * 2022-12-19 2024-06-27 株式会社日立ハイテク 光学式異物検査装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01263540A (ja) * 1988-04-15 1989-10-20 Hitachi Ltd パターン検出装置
JP4797005B2 (ja) 2007-09-11 2011-10-19 株式会社日立ハイテクノロジーズ 表面検査方法及び表面検査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024134724A1 (ja) * 2022-12-19 2024-06-27 株式会社日立ハイテク 光学式異物検査装置

Also Published As

Publication number Publication date
JPS6336135A (ja) 1988-02-16

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