JPS6336135A - 表面検査装置 - Google Patents

表面検査装置

Info

Publication number
JPS6336135A
JPS6336135A JP17838386A JP17838386A JPS6336135A JP S6336135 A JPS6336135 A JP S6336135A JP 17838386 A JP17838386 A JP 17838386A JP 17838386 A JP17838386 A JP 17838386A JP S6336135 A JPS6336135 A JP S6336135A
Authority
JP
Japan
Prior art keywords
inspected
laser
polarized
laser beam
level
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17838386A
Other languages
English (en)
Japanese (ja)
Other versions
JPH054026B2 (enrdf_load_stackoverflow
Inventor
Toshiaki Taniuchi
谷内 俊明
Ryoji Nemoto
亮二 根本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP17838386A priority Critical patent/JPS6336135A/ja
Publication of JPS6336135A publication Critical patent/JPS6336135A/ja
Publication of JPH054026B2 publication Critical patent/JPH054026B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP17838386A 1986-07-29 1986-07-29 表面検査装置 Granted JPS6336135A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17838386A JPS6336135A (ja) 1986-07-29 1986-07-29 表面検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17838386A JPS6336135A (ja) 1986-07-29 1986-07-29 表面検査装置

Publications (2)

Publication Number Publication Date
JPS6336135A true JPS6336135A (ja) 1988-02-16
JPH054026B2 JPH054026B2 (enrdf_load_stackoverflow) 1993-01-19

Family

ID=16047531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17838386A Granted JPS6336135A (ja) 1986-07-29 1986-07-29 表面検査装置

Country Status (1)

Country Link
JP (1) JPS6336135A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01263540A (ja) * 1988-04-15 1989-10-20 Hitachi Ltd パターン検出装置
JP2009068903A (ja) * 2007-09-11 2009-04-02 Hitachi High-Technologies Corp 表面検査方法及び表面検査装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024134724A1 (ja) * 2022-12-19 2024-06-27 株式会社日立ハイテク 光学式異物検査装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01263540A (ja) * 1988-04-15 1989-10-20 Hitachi Ltd パターン検出装置
JP2009068903A (ja) * 2007-09-11 2009-04-02 Hitachi High-Technologies Corp 表面検査方法及び表面検査装置
US7671980B2 (en) 2007-09-11 2010-03-02 Hitachi High-Technologies Corporation Surface inspection method and surface inspection apparatus
US7872742B2 (en) 2007-09-11 2011-01-18 Hitachi High-Technologies Corporation Surface inspection method and surface inspection apparatus
US8160352B2 (en) 2007-09-11 2012-04-17 Hitachi High-Technologies Corporation Surface inspection method and surface inspection apparatus

Also Published As

Publication number Publication date
JPH054026B2 (enrdf_load_stackoverflow) 1993-01-19

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