JPH0153451B2 - - Google Patents

Info

Publication number
JPH0153451B2
JPH0153451B2 JP57004327A JP432782A JPH0153451B2 JP H0153451 B2 JPH0153451 B2 JP H0153451B2 JP 57004327 A JP57004327 A JP 57004327A JP 432782 A JP432782 A JP 432782A JP H0153451 B2 JPH0153451 B2 JP H0153451B2
Authority
JP
Japan
Prior art keywords
component
weight
photosensitive material
photosensitive
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57004327A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58122533A (ja
Inventor
Kotaro Nagasawa
Kunio Morikubo
Masaki Okuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Priority to JP57004327A priority Critical patent/JPS58122533A/ja
Publication of JPS58122533A publication Critical patent/JPS58122533A/ja
Publication of JPH0153451B2 publication Critical patent/JPH0153451B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
JP57004327A 1982-01-14 1982-01-14 感光性材料 Granted JPS58122533A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57004327A JPS58122533A (ja) 1982-01-14 1982-01-14 感光性材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57004327A JPS58122533A (ja) 1982-01-14 1982-01-14 感光性材料

Publications (2)

Publication Number Publication Date
JPS58122533A JPS58122533A (ja) 1983-07-21
JPH0153451B2 true JPH0153451B2 (cg-RX-API-DMAC7.html) 1989-11-14

Family

ID=11581350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57004327A Granted JPS58122533A (ja) 1982-01-14 1982-01-14 感光性材料

Country Status (1)

Country Link
JP (1) JPS58122533A (cg-RX-API-DMAC7.html)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63303343A (ja) * 1987-06-03 1988-12-09 Konica Corp 感光性組成物及び感光性平版印刷版
DE3817009A1 (de) * 1988-05-19 1989-11-30 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefmustern
JP2849623B2 (ja) * 1989-08-15 1999-01-20 コニカ株式会社 画像形成方法
JPH03223858A (ja) * 1990-01-30 1991-10-02 Matsushita Electric Ind Co Ltd パターン形成方法
JPH04158363A (ja) * 1990-10-22 1992-06-01 Mitsubishi Electric Corp パターン形成用レジスト材料
US5372912A (en) * 1992-12-31 1994-12-13 International Business Machines Corporation Radiation-sensitive resist composition and process for its use
US6004720A (en) 1993-12-28 1999-12-21 Fujitsu Limited Radiation sensitive material and method for forming pattern
JP4615673B2 (ja) * 2000-05-16 2011-01-19 コダック株式会社 ポジ型感光性組成物及びポジ型感光性平版印刷版
TW554250B (en) * 2000-12-14 2003-09-21 Clariant Int Ltd Resist with high resolution to i ray and process for forming pattern
JP2008191218A (ja) * 2007-02-01 2008-08-21 Tokyo Ohka Kogyo Co Ltd 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
WO2022255171A1 (ja) * 2021-06-02 2022-12-08 昭和電工株式会社 ポジ型感光性樹脂組成物、及び有機ｅｌ素子隔壁

Also Published As

Publication number Publication date
JPS58122533A (ja) 1983-07-21

Similar Documents

Publication Publication Date Title
US3890152A (en) Light-sensitive copying composition containing diazo resin and quinone diazide
JPS64690B2 (cg-RX-API-DMAC7.html)
JPH0213293B2 (cg-RX-API-DMAC7.html)
JPH0858264A (ja) 親水性を付与した基材およびそれを使用して製造した記録材料
JPH029337B2 (cg-RX-API-DMAC7.html)
JPH0256653B2 (cg-RX-API-DMAC7.html)
JP3023570B2 (ja) 感光性平版印刷版支持体
JPH0153451B2 (cg-RX-API-DMAC7.html)
JPH0315176B2 (cg-RX-API-DMAC7.html)
US3715210A (en) Lithographic printing plates
US3634086A (en) Solvent development of light-sensitive diazo layers
JPS60143345A (ja) ポジ型平版印刷版材料
JPS62109042A (ja) 感光性組成物およびポジ型感光性平版印刷版
JP2551948B2 (ja) 感光性平版印刷版
JP2003107692A (ja) カルボン酸コポリマーベースの、放射感受性ポジ型コーティング組成物
GB2043281A (en) Producing photosensitive lithographic printing plates
JPS62133461A (ja) 感光性平版印刷版材料
JPH02186352A (ja) 界面活性剤で処理された感光性平版印刷版
JPH02276688A (ja) 感光性平版印刷版
JPS60123846A (ja) 平版印刷版材料
JPH05221177A (ja) 感光性平版印刷版
JP2000037963A (ja) 感光性平版印刷版の製造法
JPH1069069A (ja) 感光性平版印刷版の製造方法
JPS59192250A (ja) 平版印刷版材料及びその製造方法
JPH02158738A (ja) 感光性平版印刷版