JPS58122533A - 感光性材料 - Google Patents

感光性材料

Info

Publication number
JPS58122533A
JPS58122533A JP57004327A JP432782A JPS58122533A JP S58122533 A JPS58122533 A JP S58122533A JP 57004327 A JP57004327 A JP 57004327A JP 432782 A JP432782 A JP 432782A JP S58122533 A JPS58122533 A JP S58122533A
Authority
JP
Japan
Prior art keywords
component
photosensitive material
copolymer
parts
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57004327A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0153451B2 (cg-RX-API-DMAC7.html
Inventor
Kotaro Nagasawa
長澤　孝太郎
Kunio Morikubo
森久保　邦男
Masaki Okuyama
正樹 奥山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Somar Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp, Somar Manufacturing Co Ltd filed Critical Somar Corp
Priority to JP57004327A priority Critical patent/JPS58122533A/ja
Publication of JPS58122533A publication Critical patent/JPS58122533A/ja
Publication of JPH0153451B2 publication Critical patent/JPH0153451B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
JP57004327A 1982-01-14 1982-01-14 感光性材料 Granted JPS58122533A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57004327A JPS58122533A (ja) 1982-01-14 1982-01-14 感光性材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57004327A JPS58122533A (ja) 1982-01-14 1982-01-14 感光性材料

Publications (2)

Publication Number Publication Date
JPS58122533A true JPS58122533A (ja) 1983-07-21
JPH0153451B2 JPH0153451B2 (cg-RX-API-DMAC7.html) 1989-11-14

Family

ID=11581350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57004327A Granted JPS58122533A (ja) 1982-01-14 1982-01-14 感光性材料

Country Status (1)

Country Link
JP (1) JPS58122533A (cg-RX-API-DMAC7.html)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63303343A (ja) * 1987-06-03 1988-12-09 Konica Corp 感光性組成物及び感光性平版印刷版
JPH0218564A (ja) * 1988-05-19 1990-01-22 Basf Ag 感放射線混合物及びレリーフパターン作製方法
JPH0373952A (ja) * 1989-08-15 1991-03-28 Konica Corp 画像形成方法
JPH03223858A (ja) * 1990-01-30 1991-10-02 Matsushita Electric Ind Co Ltd パターン形成方法
JPH04158363A (ja) * 1990-10-22 1992-06-01 Mitsubishi Electric Corp パターン形成用レジスト材料
JPH06266106A (ja) * 1992-12-31 1994-09-22 Internatl Business Mach Corp <Ibm> 放射線感受性レジスト組成物及びその使用
JP2001324808A (ja) * 2000-05-16 2001-11-22 Mitsubishi Chemicals Corp ポジ型感光性組成物及びポジ型感光性平版印刷版
WO2002048793A1 (fr) * 2000-12-14 2002-06-20 Clariant International Ltd. Composition de résine photosensible à haute résolution pouvant être utilisée avec un rayon i et procédé de formation de motif
US6790589B2 (en) 1993-12-28 2004-09-14 Fujitsu Limited Radiation sensitive material and method for forming pattern
JP2008191218A (ja) * 2007-02-01 2008-08-21 Tokyo Ohka Kogyo Co Ltd 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
WO2022255171A1 (ja) * 2021-06-02 2022-12-08 昭和電工株式会社 ポジ型感光性樹脂組成物、及び有機ｅｌ素子隔壁

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63303343A (ja) * 1987-06-03 1988-12-09 Konica Corp 感光性組成物及び感光性平版印刷版
JPH0218564A (ja) * 1988-05-19 1990-01-22 Basf Ag 感放射線混合物及びレリーフパターン作製方法
JPH0373952A (ja) * 1989-08-15 1991-03-28 Konica Corp 画像形成方法
JPH03223858A (ja) * 1990-01-30 1991-10-02 Matsushita Electric Ind Co Ltd パターン形成方法
JPH04158363A (ja) * 1990-10-22 1992-06-01 Mitsubishi Electric Corp パターン形成用レジスト材料
JPH06266106A (ja) * 1992-12-31 1994-09-22 Internatl Business Mach Corp <Ibm> 放射線感受性レジスト組成物及びその使用
US7179580B2 (en) 1993-12-28 2007-02-20 Fujitsu Limited Radiation sensitive material and method for forming pattern
US7465529B2 (en) 1993-12-28 2008-12-16 Fujitsu Limited Radiation sensitive material and method for forming pattern
US6790589B2 (en) 1993-12-28 2004-09-14 Fujitsu Limited Radiation sensitive material and method for forming pattern
JP2001324808A (ja) * 2000-05-16 2001-11-22 Mitsubishi Chemicals Corp ポジ型感光性組成物及びポジ型感光性平版印刷版
US6806019B2 (en) 2000-12-14 2004-10-19 Clariant Finance (Bvi) Limited High-resolution photosensitive resin composition usable with i-line and method of forming pattern
KR100857042B1 (ko) * 2000-12-14 2008-09-05 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤 ｉ선 대응 고해상 감광성 수지 조성물 및 패턴 형성방법
WO2002048793A1 (fr) * 2000-12-14 2002-06-20 Clariant International Ltd. Composition de résine photosensible à haute résolution pouvant être utilisée avec un rayon i et procédé de formation de motif
JP2008191218A (ja) * 2007-02-01 2008-08-21 Tokyo Ohka Kogyo Co Ltd 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
WO2022255171A1 (ja) * 2021-06-02 2022-12-08 昭和電工株式会社 ポジ型感光性樹脂組成物、及び有機ｅｌ素子隔壁

Also Published As

Publication number Publication date
JPH0153451B2 (cg-RX-API-DMAC7.html) 1989-11-14

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