JPH0128935B2 - - Google Patents

Info

Publication number
JPH0128935B2
JPH0128935B2 JP57065006A JP6500682A JPH0128935B2 JP H0128935 B2 JPH0128935 B2 JP H0128935B2 JP 57065006 A JP57065006 A JP 57065006A JP 6500682 A JP6500682 A JP 6500682A JP H0128935 B2 JPH0128935 B2 JP H0128935B2
Authority
JP
Japan
Prior art keywords
photosensitive
film
solution
mercaptobenzothiazole
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57065006A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58182633A (ja
Inventor
Hisashi Nakane
Akira Yokota
Takashi Komine
Cho Yamamoto
Koichiro Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP6500682A priority Critical patent/JPS58182633A/ja
Publication of JPS58182633A publication Critical patent/JPS58182633A/ja
Publication of JPH0128935B2 publication Critical patent/JPH0128935B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP6500682A 1982-04-19 1982-04-19 ポジ型画像の形成方法 Granted JPS58182633A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6500682A JPS58182633A (ja) 1982-04-19 1982-04-19 ポジ型画像の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6500682A JPS58182633A (ja) 1982-04-19 1982-04-19 ポジ型画像の形成方法

Publications (2)

Publication Number Publication Date
JPS58182633A JPS58182633A (ja) 1983-10-25
JPH0128935B2 true JPH0128935B2 (en, 2012) 1989-06-06

Family

ID=13274467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6500682A Granted JPS58182633A (ja) 1982-04-19 1982-04-19 ポジ型画像の形成方法

Country Status (1)

Country Link
JP (1) JPS58182633A (en, 2012)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658529B2 (ja) * 1983-08-17 1994-08-03 三菱化成株式会社 ポジ型クレゾ−ルノボラツクフオトレジスト組成物
JPS60125841A (ja) * 1983-12-12 1985-07-05 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS61219951A (ja) * 1985-03-27 1986-09-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性組成物
JPH0650393B2 (ja) * 1985-07-30 1994-06-29 日本合成ゴム株式会社 ポジ型放射線感応性組成物
JPH0654386B2 (ja) * 1986-03-28 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
JPH0654389B2 (ja) * 1986-06-23 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
WO2008078622A1 (ja) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法
JP5593678B2 (ja) * 2009-11-10 2014-09-24 デクセリアルズ株式会社 キノンジアジド系感光剤溶液及びポジ型レジスト組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5747875A (en) * 1980-09-02 1982-03-18 Matsushita Electric Ind Co Ltd Resist composition
JPS5748733A (en) * 1980-09-08 1982-03-20 Fuji Photo Film Co Ltd Photosensitive lithographic plate

Also Published As

Publication number Publication date
JPS58182633A (ja) 1983-10-25

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