JPH0228139B2 - - Google Patents
Info
- Publication number
- JPH0228139B2 JPH0228139B2 JP57032926A JP3292682A JPH0228139B2 JP H0228139 B2 JPH0228139 B2 JP H0228139B2 JP 57032926 A JP57032926 A JP 57032926A JP 3292682 A JP3292682 A JP 3292682A JP H0228139 B2 JPH0228139 B2 JP H0228139B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- film
- containing compound
- quinonediazide group
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3292682A JPS58149042A (ja) | 1982-03-02 | 1982-03-02 | ポジ型感光性組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3292682A JPS58149042A (ja) | 1982-03-02 | 1982-03-02 | ポジ型感光性組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58149042A JPS58149042A (ja) | 1983-09-05 |
JPH0228139B2 true JPH0228139B2 (en, 2012) | 1990-06-21 |
Family
ID=12372508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3292682A Granted JPS58149042A (ja) | 1982-03-02 | 1982-03-02 | ポジ型感光性組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58149042A (en, 2012) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61219951A (ja) * | 1985-03-27 | 1986-09-30 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性組成物 |
JP2791032B2 (ja) * | 1988-03-28 | 1998-08-27 | 株式会社東芝 | ポジ型レジスト組成物 |
JPH07207188A (ja) * | 1993-12-15 | 1995-08-08 | Minnesota Mining & Mfg Co <3M> | 光硬化性組成物 |
TW546540B (en) | 1997-04-30 | 2003-08-11 | Wako Pure Chem Ind Ltd | An agent for reducing the substrate dependence of resist and a resist composition |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3661582A (en) * | 1970-03-23 | 1972-05-09 | Western Electric Co | Additives to positive photoresists which increase the sensitivity thereof |
JPS6038863B2 (ja) * | 1980-06-22 | 1985-09-03 | フア−イ−ストエンジニアリング株式会社 | 電解コンデンサの電解液含浸方法及び装置 |
-
1982
- 1982-03-02 JP JP3292682A patent/JPS58149042A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58149042A (ja) | 1983-09-05 |
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