JPS6244255B2 - - Google Patents
Info
- Publication number
- JPS6244255B2 JPS6244255B2 JP53131929A JP13192978A JPS6244255B2 JP S6244255 B2 JPS6244255 B2 JP S6244255B2 JP 53131929 A JP53131929 A JP 53131929A JP 13192978 A JP13192978 A JP 13192978A JP S6244255 B2 JPS6244255 B2 JP S6244255B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- photosensitive
- image
- exposure
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13192978A JPS5559455A (en) | 1978-10-25 | 1978-10-25 | Image formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13192978A JPS5559455A (en) | 1978-10-25 | 1978-10-25 | Image formation method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5559455A JPS5559455A (en) | 1980-05-02 |
JPS6244255B2 true JPS6244255B2 (en, 2012) | 1987-09-18 |
Family
ID=15069499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13192978A Granted JPS5559455A (en) | 1978-10-25 | 1978-10-25 | Image formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5559455A (en, 2012) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63217566A (ja) * | 1987-03-05 | 1988-09-09 | Fujitsu Ltd | デイスクカ−トリツジ搬送モ−タ駆動方式 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5635130A (en) * | 1979-08-31 | 1981-04-07 | Fujitsu Ltd | Resist material and method for forming resist pattern |
JPS57112744A (en) * | 1980-12-29 | 1982-07-13 | Fujitsu Ltd | Photoresist |
JPS6235350A (ja) * | 1985-08-07 | 1987-02-16 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 像反転に有用な保存寿命の長いフオトレジスト |
JPS62245251A (ja) * | 1986-04-18 | 1987-10-26 | Fujitsu Ltd | レジストパタ−ン形成方法 |
NL8601096A (nl) * | 1986-04-29 | 1987-11-16 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak. |
JPS6355540A (ja) * | 1986-08-26 | 1988-03-10 | Agency Of Ind Science & Technol | 光学記録媒体 |
-
1978
- 1978-10-25 JP JP13192978A patent/JPS5559455A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63217566A (ja) * | 1987-03-05 | 1988-09-09 | Fujitsu Ltd | デイスクカ−トリツジ搬送モ−タ駆動方式 |
Also Published As
Publication number | Publication date |
---|---|
JPS5559455A (en) | 1980-05-02 |
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