JPH0118152B2 - - Google Patents

Info

Publication number
JPH0118152B2
JPH0118152B2 JP61172997A JP17299786A JPH0118152B2 JP H0118152 B2 JPH0118152 B2 JP H0118152B2 JP 61172997 A JP61172997 A JP 61172997A JP 17299786 A JP17299786 A JP 17299786A JP H0118152 B2 JPH0118152 B2 JP H0118152B2
Authority
JP
Japan
Prior art keywords
gas
outlet valve
flow rate
valve
reaction vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP61172997A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6328875A (ja
Inventor
Takuji Nagira
Isamu Morisako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Priority to JP17299786A priority Critical patent/JPS6328875A/ja
Publication of JPS6328875A publication Critical patent/JPS6328875A/ja
Publication of JPH0118152B2 publication Critical patent/JPH0118152B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Flow Control (AREA)
  • Chemical Vapour Deposition (AREA)
JP17299786A 1986-07-23 1986-07-23 ガス導入方法 Granted JPS6328875A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17299786A JPS6328875A (ja) 1986-07-23 1986-07-23 ガス導入方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17299786A JPS6328875A (ja) 1986-07-23 1986-07-23 ガス導入方法

Publications (2)

Publication Number Publication Date
JPS6328875A JPS6328875A (ja) 1988-02-06
JPH0118152B2 true JPH0118152B2 (enrdf_load_html_response) 1989-04-04

Family

ID=15952269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17299786A Granted JPS6328875A (ja) 1986-07-23 1986-07-23 ガス導入方法

Country Status (1)

Country Link
JP (1) JPS6328875A (enrdf_load_html_response)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0663095B2 (ja) * 1988-10-13 1994-08-17 日電アネルバ株式会社 Ｃｖｄ装置
JP3142329B2 (ja) * 1991-11-20 2001-03-07 株式会社東芝 薄膜製造装置
KR20030004740A (ko) * 2001-07-06 2003-01-15 주성엔지니어링(주) 액체원료 운반시스템 및 이를 이용한 공정진행방법
CN1859962B (zh) 2003-09-29 2011-06-22 日立金属株式会社 陶瓷蜂窝式过滤器及其制造方法
EP2078553B1 (en) 2006-09-29 2013-02-27 Hitachi Metals, Ltd. Process for producing cordierite ceramic honeycomb filter
WO2015064035A1 (ja) * 2013-10-31 2015-05-07 株式会社フジキン 圧力式流量制御装置
JP6321972B2 (ja) * 2014-01-21 2018-05-09 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
JP6717196B2 (ja) 2014-09-30 2020-07-01 日立金属株式会社 セラミックハニカムフィルタ及びその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5513922A (en) * 1978-07-14 1980-01-31 Matsushita Electric Ind Co Ltd Vapor phase growthing method and its device

Also Published As

Publication number Publication date
JPS6328875A (ja) 1988-02-06

Similar Documents

Publication Publication Date Title
JP3332053B2 (ja) チャンバーへのガス供給方法
US6142163A (en) Method and apparatus for pressure control in vacuum processors
JPH0242186A (ja) ブースターポンプのための制御バイパス
JP2009511248A (ja) ターボポンプを使用する広範囲圧力制御
JP2001220677A (ja) 薄膜製造方法及び薄膜製造装置
JPH0118152B2 (enrdf_load_html_response)
JP4298025B2 (ja) 真空圧力制御システム
JP4417434B2 (ja) 真空プロセッサの圧力を制御する方法及び装置
JPH06244125A (ja) 減圧処理装置
JPH05304099A (ja) 流量制御装置
JPH0521984B2 (enrdf_load_html_response)
JP2001070781A (ja) 真空処理装置
JPH0565593B2 (enrdf_load_html_response)
JP2650105B2 (ja) ガス制御装置
JPH02151027A (ja) 半導体装置の製造装置
JPS6024017A (ja) 処理ガス圧力調整方法
JPS63307273A (ja) 基板に薄層をスパツタする装置
JPH05251543A (ja) 半導体処理装置
JPH05198513A (ja) 減圧処理装置のガス供給方法
JPH08139041A (ja) 減圧処理装置のガス給排装置及びガス導入方法
JPS614875A (ja) プラズマエツチング装置の真空排気方法
JPH07328410A (ja) 真空排気装置
JPH0250421A (ja) ガス供給装置
JPS6262526A (ja) プラズマ処理装置
KR100227844B1 (ko) 막질개선을 위한 반도체 제조용 진공 장치