JPH0117253B2 - - Google Patents

Info

Publication number
JPH0117253B2
JPH0117253B2 JP13040484A JP13040484A JPH0117253B2 JP H0117253 B2 JPH0117253 B2 JP H0117253B2 JP 13040484 A JP13040484 A JP 13040484A JP 13040484 A JP13040484 A JP 13040484A JP H0117253 B2 JPH0117253 B2 JP H0117253B2
Authority
JP
Japan
Prior art keywords
coating
hole
resist pattern
film
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13040484A
Other languages
English (en)
Japanese (ja)
Other versions
JPS618952A (ja
Inventor
Yoshiaki Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP13040484A priority Critical patent/JPS618952A/ja
Publication of JPS618952A publication Critical patent/JPS618952A/ja
Publication of JPH0117253B2 publication Critical patent/JPH0117253B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP13040484A 1984-06-23 1984-06-23 配線形成方法 Granted JPS618952A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13040484A JPS618952A (ja) 1984-06-23 1984-06-23 配線形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13040484A JPS618952A (ja) 1984-06-23 1984-06-23 配線形成方法

Publications (2)

Publication Number Publication Date
JPS618952A JPS618952A (ja) 1986-01-16
JPH0117253B2 true JPH0117253B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-03-29

Family

ID=15033469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13040484A Granted JPS618952A (ja) 1984-06-23 1984-06-23 配線形成方法

Country Status (1)

Country Link
JP (1) JPS618952A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5190892A (en) * 1988-08-11 1993-03-02 Oki Electric Industry Co., Ltd. Method for forming pattern using lift-off
JP2964446B2 (ja) * 1994-11-22 1999-10-18 矢崎総業株式会社 圧接コネクタ
JPH0982381A (ja) * 1995-09-11 1997-03-28 Yazaki Corp 圧接コネクタ
JP2019125528A (ja) 2018-01-18 2019-07-25 株式会社オートネットワーク技術研究所 電線カバー、及びコネクタ

Also Published As

Publication number Publication date
JPS618952A (ja) 1986-01-16

Similar Documents

Publication Publication Date Title
US10381232B2 (en) Techniques for manipulating patterned features using ions
US5126288A (en) Fine processing method using oblique metal deposition
JPH0476496B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
US4108717A (en) Process for the production of fine structures consisting of a vapor-deposited material on a base
JPH0117253B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH0774087A (ja) Mlrパターン形成方法
JPH06104206A (ja) 半導体装置の製造方法および製造装置
JP2659980B2 (ja) 半導体装置の製造方法
KR0147716B1 (ko) 자기정렬콘택 형성방법
JPH0423322A (ja) 半導体装置の製造方法
JPH03297150A (ja) 半導体装置の製造方法
JPS6286714A (ja) 半導体装置の電極の形成方法
JPH03259528A (ja) 半導体装置の製造方法
JPS628030B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH03222330A (ja) 半導体装置
JPH05136174A (ja) ゲート電極の形成方法
KR19990061133A (ko) 반도체 소자의 셀투사형 마스크 제조방법
JPH02231720A (ja) 微細パターンの製造方法
JPH02205013A (ja) 半導体装置の製造方法
JPH0544181B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH04158533A (ja) 化合物半導体装置の製造方法
JPH0287521A (ja) 半導体装置の電極形成方法
JPS6195529A (ja) パタ−ン形成方法
JPH04133426A (ja) 半導体装置の製造方法
JPH04267337A (ja) 半導体装置の製法