JPH0117141B2 - - Google Patents

Info

Publication number
JPH0117141B2
JPH0117141B2 JP10984081A JP10984081A JPH0117141B2 JP H0117141 B2 JPH0117141 B2 JP H0117141B2 JP 10984081 A JP10984081 A JP 10984081A JP 10984081 A JP10984081 A JP 10984081A JP H0117141 B2 JPH0117141 B2 JP H0117141B2
Authority
JP
Japan
Prior art keywords
formula
photosensitive resin
weight
acrylate
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10984081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5810737A (ja
Inventor
Kunio Yanagisawa
Takashi Nakagawa
Yasuhiro Kawasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP10984081A priority Critical patent/JPS5810737A/ja
Publication of JPS5810737A publication Critical patent/JPS5810737A/ja
Publication of JPH0117141B2 publication Critical patent/JPH0117141B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP10984081A 1981-07-13 1981-07-13 感光性樹脂組成物 Granted JPS5810737A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10984081A JPS5810737A (ja) 1981-07-13 1981-07-13 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10984081A JPS5810737A (ja) 1981-07-13 1981-07-13 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS5810737A JPS5810737A (ja) 1983-01-21
JPH0117141B2 true JPH0117141B2 (cg-RX-API-DMAC7.html) 1989-03-29

Family

ID=14520528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10984081A Granted JPS5810737A (ja) 1981-07-13 1981-07-13 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS5810737A (cg-RX-API-DMAC7.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024542A (ja) * 1983-07-20 1985-02-07 Asahi Chem Ind Co Ltd 新規な光重合性組成物
JPS60112035A (ja) * 1983-11-22 1985-06-18 Sekisui Chem Co Ltd 感光性ソルダ−レジスト
JPS6147741A (ja) * 1984-08-13 1986-03-08 Nippon Synthetic Chem Ind Co Ltd:The 硬化性樹脂組成物
JPH066603B2 (ja) * 1984-08-13 1994-01-26 日本合成化学工業株式会社 硬化性樹脂組成物
JPS6191657A (ja) * 1984-10-11 1986-05-09 Fuji Photo Film Co Ltd 多層ハロゲン化銀カラ−感光材料
JP2517281B2 (ja) * 1987-05-28 1996-07-24 富士写真フイルム株式会社 光重合性組成物
EP1467248A1 (en) 2003-04-11 2004-10-13 Fuji Photo Film B.V. Photographic colour material containing a resorcinol derivative as black coupler

Also Published As

Publication number Publication date
JPS5810737A (ja) 1983-01-21

Similar Documents

Publication Publication Date Title
JP5617941B2 (ja) 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及び、プリント配線板の製造方法
US4828963A (en) Printing plate having photosensitive polymer composition
WO2010103918A1 (ja) 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
WO1992006412A1 (en) Photopolymerizable composition and photopolymerizable element
JPH0117141B2 (cg-RX-API-DMAC7.html)
EP0196571B1 (en) Photosensitive composition
JPH0611765B2 (ja) 光重合開始剤組成物
JP4240282B2 (ja) 感光性樹脂組成物これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP2000344812A (ja) 重合性組成物
JPS62280204A (ja) 熱硬化又は放射線硬化可能な液状プレポリマ−
JPH0119572B2 (cg-RX-API-DMAC7.html)
JPS59179608A (ja) 光硬化性ヒドロゾル組成物の製造法
JP2540577B2 (ja) 感光性樹脂板の製法
JPS62950A (ja) 感光性樹脂版材
JPS6210642A (ja) 感光性樹脂組成物
JP3997753B2 (ja) 感光性樹脂組成物
JP2002023365A (ja) 感光性樹脂積層体
JPH1192540A (ja) 樹脂組成物及びその硬化物
JPH02161437A (ja) 光重合性組成物
JP2563955B2 (ja) 感光性樹脂組成物
JPS63177125A (ja) 感光性樹脂組成物
JPS627703A (ja) 光重合開始剤組成物
CN115903386A (zh) 碱可溶性组合物、产品、制备方法及应用
JPH0488345A (ja) 光重合性組成物及び光重合性積層体
JPS62153309A (ja) 光硬化重合組成物