JPH0119572B2 - - Google Patents

Info

Publication number
JPH0119572B2
JPH0119572B2 JP15440481A JP15440481A JPH0119572B2 JP H0119572 B2 JPH0119572 B2 JP H0119572B2 JP 15440481 A JP15440481 A JP 15440481A JP 15440481 A JP15440481 A JP 15440481A JP H0119572 B2 JPH0119572 B2 JP H0119572B2
Authority
JP
Japan
Prior art keywords
formula
polymer
composition according
acid
decene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15440481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5854337A (ja
Inventor
Kunio Yanagisawa
Katsumi Tashiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP15440481A priority Critical patent/JPS5854337A/ja
Publication of JPS5854337A publication Critical patent/JPS5854337A/ja
Publication of JPH0119572B2 publication Critical patent/JPH0119572B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP15440481A 1981-09-28 1981-09-28 感光性樹脂組成物 Granted JPS5854337A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15440481A JPS5854337A (ja) 1981-09-28 1981-09-28 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15440481A JPS5854337A (ja) 1981-09-28 1981-09-28 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS5854337A JPS5854337A (ja) 1983-03-31
JPH0119572B2 true JPH0119572B2 (cg-RX-API-DMAC7.html) 1989-04-12

Family

ID=15583400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15440481A Granted JPS5854337A (ja) 1981-09-28 1981-09-28 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS5854337A (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60112035A (ja) * 1983-11-22 1985-06-18 Sekisui Chem Co Ltd 感光性ソルダ−レジスト
EP0217137B1 (en) * 1985-08-29 1992-04-08 E.I. Du Pont De Nemours And Company Photopolymerizable composition of acrylic copolymer containing dicyclopentenyl acrylate or methacrylate
TWI344976B (en) * 2003-10-27 2011-07-11 Sumitomo Chemical Co Stained sensitization resin
JP4534697B2 (ja) * 2003-10-27 2010-09-01 住友化学株式会社 着色感光性樹脂組成物

Also Published As

Publication number Publication date
JPS5854337A (ja) 1983-03-31

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