JPH01129250A - ポジ型フォトレジスト用現像液 - Google Patents

ポジ型フォトレジスト用現像液

Info

Publication number
JPH01129250A
JPH01129250A JP62287369A JP28736987A JPH01129250A JP H01129250 A JPH01129250 A JP H01129250A JP 62287369 A JP62287369 A JP 62287369A JP 28736987 A JP28736987 A JP 28736987A JP H01129250 A JPH01129250 A JP H01129250A
Authority
JP
Japan
Prior art keywords
quaternary ammonium
formula
nonionic surfactant
positive photoresist
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62287369A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0451821B2 (OSRAM
Inventor
Shiyunren Chiyou
俊連 長
Taeko Sannomiya
妙子 三宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tama Kagaku Kogyo Co Ltd
Original Assignee
Tama Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tama Kagaku Kogyo Co Ltd filed Critical Tama Kagaku Kogyo Co Ltd
Priority to JP62287369A priority Critical patent/JPH01129250A/ja
Publication of JPH01129250A publication Critical patent/JPH01129250A/ja
Publication of JPH0451821B2 publication Critical patent/JPH0451821B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62287369A 1987-11-16 1987-11-16 ポジ型フォトレジスト用現像液 Granted JPH01129250A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62287369A JPH01129250A (ja) 1987-11-16 1987-11-16 ポジ型フォトレジスト用現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62287369A JPH01129250A (ja) 1987-11-16 1987-11-16 ポジ型フォトレジスト用現像液

Publications (2)

Publication Number Publication Date
JPH01129250A true JPH01129250A (ja) 1989-05-22
JPH0451821B2 JPH0451821B2 (OSRAM) 1992-08-20

Family

ID=17716470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62287369A Granted JPH01129250A (ja) 1987-11-16 1987-11-16 ポジ型フォトレジスト用現像液

Country Status (1)

Country Link
JP (1) JPH01129250A (OSRAM)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01257846A (ja) * 1988-04-07 1989-10-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト用現像液
JPH01287561A (ja) * 1988-05-13 1989-11-20 Konica Corp 感光性平版印刷版の現像液組成物
JPH0643631A (ja) * 1992-04-01 1994-02-18 Internatl Business Mach Corp <Ibm> 非イオン性ポリグリコールを含有するフォトレジスト
US6007970A (en) * 1992-02-07 1999-12-28 Canon Kabushiki Kaisha Lithographic developer containing surfactant
US6107007A (en) * 1992-02-10 2000-08-22 Canon Kabushiki Kaisha Lithography process
JP2001312072A (ja) * 2000-04-28 2001-11-09 Advanced Color Tec Kk 感光性樹脂用現像液、現像方法、および光学的カラーフィルターの製造方法
US6739544B2 (en) 2001-03-29 2004-05-25 Sumitomo Heavy Industries, Ltd. Winding roll presser device and long material winding method
WO2008018580A1 (en) * 2006-08-10 2008-02-14 Kanto Kagaku Kabushiki Kaisha Positive resist processing liquid composition and liquid developer
US7407739B2 (en) 2002-04-26 2008-08-05 Tokyo Ohka Kogyo Co., Ltd. Resist developer and resist pattern formation method using same
US7416836B2 (en) 2004-02-05 2008-08-26 Fujifilm Corporation Developing solution for lithographic printing plate precursor and method for making lithographic printing plate
CN112143500A (zh) * 2019-06-28 2020-12-29 东京应化工业株式会社 硅蚀刻液、硅蚀刻方法以及硅鳍片结构体的制造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1124285A (ja) * 1997-06-27 1999-01-29 Kurarianto Japan Kk レジスト用現像液

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6118944A (ja) * 1984-05-16 1986-01-27 アライド・コ−ポレ−シヨン 低金属イオンホトレジスト現像液
JPS61151537A (ja) * 1984-12-25 1986-07-10 Toshiba Corp ポジ型フオトレジスト現像液組成物
JPS61167948A (ja) * 1985-01-21 1986-07-29 Mitsubishi Chem Ind Ltd ポジ型感光性組成物用現像液

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6118944A (ja) * 1984-05-16 1986-01-27 アライド・コ−ポレ−シヨン 低金属イオンホトレジスト現像液
JPS61151537A (ja) * 1984-12-25 1986-07-10 Toshiba Corp ポジ型フオトレジスト現像液組成物
JPS61167948A (ja) * 1985-01-21 1986-07-29 Mitsubishi Chem Ind Ltd ポジ型感光性組成物用現像液

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01257846A (ja) * 1988-04-07 1989-10-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト用現像液
JPH01287561A (ja) * 1988-05-13 1989-11-20 Konica Corp 感光性平版印刷版の現像液組成物
US6007970A (en) * 1992-02-07 1999-12-28 Canon Kabushiki Kaisha Lithographic developer containing surfactant
US6107007A (en) * 1992-02-10 2000-08-22 Canon Kabushiki Kaisha Lithography process
JPH0643631A (ja) * 1992-04-01 1994-02-18 Internatl Business Mach Corp <Ibm> 非イオン性ポリグリコールを含有するフォトレジスト
JP2001312072A (ja) * 2000-04-28 2001-11-09 Advanced Color Tec Kk 感光性樹脂用現像液、現像方法、および光学的カラーフィルターの製造方法
US6739544B2 (en) 2001-03-29 2004-05-25 Sumitomo Heavy Industries, Ltd. Winding roll presser device and long material winding method
DE10213841B4 (de) * 2001-03-29 2008-11-27 Sumitomo Heavy Industries, Ltd. Wickelrollenanpressvorrichtung zum Aufwickeln von langen Materialien
US7407739B2 (en) 2002-04-26 2008-08-05 Tokyo Ohka Kogyo Co., Ltd. Resist developer and resist pattern formation method using same
US7416836B2 (en) 2004-02-05 2008-08-26 Fujifilm Corporation Developing solution for lithographic printing plate precursor and method for making lithographic printing plate
WO2008018580A1 (en) * 2006-08-10 2008-02-14 Kanto Kagaku Kabushiki Kaisha Positive resist processing liquid composition and liquid developer
US8323880B2 (en) 2006-08-10 2012-12-04 Kanto Kagaku Kabushiki Kaisha Positive resist processing liquid composition and liquid developer
CN112143500A (zh) * 2019-06-28 2020-12-29 东京应化工业株式会社 硅蚀刻液、硅蚀刻方法以及硅鳍片结构体的制造方法
CN112143500B (zh) * 2019-06-28 2023-04-07 东京应化工业株式会社 硅蚀刻液、硅蚀刻方法以及硅鳍片结构体的制造方法
US11802240B2 (en) 2019-06-28 2023-10-31 Tokyo Ohka Kogyo Co., Ltd. Silicon etching solution, silicon etching method, and method of producing silicon fin structure

Also Published As

Publication number Publication date
JPH0451821B2 (OSRAM) 1992-08-20

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