JP7750093B2 - 着色感光性樹脂組成物、硬化物、表示装置及び硬化物の製造方法 - Google Patents

着色感光性樹脂組成物、硬化物、表示装置及び硬化物の製造方法

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Publication number
JP7750093B2
JP7750093B2 JP2021546701A JP2021546701A JP7750093B2 JP 7750093 B2 JP7750093 B2 JP 7750093B2 JP 2021546701 A JP2021546701 A JP 2021546701A JP 2021546701 A JP2021546701 A JP 2021546701A JP 7750093 B2 JP7750093 B2 JP 7750093B2
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JP
Japan
Prior art keywords
resin composition
photosensitive resin
dye
colored photosensitive
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021546701A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022039034A1 (https=
JPWO2022039034A5 (https=
Inventor
拓紀 西岡
悠佑 小森
一登 三好
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
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Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of JPWO2022039034A1 publication Critical patent/JPWO2022039034A1/ja
Publication of JPWO2022039034A5 publication Critical patent/JPWO2022039034A5/ja
Application granted granted Critical
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Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H10K50/15—Hole transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
JP2021546701A 2020-08-18 2021-08-05 着色感光性樹脂組成物、硬化物、表示装置及び硬化物の製造方法 Active JP7750093B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020137896 2020-08-18
JP2020137896 2020-08-18
PCT/JP2021/029076 WO2022039034A1 (ja) 2020-08-18 2021-08-05 着色感光性樹脂組成物、硬化物、表示装置及び硬化物の製造方法

Publications (3)

Publication Number Publication Date
JPWO2022039034A1 JPWO2022039034A1 (https=) 2022-02-24
JPWO2022039034A5 JPWO2022039034A5 (https=) 2024-08-07
JP7750093B2 true JP7750093B2 (ja) 2025-10-07

Family

ID=80322690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021546701A Active JP7750093B2 (ja) 2020-08-18 2021-08-05 着色感光性樹脂組成物、硬化物、表示装置及び硬化物の製造方法

Country Status (5)

Country Link
JP (1) JP7750093B2 (https=)
KR (1) KR102903882B1 (https=)
CN (1) CN116034318A (https=)
TW (1) TWI902865B (https=)
WO (1) WO2022039034A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119547016A (zh) 2022-08-19 2025-02-28 东丽株式会社 正型感光性组合物、固化膜、有机el显示装置及色素
TW202412021A (zh) * 2022-09-02 2024-03-16 日商Ｊｓｒ股份有限公司 導電膜的製造方法、分散液、感放射線性樹脂組成物、發光元件

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004077666A (ja) 2002-08-13 2004-03-11 Kodak Polychrome Graphics Japan Ltd ネガ型感光性組成物およびネガ型感光性平版印刷版
JP2004326094A (ja) 2003-04-07 2004-11-18 Toray Ind Inc 感光性樹脂組成物
JP2009175451A (ja) 2008-01-24 2009-08-06 Sumitomo Chemical Co Ltd 着色感光性組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子
JP2014153592A (ja) 2013-02-12 2014-08-25 Dainippon Printing Co Ltd 白色発光有機ｅｌディスプレイ用のカラーフィルタ及び着色レジスト組成物、並びに白色発光有機ｅｌディスプレイ
JP2015001667A (ja) 2013-06-17 2015-01-05 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
JP2015082054A (ja) 2013-10-23 2015-04-27 大日本印刷株式会社 色材、色材分散液、カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置、及び有機発光表示装置
WO2019059359A1 (ja) 2017-09-25 2019-03-28 東レ株式会社 着色樹脂組成物、着色膜、カラーフィルターおよび液晶表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06230215A (ja) 1993-02-05 1994-08-19 Sumitomo Chem Co Ltd ブラックマトリックス用ポジ型レジスト組成物
JP3508199B2 (ja) 1994-03-25 2004-03-22 住友化学工業株式会社 ブラックマトリックス用レジスト組成物、当該組成物により得られるブラックマトリックス
JPH10254129A (ja) 1997-03-07 1998-09-25 Toray Ind Inc 感光性黒色ペーストおよびそれを用いたブラックマトリックス基板の製造方法
JP2003119381A (ja) 2001-10-17 2003-04-23 Hitachi Cable Ltd 黒色ポリイミド組成物及びブラックマトリックス
JP4360168B2 (ja) 2002-10-01 2009-11-11 東レ株式会社 ポジ型感光性樹脂組成物
TWI333127B (en) * 2003-04-07 2010-11-11 Toray Industries Positive-type photosensitive resin composition
KR102510370B1 (ko) * 2014-10-06 2023-03-17 도레이 카부시키가이샤 수지 조성물, 내열성 수지막의 제조 방법, 및 표시 장치
KR102398257B1 (ko) * 2016-08-01 2022-05-13 토요잉크Sc홀딩스주식회사 감광성 착색 조성물 및 컬러 필터

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004077666A (ja) 2002-08-13 2004-03-11 Kodak Polychrome Graphics Japan Ltd ネガ型感光性組成物およびネガ型感光性平版印刷版
JP2004326094A (ja) 2003-04-07 2004-11-18 Toray Ind Inc 感光性樹脂組成物
JP2009175451A (ja) 2008-01-24 2009-08-06 Sumitomo Chemical Co Ltd 着色感光性組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子
JP2014153592A (ja) 2013-02-12 2014-08-25 Dainippon Printing Co Ltd 白色発光有機ｅｌディスプレイ用のカラーフィルタ及び着色レジスト組成物、並びに白色発光有機ｅｌディスプレイ
JP2015001667A (ja) 2013-06-17 2015-01-05 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
JP2015082054A (ja) 2013-10-23 2015-04-27 大日本印刷株式会社 色材、色材分散液、カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置、及び有機発光表示装置
WO2019059359A1 (ja) 2017-09-25 2019-03-28 東レ株式会社 着色樹脂組成物、着色膜、カラーフィルターおよび液晶表示装置

Also Published As

Publication number Publication date
KR20230051765A (ko) 2023-04-18
WO2022039034A1 (ja) 2022-02-24
KR102903882B1 (ko) 2025-12-26
JPWO2022039034A1 (https=) 2022-02-24
TWI902865B (zh) 2025-11-01
CN116034318A (zh) 2023-04-28
TW202214745A (zh) 2022-04-16

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