CN116034318A - 着色感光性树脂组合物、固化物、显示装置及固化物的制造方法 - Google Patents

着色感光性树脂组合物、固化物、显示装置及固化物的制造方法 Download PDF

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Publication number
CN116034318A
CN116034318A CN202180056116.5A CN202180056116A CN116034318A CN 116034318 A CN116034318 A CN 116034318A CN 202180056116 A CN202180056116 A CN 202180056116A CN 116034318 A CN116034318 A CN 116034318A
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CN
China
Prior art keywords
resin composition
photosensitive resin
dye
colored photosensitive
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180056116.5A
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English (en)
Chinese (zh)
Inventor
西冈拓纪
小森悠佑
三好一登
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
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Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of CN116034318A publication Critical patent/CN116034318A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H10K50/15—Hole transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
CN202180056116.5A 2020-08-18 2021-08-05 着色感光性树脂组合物、固化物、显示装置及固化物的制造方法 Pending CN116034318A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-137896 2020-08-18
JP2020137896 2020-08-18
PCT/JP2021/029076 WO2022039034A1 (ja) 2020-08-18 2021-08-05 着色感光性樹脂組成物、硬化物、表示装置及び硬化物の製造方法

Publications (1)

Publication Number Publication Date
CN116034318A true CN116034318A (zh) 2023-04-28

Family

ID=80322690

Family Applications (1)

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CN202180056116.5A Pending CN116034318A (zh) 2020-08-18 2021-08-05 着色感光性树脂组合物、固化物、显示装置及固化物的制造方法

Country Status (5)

Country Link
JP (1) JP7750093B2 (https=)
KR (1) KR102903882B1 (https=)
CN (1) CN116034318A (https=)
TW (1) TWI902865B (https=)
WO (1) WO2022039034A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119547016A (zh) 2022-08-19 2025-02-28 东丽株式会社 正型感光性组合物、固化膜、有机el显示装置及色素
TW202412021A (zh) * 2022-09-02 2024-03-16 日商Ｊｓｒ股份有限公司 導電膜的製造方法、分散液、感放射線性樹脂組成物、發光元件

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009175451A (ja) * 2008-01-24 2009-08-06 Sumitomo Chemical Co Ltd 着色感光性組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子
JP2015082054A (ja) * 2013-10-23 2015-04-27 大日本印刷株式会社 色材、色材分散液、カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置、及び有機発光表示装置
WO2019059359A1 (ja) * 2017-09-25 2019-03-28 東レ株式会社 着色樹脂組成物、着色膜、カラーフィルターおよび液晶表示装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06230215A (ja) 1993-02-05 1994-08-19 Sumitomo Chem Co Ltd ブラックマトリックス用ポジ型レジスト組成物
JP3508199B2 (ja) 1994-03-25 2004-03-22 住友化学工業株式会社 ブラックマトリックス用レジスト組成物、当該組成物により得られるブラックマトリックス
JPH10254129A (ja) 1997-03-07 1998-09-25 Toray Ind Inc 感光性黒色ペーストおよびそれを用いたブラックマトリックス基板の製造方法
JP2003119381A (ja) 2001-10-17 2003-04-23 Hitachi Cable Ltd 黒色ポリイミド組成物及びブラックマトリックス
JP4122189B2 (ja) * 2002-08-13 2008-07-23 コダックグラフィックコミュニケーションズ株式会社 ネガ型感光性組成物およびネガ型感光性平版印刷版
JP4360168B2 (ja) 2002-10-01 2009-11-11 東レ株式会社 ポジ型感光性樹脂組成物
JP4483371B2 (ja) 2003-04-07 2010-06-16 東レ株式会社 感光性樹脂組成物
TWI333127B (en) * 2003-04-07 2010-11-11 Toray Industries Positive-type photosensitive resin composition
JP6119282B2 (ja) * 2013-02-12 2017-04-26 大日本印刷株式会社 白色発光有機ｅｌディスプレイ用のカラーフィルタ及び着色レジスト組成物、並びに白色発光有機ｅｌディスプレイ
JP6160286B2 (ja) * 2013-06-17 2017-07-12 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
KR102510370B1 (ko) * 2014-10-06 2023-03-17 도레이 카부시키가이샤 수지 조성물, 내열성 수지막의 제조 방법, 및 표시 장치
KR102398257B1 (ko) * 2016-08-01 2022-05-13 토요잉크Sc홀딩스주식회사 감광성 착색 조성물 및 컬러 필터

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009175451A (ja) * 2008-01-24 2009-08-06 Sumitomo Chemical Co Ltd 着色感光性組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子
JP2015082054A (ja) * 2013-10-23 2015-04-27 大日本印刷株式会社 色材、色材分散液、カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置、及び有機発光表示装置
WO2019059359A1 (ja) * 2017-09-25 2019-03-28 東レ株式会社 着色樹脂組成物、着色膜、カラーフィルターおよび液晶表示装置

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Publication number Publication date
KR20230051765A (ko) 2023-04-18
JP7750093B2 (ja) 2025-10-07
WO2022039034A1 (ja) 2022-02-24
KR102903882B1 (ko) 2025-12-26
JPWO2022039034A1 (https=) 2022-02-24
TWI902865B (zh) 2025-11-01
TW202214745A (zh) 2022-04-16

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