JP7517155B2 - マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法 - Google Patents

マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法 Download PDF

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Publication number
JP7517155B2
JP7517155B2 JP2020571184A JP2020571184A JP7517155B2 JP 7517155 B2 JP7517155 B2 JP 7517155B2 JP 2020571184 A JP2020571184 A JP 2020571184A JP 2020571184 A JP2020571184 A JP 2020571184A JP 7517155 B2 JP7517155 B2 JP 7517155B2
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mask
adapter
information
attached
mask adapter
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JP2020571184A
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Japanese (ja)
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JPWO2020162396A1 (ja
JPWO2020162396A5 (enExample
Inventor
弘樹 小宮山
澄夫 八田
智和 長野
瀬名 寺西
博圭 浅海
大輔 高橋
智之 大川
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates

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  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2020571184A 2019-02-06 2020-02-03 マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法 Active JP7517155B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019020167 2019-02-06
JP2019020167 2019-02-06
PCT/JP2020/003936 WO2020162396A1 (ja) 2019-02-06 2020-02-03 マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JPWO2020162396A1 JPWO2020162396A1 (ja) 2021-12-02
JPWO2020162396A5 JPWO2020162396A5 (enExample) 2023-01-19
JP7517155B2 true JP7517155B2 (ja) 2024-07-17

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JP2020571184A Active JP7517155B2 (ja) 2019-02-06 2020-02-03 マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法

Country Status (5)

Country Link
JP (1) JP7517155B2 (enExample)
KR (1) KR20210122240A (enExample)
CN (2) CN113330370B (enExample)
TW (1) TWI833889B (enExample)
WO (1) WO2020162396A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230109818A (ko) * 2022-01-13 2023-07-21 삼성디스플레이 주식회사 마스크, 이를 포함하는 마스크 조립체, 및 기판 이송 설비
TWI868646B (zh) * 2023-03-30 2025-01-01 家碩科技股份有限公司 降低粉塵汙染的光罩內盒承載裝置及光罩內盒的光學檢查設備
JP2025164347A (ja) 2024-04-19 2025-10-30 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法
TWI894069B (zh) * 2024-12-10 2025-08-11 華洋精機股份有限公司 光罩圖樣面朝下之光罩移載裝置
CN120044767A (zh) * 2025-04-23 2025-05-27 新毅东(北京)科技有限公司 掩模板预对准装置及晶圆曝光设备

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001033943A (ja) 1999-07-23 2001-02-09 Mitsubishi Electric Corp マスク装置
US20030086069A1 (en) 2001-11-02 2003-05-08 Nikolaus Maier Device for aligning masks in photolithography
JP2004165249A (ja) 2002-11-11 2004-06-10 Sony Corp 露光装置及び露光方法
JP2004531923A (ja) 2001-01-12 2004-10-14 ビジブル テクノーレッジー， エルエルシー 電子インクを使用したスマート電子ラベル
JP2005129959A (ja) 2003-10-27 2005-05-19 Asml Netherlands Bv レチクルホルダおよびレチクルのアセンブリ
US20100085554A1 (en) 2008-10-02 2010-04-08 Fan Chih-Shen Adaptor of an aligner system
JP2010266561A (ja) 2009-05-13 2010-11-25 Hitachi High-Technologies Corp プロキシミティ露光装置、プロキシミティ露光装置のマスクの位置ずれ防止方法、及び表示用パネル基板の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722112B2 (ja) * 1987-07-30 1995-03-08 キヤノン株式会社 マスクホルダ並びにそれを用いたマスクの搬送方法
JPH0248196A (ja) * 1988-06-15 1990-02-16 Canon Inc 搬送装置
JPH06325996A (ja) * 1993-05-12 1994-11-25 Hitachi Ltd レティクルフレーム
JP3412193B2 (ja) * 1993-06-29 2003-06-03 株式会社ニコン 露光装置
JP3912884B2 (ja) * 1998-02-03 2007-05-09 ローム株式会社 投影露光装置における露光マスクサイズ変換用治具の構造
JP4048593B2 (ja) * 1998-04-03 2008-02-20 ソニー株式会社 露光装置
JP4723398B2 (ja) * 2006-02-22 2011-07-13 Ｈｏｙａ株式会社 スピン洗浄装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001033943A (ja) 1999-07-23 2001-02-09 Mitsubishi Electric Corp マスク装置
JP2004531923A (ja) 2001-01-12 2004-10-14 ビジブル テクノーレッジー， エルエルシー 電子インクを使用したスマート電子ラベル
US20030086069A1 (en) 2001-11-02 2003-05-08 Nikolaus Maier Device for aligning masks in photolithography
JP2004165249A (ja) 2002-11-11 2004-06-10 Sony Corp 露光装置及び露光方法
JP2005129959A (ja) 2003-10-27 2005-05-19 Asml Netherlands Bv レチクルホルダおよびレチクルのアセンブリ
US20100085554A1 (en) 2008-10-02 2010-04-08 Fan Chih-Shen Adaptor of an aligner system
JP2010266561A (ja) 2009-05-13 2010-11-25 Hitachi High-Technologies Corp プロキシミティ露光装置、プロキシミティ露光装置のマスクの位置ずれ防止方法、及び表示用パネル基板の製造方法

Also Published As

Publication number Publication date
TW202102945A (zh) 2021-01-16
TWI833889B (zh) 2024-03-01
CN113330370A (zh) 2021-08-31
KR20210122240A (ko) 2021-10-08
JPWO2020162396A1 (ja) 2021-12-02
CN113330370B (zh) 2024-04-09
CN118068658A (zh) 2024-05-24
WO2020162396A1 (ja) 2020-08-13

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