JP7493918B2 - 反射防止膜付き光学部材及びその製造方法 - Google Patents
反射防止膜付き光学部材及びその製造方法 Download PDFInfo
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- JP7493918B2 JP7493918B2 JP2019146114A JP2019146114A JP7493918B2 JP 7493918 B2 JP7493918 B2 JP 7493918B2 JP 2019146114 A JP2019146114 A JP 2019146114A JP 2019146114 A JP2019146114 A JP 2019146114A JP 7493918 B2 JP7493918 B2 JP 7493918B2
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- 230000003287 optical effect Effects 0.000 title claims description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000010410 layer Substances 0.000 claims description 137
- 239000000758 substrate Substances 0.000 claims description 24
- 238000000869 ion-assisted deposition Methods 0.000 claims description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 19
- 230000003595 spectral effect Effects 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 17
- 238000000151 deposition Methods 0.000 claims description 12
- 229910052681 coesite Inorganic materials 0.000 claims description 10
- 229910052906 cristobalite Inorganic materials 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 10
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 10
- 235000012239 silicon dioxide Nutrition 0.000 claims description 10
- 239000002356 single layer Substances 0.000 claims description 10
- 229910052682 stishovite Inorganic materials 0.000 claims description 10
- 229910052905 tridymite Inorganic materials 0.000 claims description 10
- 238000001704 evaporation Methods 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 8
- 239000002344 surface layer Substances 0.000 claims description 8
- 230000008020 evaporation Effects 0.000 claims description 7
- 238000010030 laminating Methods 0.000 claims description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 15
- 238000000576 coating method Methods 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000002474 experimental method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 241000511976 Hoya Species 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019146114A JP7493918B2 (ja) | 2019-08-08 | 2019-08-08 | 反射防止膜付き光学部材及びその製造方法 |
| PCT/JP2020/028713 WO2021024834A1 (ja) | 2019-08-08 | 2020-07-27 | 反射防止膜付き光学部材及びその製造方法 |
| CN202080043467.8A CN113966409A (zh) | 2019-08-08 | 2020-07-27 | 带有防反射膜的光学构件及其制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019146114A JP7493918B2 (ja) | 2019-08-08 | 2019-08-08 | 反射防止膜付き光学部材及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021026163A JP2021026163A (ja) | 2021-02-22 |
| JP2021026163A5 JP2021026163A5 (enExample) | 2022-05-18 |
| JP7493918B2 true JP7493918B2 (ja) | 2024-06-03 |
Family
ID=74503600
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019146114A Active JP7493918B2 (ja) | 2019-08-08 | 2019-08-08 | 反射防止膜付き光学部材及びその製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7493918B2 (enExample) |
| CN (1) | CN113966409A (enExample) |
| WO (1) | WO2021024834A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113593408B (zh) * | 2021-07-07 | 2022-09-09 | 武汉华星光电半导体显示技术有限公司 | 显示模组及其制作方法、移动终端 |
| CN113900165B (zh) * | 2021-11-16 | 2023-09-22 | 天津津航技术物理研究所 | 一种氟化钡基底复合增透膜及其结构设计方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004163549A (ja) | 2002-11-11 | 2004-06-10 | Pentax Corp | 反射防止膜 |
| JP2005338366A (ja) | 2004-05-26 | 2005-12-08 | Olympus Corp | 反射防止膜及び光学部品 |
| JP2010140008A (ja) | 2008-11-13 | 2010-06-24 | Seiko Epson Corp | 光学物品およびその製造方法 |
| WO2012169393A1 (ja) | 2011-06-10 | 2012-12-13 | オリンパス株式会社 | 反射防止膜、光学系、及び光学機器 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004061879A (ja) * | 2002-07-29 | 2004-02-26 | Ito Kogaku Kogyo Kk | 表面保護膜を備えた光学要素 |
| JP5211289B2 (ja) * | 2005-11-01 | 2013-06-12 | 東海光学株式会社 | 可視域用プラスチックレンズ |
| JP4207083B2 (ja) * | 2006-04-04 | 2009-01-14 | セイコーエプソン株式会社 | 光学多層膜フィルタ、光学多層膜フィルタの製造方法および電子機器装置 |
| FR2913116B1 (fr) * | 2007-02-23 | 2009-08-28 | Essilor Int | Procede de fabrication d'un article optique revetu d'un revetement anti-reflets ou reflechissant ayant des proprietes d'adhesion et de resistance a l'abrasion ameliorees |
| JP5262066B2 (ja) * | 2007-10-31 | 2013-08-14 | 凸版印刷株式会社 | 反射防止フィルムの製造方法及びこれを含む偏光板の製造方法 |
| JP2009139925A (ja) * | 2007-11-16 | 2009-06-25 | Epson Toyocom Corp | 光学多層膜フィルタ、光学多層膜フィルタの製造方法および電子機器装置 |
| JP2010102157A (ja) * | 2008-10-24 | 2010-05-06 | Seiko Epson Corp | 光学物品およびその製造方法 |
| JP2012118536A (ja) * | 2009-10-09 | 2012-06-21 | Seiko Epson Corp | 光学物品、光学物品の製造方法、電子機器 |
| JP5777278B2 (ja) * | 2009-12-01 | 2015-09-09 | キヤノン株式会社 | 光学素子の製造方法 |
| JP2012027412A (ja) * | 2010-07-28 | 2012-02-09 | Konica Minolta Opto Inc | 光学素子およびその製造方法 |
| JP6234857B2 (ja) * | 2014-03-24 | 2017-11-22 | 富士フイルム株式会社 | 反射防止機能付きレンズの製造方法 |
-
2019
- 2019-08-08 JP JP2019146114A patent/JP7493918B2/ja active Active
-
2020
- 2020-07-27 WO PCT/JP2020/028713 patent/WO2021024834A1/ja not_active Ceased
- 2020-07-27 CN CN202080043467.8A patent/CN113966409A/zh active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004163549A (ja) | 2002-11-11 | 2004-06-10 | Pentax Corp | 反射防止膜 |
| JP2005338366A (ja) | 2004-05-26 | 2005-12-08 | Olympus Corp | 反射防止膜及び光学部品 |
| JP2010140008A (ja) | 2008-11-13 | 2010-06-24 | Seiko Epson Corp | 光学物品およびその製造方法 |
| WO2012169393A1 (ja) | 2011-06-10 | 2012-12-13 | オリンパス株式会社 | 反射防止膜、光学系、及び光学機器 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2021026163A (ja) | 2021-02-22 |
| WO2021024834A1 (ja) | 2021-02-11 |
| CN113966409A (zh) | 2022-01-21 |
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