JP7453020B2 - 基板処理方法 - Google Patents

基板処理方法 Download PDF

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Publication number
JP7453020B2
JP7453020B2 JP2020038822A JP2020038822A JP7453020B2 JP 7453020 B2 JP7453020 B2 JP 7453020B2 JP 2020038822 A JP2020038822 A JP 2020038822A JP 2020038822 A JP2020038822 A JP 2020038822A JP 7453020 B2 JP7453020 B2 JP 7453020B2
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JP
Japan
Prior art keywords
substrate
nozzle
processing liquid
processing
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020038822A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021141241A (ja
Inventor
貴大 山口
隼 澤島
克栄 東
健司 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2020038822A priority Critical patent/JP7453020B2/ja
Priority to TW110106261A priority patent/TWI813950B/zh
Priority to KR1020210027928A priority patent/KR20210113061A/ko
Priority to CN202110243978.0A priority patent/CN113363180A/zh
Publication of JP2021141241A publication Critical patent/JP2021141241A/ja
Priority to KR1020230053315A priority patent/KR102643412B1/ko
Priority to KR1020230053314A priority patent/KR20230062497A/ko
Priority to JP2024034776A priority patent/JP2024053042A/ja
Application granted granted Critical
Publication of JP7453020B2 publication Critical patent/JP7453020B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • B05B1/04—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
    • B05B1/044—Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
    • B05B13/0405—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with reciprocating or oscillating spray heads
    • B05B13/041—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with reciprocating or oscillating spray heads with spray heads reciprocating along a straight line
    • B05B13/0415—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with reciprocating or oscillating spray heads with spray heads reciprocating along a straight line the angular position of the spray heads relative to the straight line being modified during the reciprocating movement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B3/00—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements
    • B05B3/02—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements
    • B05B3/021—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements with means for regulating the jet relative to the horizontal angular position of the nozzle, e.g. for spraying non circular areas by changing the elevation of the nozzle or by varying the nozzle flow-rate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02021—Edge treatment, chamfering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP2020038822A 2020-03-06 2020-03-06 基板処理方法 Active JP7453020B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2020038822A JP7453020B2 (ja) 2020-03-06 2020-03-06 基板処理方法
TW110106261A TWI813950B (zh) 2020-03-06 2021-02-23 基板處理方法
KR1020210027928A KR20210113061A (ko) 2020-03-06 2021-03-03 기판 처리 방법
CN202110243978.0A CN113363180A (zh) 2020-03-06 2021-03-05 衬底处理方法
KR1020230053315A KR102643412B1 (ko) 2020-03-06 2023-04-24 기판 처리 방법
KR1020230053314A KR20230062497A (ko) 2020-03-06 2023-04-24 기판 처리 방법
JP2024034776A JP2024053042A (ja) 2020-03-06 2024-03-07 基板処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020038822A JP7453020B2 (ja) 2020-03-06 2020-03-06 基板処理方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024034776A Division JP2024053042A (ja) 2020-03-06 2024-03-07 基板処理方法

Publications (2)

Publication Number Publication Date
JP2021141241A JP2021141241A (ja) 2021-09-16
JP7453020B2 true JP7453020B2 (ja) 2024-03-19

Family

ID=77524884

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020038822A Active JP7453020B2 (ja) 2020-03-06 2020-03-06 基板処理方法
JP2024034776A Pending JP2024053042A (ja) 2020-03-06 2024-03-07 基板処理方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024034776A Pending JP2024053042A (ja) 2020-03-06 2024-03-07 基板処理方法

Country Status (4)

Country Link
JP (2) JP7453020B2 (zh)
KR (3) KR20210113061A (zh)
CN (1) CN113363180A (zh)
TW (1) TWI813950B (zh)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070231483A1 (en) 2006-03-28 2007-10-04 Hiromitsu Nanba Liquid processing apparatus and liquid processing method
JP2011029455A (ja) 2009-07-27 2011-02-10 Shibaura Mechatronics Corp 基板の処理装置及び処理方法
US20150014788A1 (en) 2013-07-12 2015-01-15 Min-Yeop Park Semiconductor device and fabricating method thereof
JP2015103656A (ja) 2013-11-25 2015-06-04 東京エレクトロン株式会社 液処理装置、液処理方法及び記憶媒体
US20190096720A1 (en) 2017-09-25 2019-03-28 SCREEN Holdings Co., Ltd. Substrate treatment device and substrate treatment method
JP2019091816A (ja) 2017-11-15 2019-06-13 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6064875U (ja) 1983-10-13 1985-05-08 小瀬木　進 名刺用紙
JPH08195370A (ja) * 1995-01-13 1996-07-30 Sony Corp エッジクリーン方法
US6267853B1 (en) * 1999-07-09 2001-07-31 Applied Materials, Inc. Electro-chemical deposition system
JP3641156B2 (ja) * 1999-03-15 2005-04-20 株式会社東芝 新規微生物および海生物の生物処理法
JP4089809B2 (ja) * 2002-03-13 2008-05-28 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 半導体ウェーハのエッジ部の酸化膜除去装置
JP2007299960A (ja) * 2006-04-28 2007-11-15 Toshiba Corp 半導体装置及びその製造方法
JP4788785B2 (ja) * 2009-02-06 2011-10-05 東京エレクトロン株式会社 現像装置、現像処理方法及び記憶媒体

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070231483A1 (en) 2006-03-28 2007-10-04 Hiromitsu Nanba Liquid processing apparatus and liquid processing method
JP2007266302A (ja) 2006-03-28 2007-10-11 Tokyo Electron Ltd 液処理装置および液処理方法ならびにコンピュータ読取可能な記憶媒体
JP2011029455A (ja) 2009-07-27 2011-02-10 Shibaura Mechatronics Corp 基板の処理装置及び処理方法
US20150014788A1 (en) 2013-07-12 2015-01-15 Min-Yeop Park Semiconductor device and fabricating method thereof
JP2015103656A (ja) 2013-11-25 2015-06-04 東京エレクトロン株式会社 液処理装置、液処理方法及び記憶媒体
US20190096720A1 (en) 2017-09-25 2019-03-28 SCREEN Holdings Co., Ltd. Substrate treatment device and substrate treatment method
JP2019091816A (ja) 2017-11-15 2019-06-13 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置

Also Published As

Publication number Publication date
JP2021141241A (ja) 2021-09-16
TWI813950B (zh) 2023-09-01
CN113363180A (zh) 2021-09-07
KR20230062498A (ko) 2023-05-09
JP2024053042A (ja) 2024-04-12
KR20210113061A (ko) 2021-09-15
KR20230062497A (ko) 2023-05-09
TW202201522A (zh) 2022-01-01
KR102643412B1 (ko) 2024-03-05

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