JP7428646B2 - 金属張積層板及び回路基板 - Google Patents

金属張積層板及び回路基板 Download PDF

Info

Publication number
JP7428646B2
JP7428646B2 JP2020532311A JP2020532311A JP7428646B2 JP 7428646 B2 JP7428646 B2 JP 7428646B2 JP 2020532311 A JP2020532311 A JP 2020532311A JP 2020532311 A JP2020532311 A JP 2020532311A JP 7428646 B2 JP7428646 B2 JP 7428646B2
Authority
JP
Japan
Prior art keywords
polyimide
residue
layer
diamine
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020532311A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2020022129A1 (ja
JPWO2020022129A5 (zh
Inventor
芳樹 須藤
智之 鈴木
康弘 安達
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Chemical and Materials Co Ltd
Original Assignee
Nippon Steel Chemical and Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Chemical and Materials Co Ltd filed Critical Nippon Steel Chemical and Materials Co Ltd
Publication of JPWO2020022129A1 publication Critical patent/JPWO2020022129A1/ja
Publication of JPWO2020022129A5 publication Critical patent/JPWO2020022129A5/ja
Application granted granted Critical
Publication of JP7428646B2 publication Critical patent/JP7428646B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B32B15/088Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyamides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1075Partially aromatic polyimides
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Laminated Bodies (AREA)
JP2020532311A 2018-07-25 2019-07-17 金属張積層板及び回路基板 Active JP7428646B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018139844 2018-07-25
JP2018139844 2018-07-25
PCT/JP2019/027994 WO2020022129A1 (ja) 2018-07-25 2019-07-17 金属張積層板及び回路基板

Publications (3)

Publication Number Publication Date
JPWO2020022129A1 JPWO2020022129A1 (ja) 2021-08-05
JPWO2020022129A5 JPWO2020022129A5 (zh) 2022-07-08
JP7428646B2 true JP7428646B2 (ja) 2024-02-06

Family

ID=69180524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020532311A Active JP7428646B2 (ja) 2018-07-25 2019-07-17 金属張積層板及び回路基板

Country Status (5)

Country Link
JP (1) JP7428646B2 (zh)
KR (1) KR20210036342A (zh)
CN (1) CN112469560B (zh)
TW (1) TWI804658B (zh)
WO (1) WO2020022129A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240046171A (ko) * 2021-08-13 2024-04-08 엘지전자 주식회사 복합 폴리이미드 기판, 복합 폴리이미드 조성물 및 이를 이용한 인쇄 회로 기판
CN113604045B (zh) * 2021-08-31 2022-09-02 烟台丰鲁精细化工有限责任公司 一种低介电性能的热塑性聚酰亚胺树脂复合薄膜及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016159060A1 (ja) 2015-03-31 2016-10-06 株式会社カネカ 多層接着フィルム及びフレキシブル金属張積層板
JP2016188298A (ja) 2015-03-30 2016-11-04 新日鉄住金化学株式会社 ポリイミド、樹脂フィルム、金属張積層体及び回路基板
JP2017144730A (ja) 2016-02-12 2017-08-24 株式会社カネカ 多層ポリイミドフィルム、およびフレキシブル金属張積層板
WO2018061727A1 (ja) 2016-09-29 2018-04-05 新日鉄住金化学株式会社 ポリイミドフィルム、銅張積層板及び回路基板

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6031396B2 (ja) 1979-03-14 1985-07-22 松下電器産業株式会社 スピ−カシステム
JP3482723B2 (ja) * 1995-02-21 2004-01-06 宇部興産株式会社 多層芳香族ポリイミドフィルム
JP3827859B2 (ja) * 1998-04-13 2006-09-27 三井化学株式会社 ポリイミド−金属積層体及びその製造方法
JP5886027B2 (ja) * 2011-12-21 2016-03-16 新日鉄住金化学株式会社 両面金属張積層板およびその製造方法
JP6473028B2 (ja) 2015-03-31 2019-02-20 日鉄ケミカル&マテリアル株式会社 銅張積層板、プリント配線板及びその使用方法
JP6427454B2 (ja) 2015-03-31 2018-11-21 日鉄ケミカル&マテリアル株式会社 銅張積層板及びプリント配線板

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016188298A (ja) 2015-03-30 2016-11-04 新日鉄住金化学株式会社 ポリイミド、樹脂フィルム、金属張積層体及び回路基板
WO2016159060A1 (ja) 2015-03-31 2016-10-06 株式会社カネカ 多層接着フィルム及びフレキシブル金属張積層板
JP2017144730A (ja) 2016-02-12 2017-08-24 株式会社カネカ 多層ポリイミドフィルム、およびフレキシブル金属張積層板
WO2018061727A1 (ja) 2016-09-29 2018-04-05 新日鉄住金化学株式会社 ポリイミドフィルム、銅張積層板及び回路基板

Also Published As

Publication number Publication date
WO2020022129A1 (ja) 2020-01-30
JPWO2020022129A1 (ja) 2021-08-05
TW202010635A (zh) 2020-03-16
TWI804658B (zh) 2023-06-11
CN112469560B (zh) 2023-05-16
CN112469560A (zh) 2021-03-09
KR20210036342A (ko) 2021-04-02

Similar Documents

Publication Publication Date Title
JP6908590B2 (ja) ポリアミド酸、熱可塑性ポリイミド、樹脂フィルム、金属張積層板及び回路基板
TW201825295A (zh) 聚醯亞胺膜、銅張積層板及電路基板
JP7446741B2 (ja) 金属張積層板及び回路基板
JP6403460B2 (ja) 金属張積層体、回路基板及びポリイミド
JP2006270029A (ja) 配線基板用積層体
JP2015127117A (ja) 金属張積層体及び回路基板
JP2017165909A (ja) ポリイミド、樹脂フィルム及び金属張積層板
JP7428646B2 (ja) 金属張積層板及び回路基板
KR20070007296A (ko) 배선기판용 적층체
KR20190038383A (ko) 폴리이미드 필름, 금속장 적층판 및 회로 기판
KR20210084275A (ko) 금속 피복 적층판 및 회로 기판
JPWO2020022129A5 (zh)
JP7453432B2 (ja) 金属張積層板及び回路基板
KR20230117670A (ko) 금속 피복 적층판 및 회로 기판
JP7212518B2 (ja) 金属張積層板、その製造方法及び回路基板
JP2015127118A (ja) 金属張積層体及び回路基板
JP2015193117A (ja) 金属張積層体及び回路基板
JP2020015237A (ja) 金属張積層板の製造方法及び回路基板の製造方法
TW202319444A (zh) 聚醯胺酸、聚醯亞胺、聚醯亞胺膜、金屬包覆積層板及電路基板
JP7405644B2 (ja) 金属張積層板及び回路基板
TW202225276A (zh) 聚醯亞胺膜、覆金屬層疊板、覆金屬層疊板的製造方法及電路基板
JP7093282B2 (ja) 金属張積層板及び回路基板
JP7453434B2 (ja) 金属張積層板及び回路基板
JP7453433B2 (ja) 金属張積層板及び回路基板
TW202237765A (zh) 電路基板

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220607

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220607

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220627

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220630

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230411

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230606

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230829

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20231011

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240123

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240125

R150 Certificate of patent or registration of utility model

Ref document number: 7428646

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150