JP7423396B2 - 情報処理装置、検出方法、プログラム、基板処理システム、及び物品の製造方法 - Google Patents

情報処理装置、検出方法、プログラム、基板処理システム、及び物品の製造方法 Download PDF

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JP7423396B2
JP7423396B2 JP2020071692A JP2020071692A JP7423396B2 JP 7423396 B2 JP7423396 B2 JP 7423396B2 JP 2020071692 A JP2020071692 A JP 2020071692A JP 2020071692 A JP2020071692 A JP 2020071692A JP 7423396 B2 JP7423396 B2 JP 7423396B2
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sensors
control
abnormality
unit
control unit
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JP2021168364A5 (enExample
JP2021168364A (ja
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充宏 増田
裕紀 鮫島
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Canon Inc
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Canon Inc
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Priority to JP2020071692A priority Critical patent/JP7423396B2/ja
Priority to TW110103938A priority patent/TWI838606B/zh
Priority to KR1020210039465A priority patent/KR20210127089A/ko
Priority to CN202110382069.5A priority patent/CN113539885B/zh
Publication of JP2021168364A publication Critical patent/JP2021168364A/ja
Publication of JP2021168364A5 publication Critical patent/JP2021168364A5/ja
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0243—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults model based detection method, e.g. first-principles knowledge model
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1927—Control of temperature characterised by the use of electric means using a plurality of sensors
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/20—Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/04—Architecture, e.g. interconnection topology
    • G06N3/045—Combinations of networks
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/08—Learning methods
    • G06N3/084—Backpropagation, e.g. using gradient descent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/49—Nc machine tool, till multiple
    • G05B2219/49215—Regulate temperature of coolant
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Theoretical Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Software Systems (AREA)
  • Evolutionary Computation (AREA)
  • Computing Systems (AREA)
  • General Engineering & Computer Science (AREA)
  • Biomedical Technology (AREA)
  • Mathematical Physics (AREA)
  • Biophysics (AREA)
  • Artificial Intelligence (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Data Mining & Analysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computational Linguistics (AREA)
  • Health & Medical Sciences (AREA)
  • General Factory Administration (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing And Monitoring For Control Systems (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
JP2020071692A 2020-04-13 2020-04-13 情報処理装置、検出方法、プログラム、基板処理システム、及び物品の製造方法 Active JP7423396B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2020071692A JP7423396B2 (ja) 2020-04-13 2020-04-13 情報処理装置、検出方法、プログラム、基板処理システム、及び物品の製造方法
TW110103938A TWI838606B (zh) 2020-04-13 2021-02-03 資訊處理裝置、檢測方法、程式、基板處理系統及物品之製造方法
KR1020210039465A KR20210127089A (ko) 2020-04-13 2021-03-26 정보 처리 장치, 검출 방법, 프로그램, 기판 처리 시스템, 및 물품의 제조 방법
CN202110382069.5A CN113539885B (zh) 2020-04-13 2021-04-09 信息处理装置、检测方法、基板处理系统及物品的制造方法

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JP2020071692A JP7423396B2 (ja) 2020-04-13 2020-04-13 情報処理装置、検出方法、プログラム、基板処理システム、及び物品の製造方法

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JP2021168364A JP2021168364A (ja) 2021-10-21
JP2021168364A5 JP2021168364A5 (enExample) 2023-04-10
JP7423396B2 true JP7423396B2 (ja) 2024-01-29

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KR (1) KR20210127089A (enExample)
CN (1) CN113539885B (enExample)
TW (1) TWI838606B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023102218A (ja) * 2022-01-11 2023-07-24 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置管理システム、基板処理装置管理方法および基板処理装置管理プログラム
JP2023103123A (ja) * 2022-01-13 2023-07-26 株式会社Ｓｃｒｅｅｎホールディングス 適正判定装置および適正判定方法
JP2023105744A (ja) * 2022-01-19 2023-07-31 株式会社Ｓｃｒｅｅｎホールディングス 支援装置、支援方法および支援プログラム
EP4485503A1 (en) * 2022-02-22 2025-01-01 SCREEN Holdings Co., Ltd. Substrate processing apparatus management system, assistance apparatus, substrate processing apparatus, inter-chamber performance comparison method, and inter-chamber performance comparison program
JP2023122512A (ja) * 2022-02-22 2023-09-01 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置管理システム、支援装置、基板処理装置、チャンバ間性能比較方法およびチャンバ間性能比較プログラム
JP7750775B2 (ja) * 2022-03-02 2025-10-07 株式会社Ｓｃｒｅｅｎホールディングス 制御支援装置および制御支援方法
JP2023132914A (ja) * 2022-03-11 2023-09-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置管理システム、管理装置、基板処理装置、基板処理装置管理方法および基板処理装置管理プログラム
JP2023169060A (ja) * 2022-05-16 2023-11-29 横河電機株式会社 装置、方法およびプログラム
CN115798167B (zh) * 2023-01-05 2023-04-21 石家庄市惠源淀粉有限公司 用于淀粉葡萄糖生产工艺的设备异常报警方法及装置

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000243678A (ja) 1998-12-24 2000-09-08 Toshiba Corp モニタリング装置とその方法
JP2005136004A (ja) 2003-10-28 2005-05-26 Nikon Corp 露光装置、およびデバイス製造方法
US7065422B1 (en) 2002-06-28 2006-06-20 Advanced Micro Devices, Inc. Method and apparatus for system state classification
JP2007219692A (ja) 2006-02-15 2007-08-30 Omron Corp プロセス異常分析装置およびプロセス異常分析システム並びにプログラム
WO2015145500A1 (ja) 2014-03-27 2015-10-01 日本電気株式会社 システム分析装置、分析モデル生成方法、システム分析方法およびシステム分析プログラム
JP2017021702A (ja) 2015-07-14 2017-01-26 中国電力株式会社 故障予兆監視方法
JP2019101495A (ja) 2017-11-28 2019-06-24 横河電機株式会社 診断装置、診断方法、プログラム、および記録媒体
JP2020035407A (ja) 2018-08-31 2020-03-05 株式会社日立パワーソリューションズ 異常予兆診断装置及び異常予兆診断方法
JP2020047077A (ja) 2018-09-20 2020-03-26 株式会社Ｓｃｒｅｅｎホールディングス データ処理方法、データ処理装置、および、データ処理プログラム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006278396A (ja) * 2005-03-28 2006-10-12 Tokyo Electron Ltd 処理装置及びプログラム
JP5811683B2 (ja) * 2011-08-18 2015-11-11 株式会社Ihi 異常診断装置
JP2014143927A (ja) * 2013-01-28 2014-08-14 Hitachi High-Technologies Corp 核酸増幅装置および温度調節機能の異常検出方法
JP2018147406A (ja) * 2017-03-08 2018-09-20 安川情報システム株式会社 品質異常検知方法、品質異常検知装置および品質異常検知プログラム
JP6853148B2 (ja) * 2017-09-07 2021-03-31 日本電信電話株式会社 検知装置、検知方法及び検知プログラム
JP7034646B2 (ja) * 2017-09-25 2022-03-14 株式会社Ｓｃｒｅｅｎホールディングス 異常検知装置、及び異常検知方法
JP6808684B2 (ja) * 2018-06-14 2021-01-06 キヤノン株式会社 情報処理装置、判定方法、プログラム、リソグラフィシステム、および物品の製造方法
JP7021746B2 (ja) * 2018-06-15 2022-02-17 株式会社Ｓｃｒｅｅｎホールディングス 処理装置および処理方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000243678A (ja) 1998-12-24 2000-09-08 Toshiba Corp モニタリング装置とその方法
US7065422B1 (en) 2002-06-28 2006-06-20 Advanced Micro Devices, Inc. Method and apparatus for system state classification
JP2005136004A (ja) 2003-10-28 2005-05-26 Nikon Corp 露光装置、およびデバイス製造方法
JP2007219692A (ja) 2006-02-15 2007-08-30 Omron Corp プロセス異常分析装置およびプロセス異常分析システム並びにプログラム
WO2015145500A1 (ja) 2014-03-27 2015-10-01 日本電気株式会社 システム分析装置、分析モデル生成方法、システム分析方法およびシステム分析プログラム
JP2017021702A (ja) 2015-07-14 2017-01-26 中国電力株式会社 故障予兆監視方法
JP2019101495A (ja) 2017-11-28 2019-06-24 横河電機株式会社 診断装置、診断方法、プログラム、および記録媒体
JP2020035407A (ja) 2018-08-31 2020-03-05 株式会社日立パワーソリューションズ 異常予兆診断装置及び異常予兆診断方法
JP2020047077A (ja) 2018-09-20 2020-03-26 株式会社Ｓｃｒｅｅｎホールディングス データ処理方法、データ処理装置、および、データ処理プログラム

Also Published As

Publication number Publication date
CN113539885A (zh) 2021-10-22
TW202208996A (zh) 2022-03-01
KR20210127089A (ko) 2021-10-21
JP2021168364A (ja) 2021-10-21
TWI838606B (zh) 2024-04-11
CN113539885B (zh) 2025-06-27

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