JP7220980B2 - 表示装置製造用のマスクブランク用基板の製造方法、マスクブランクの製造方法、及びマスクの製造方法 - Google Patents

表示装置製造用のマスクブランク用基板の製造方法、マスクブランクの製造方法、及びマスクの製造方法 Download PDF

Info

Publication number
JP7220980B2
JP7220980B2 JP2017220801A JP2017220801A JP7220980B2 JP 7220980 B2 JP7220980 B2 JP 7220980B2 JP 2017220801 A JP2017220801 A JP 2017220801A JP 2017220801 A JP2017220801 A JP 2017220801A JP 7220980 B2 JP7220980 B2 JP 7220980B2
Authority
JP
Japan
Prior art keywords
main surface
substrate
mask blank
manufacturing
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017220801A
Other languages
English (en)
Japanese (ja)
Other versions
JP2018106147A (ja
Inventor
順一 安森
誠治 坪井
明宏 河原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to KR1020170169612A priority Critical patent/KR102533073B1/ko
Publication of JP2018106147A publication Critical patent/JP2018106147A/ja
Application granted granted Critical
Publication of JP7220980B2 publication Critical patent/JP7220980B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02024—Mirror polishing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
JP2017220801A 2016-12-22 2017-11-16 表示装置製造用のマスクブランク用基板の製造方法、マスクブランクの製造方法、及びマスクの製造方法 Active JP7220980B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020170169612A KR102533073B1 (ko) 2016-12-22 2017-12-11 표시 장치 제조용 마스크 블랭크용 기판의 제조 방법, 마스크 블랭크의 제조 방법 및 마스크의 제조 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016249328 2016-12-22
JP2016249328 2016-12-22

Publications (2)

Publication Number Publication Date
JP2018106147A JP2018106147A (ja) 2018-07-05
JP7220980B2 true JP7220980B2 (ja) 2023-02-13

Family

ID=62787831

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017220801A Active JP7220980B2 (ja) 2016-12-22 2017-11-16 表示装置製造用のマスクブランク用基板の製造方法、マスクブランクの製造方法、及びマスクの製造方法

Country Status (2)

Country Link
JP (1) JP7220980B2 (ko)
KR (1) KR102533073B1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6948988B2 (ja) * 2018-06-26 2021-10-13 クアーズテック株式会社 フォトマスク用基板およびその製造方法
WO2022203364A1 (ko) * 2021-03-26 2022-09-29 삼성전자 주식회사 피듀셜 마크를 포함하는 하우징을 포함하는 전자 장치 및 그 제조 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012023252A (ja) 2010-07-15 2012-02-02 Dainippon Printing Co Ltd 反射型マスクブランクス、反射型マスク、および反射型マスクブランクスの製造方法
JP2014084234A (ja) 2012-10-19 2014-05-12 Hoya Corp 電子機器用カバーガラスのガラス基板及びその製造方法
JP2016069993A (ja) 2014-09-30 2016-05-09 大日本印刷株式会社 採光具
JP6080450B2 (ja) 2012-09-21 2017-02-15 株式会社タダノ 監視カメラ装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5915938A (ja) * 1982-07-19 1984-01-27 Hoya Corp マ−キングを施されたフオトマスクブランクス用基板
JPS59200238A (ja) * 1983-04-27 1984-11-13 Fujitsu Ltd フオトマスクの製造方法
JPS6080450U (ja) * 1983-11-07 1985-06-04 日本電気株式会社 フオトマスク基板
JPS626259A (ja) * 1985-07-02 1987-01-13 Sharp Corp フオトマスク基板
JPS6275532A (ja) * 1985-09-30 1987-04-07 Toshiba Corp 基板の製造方法
JPH04110944A (ja) * 1990-08-31 1992-04-13 Nippon Sekiei Glass Kk 透明材料のマーキング方法
JPH0571855U (ja) * 1992-02-28 1993-09-28 大日本印刷株式会社 フォトマスク用ガラス基板
KR20030053085A (ko) * 2001-12-22 2003-06-28 주식회사 실트론 실리콘 웨이퍼의 제조방법
JP2008151916A (ja) * 2006-12-15 2008-07-03 Shin Etsu Chem Co Ltd 大型フォトマスク基板のリサイクル方法
JP5176641B2 (ja) * 2008-03-27 2013-04-03 凸版印刷株式会社 ハーフトーン型位相シフトマスク及びその製造方法
JP4839411B2 (ja) * 2009-02-13 2011-12-21 Ｈｏｙａ株式会社 マスクブランク用基板、マスクブランクおよびフォトマスク
CN102472712A (zh) * 2009-07-24 2012-05-23 旭硝子株式会社 玻璃部件的质量管理方法和质量管理装置以及带标记的玻璃部件
JP5578708B2 (ja) * 2010-04-19 2014-08-27 Ｈｏｙａ株式会社 Ｆｐｄ製造用再生フォトマスク基板の製造方法、再生フォトマスク用ブランクの製造方法、ペリクル付再生フォトマスクの製造方法及びパターン転写方法
KR20120056905A (ko) * 2010-08-02 2012-06-05 주식회사 에스앤에스텍 포토마스크 블랭크용 투명 기판, 포토마스크 블랭크 및 그의 제조 방법
JP6067529B2 (ja) 2013-10-09 2017-01-25 日本板硝子株式会社 マーク付きコーティングガラス板の製造方法
JP2015119087A (ja) 2013-12-19 2015-06-25 古河機械金属株式会社 マーク付き窒化物半導体基板の製造方法
JP2018076207A (ja) * 2016-11-10 2018-05-17 旭硝子株式会社 ガラス板およびガラス板の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012023252A (ja) 2010-07-15 2012-02-02 Dainippon Printing Co Ltd 反射型マスクブランクス、反射型マスク、および反射型マスクブランクスの製造方法
JP6080450B2 (ja) 2012-09-21 2017-02-15 株式会社タダノ 監視カメラ装置
JP2014084234A (ja) 2012-10-19 2014-05-12 Hoya Corp 電子機器用カバーガラスのガラス基板及びその製造方法
JP2016069993A (ja) 2014-09-30 2016-05-09 大日本印刷株式会社 採光具

Also Published As

Publication number Publication date
KR20180073451A (ko) 2018-07-02
JP2018106147A (ja) 2018-07-05
KR102533073B1 (ko) 2023-05-17

Similar Documents

Publication Publication Date Title
JP6420383B2 (ja) マスクブランク用ガラス基板、多層反射膜付き基板、マスクブランク及びマスク
US10295900B2 (en) Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
US10620527B2 (en) Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
US8039178B2 (en) Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks
JP6216835B2 (ja) マスクブランク用基板、マスクブランク、反射型マスクブランク、転写マスク、及び反射型マスク、並びにそれらの製造方法
WO2004008247A1 (ja) マスクブランクス用ガラス基板、及びその製造方法
JP2010085867A (ja) マスクブランク用基板セットおよびマスクブランクセット
WO2015145887A1 (ja) マスクブランク用基板、マスクブランク及び転写用マスク、並びにそれらの製造方法
CN106933026A (zh) 光掩模和光掩模基板及其制造方法、光掩模坯体、显示装置制造方法
JP7220980B2 (ja) 表示装置製造用のマスクブランク用基板の製造方法、マスクブランクの製造方法、及びマスクの製造方法
JP3764734B2 (ja) マスクブランクスの製造方法
JP2006146250A (ja) マスクブランクス用ガラス基板、及び転写マスク
JP6618843B2 (ja) フォトマスク用基板のリサイクル方法、フォトマスク用基板の製造方法、フォトマスクブランクの製造方法、フォトマスクの製造方法、及びパターン転写方法
JP2004302280A (ja) マスクブランクス用基板の製造方法、及びマスクブランクスの製造方法、並びに転写マスクの製造方法
JP2017111371A (ja) マスクブランク用基板の製造方法、マスクブランクの製造方法及び露光用マスクの製造方法
JP2014002395A (ja) マスクブランク用基板セットの製造方法、マスクブランクセットの製造方法、フォトマスクセットの製造方法、及び半導体デバイスの製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171122

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20200902

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20210623

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210727

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210924

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20211130

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20220128

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220309

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20220802

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20221031

C60 Trial request (containing other claim documents, opposition documents)

Free format text: JAPANESE INTERMEDIATE CODE: C60

Effective date: 20221031

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20221115

C21 Notice of transfer of a case for reconsideration by examiners before appeal proceedings

Free format text: JAPANESE INTERMEDIATE CODE: C21

Effective date: 20221122

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20230124

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20230201

R150 Certificate of patent or registration of utility model

Ref document number: 7220980

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150