JP7203028B2 - 硬化性高屈折率インク組成物及びインク組成物から調製された物品 - Google Patents

硬化性高屈折率インク組成物及びインク組成物から調製された物品 Download PDF

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JP7203028B2
JP7203028B2 JP2019535937A JP2019535937A JP7203028B2 JP 7203028 B2 JP7203028 B2 JP 7203028B2 JP 2019535937 A JP2019535937 A JP 2019535937A JP 2019535937 A JP2019535937 A JP 2019535937A JP 7203028 B2 JP7203028 B2 JP 7203028B2
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ink composition
meth
acrylate
aromatic
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JP2020506251A (ja
JP2020506251A5 (https=
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エル. シュワルツ,エヴァン
ハートマン-トムソン,クレア
ブイ. ハント,ブライアン
ジェイ. シッター,ブレット
エー. ヴォルプ,ケリー
チャクラボーティ,サスワタ
エス. マホニー,ウェイン
エー. シリマン,タビサ
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3M Innovative Properties Co
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/14Methyl esters, e.g. methyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/38Esters containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/26Esters of unsaturated alcohols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10Homopolymers or copolymers of methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/844Encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/38Esters containing sulfur
    • C08F220/382Esters containing sulfur and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301Details of OLEDs
    • H10K2102/351Thickness
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301Details of OLEDs
    • H10K2102/361Temperature

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
JP2019535937A 2016-12-29 2017-12-27 硬化性高屈折率インク組成物及びインク組成物から調製された物品 Active JP7203028B2 (ja)

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Application Number Priority Date Filing Date Title
US201662439973P 2016-12-29 2016-12-29
US62/439,973 2016-12-29
PCT/IB2017/058440 WO2018122748A1 (en) 2016-12-29 2017-12-27 Curable high refractive index ink compositions and articles prepared from the ink compositions

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JP2020506251A JP2020506251A (ja) 2020-02-27
JP2020506251A5 JP2020506251A5 (https=) 2021-03-04
JP7203028B2 true JP7203028B2 (ja) 2023-01-12

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US (1) US11584863B2 (https=)
EP (1) EP3562895B1 (https=)
JP (1) JP7203028B2 (https=)
KR (1) KR102533500B1 (https=)
CN (1) CN110121538B (https=)
WO (1) WO2018122748A1 (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019023096A1 (en) 2017-07-26 2019-01-31 3M Innovative Properties Company HIGH-REFRACTIVE INDEX CURABLE INK COMPOSITIONS AND ARTICLES PREPARED THEREFROM INK COMPOSITIONS
US11834535B2 (en) 2018-05-15 2023-12-05 3M Innovative Properties Company Curable high refractive index compositions and articles prepared from them
EP3820920B1 (en) 2018-07-12 2025-05-14 3M Innovative Properties Company Composition comprising styrene isobutylene block copolymer and ethylenically unsaturated monomer
US20200339828A1 (en) * 2019-04-26 2020-10-29 Canon Kabushiki Kaisha Photocurable composition
US12492275B2 (en) 2019-09-12 2025-12-09 Arkema France Photo-curable compositions containing high refractive index monomers for use in 3D printing applications
WO2021064530A1 (en) * 2019-09-30 2021-04-08 3M Innovative Properties Company Dicarboxylic acid compounds. inorganic particles treated with the dicarboxylic acid compounds, and compositions thereof
KR102284512B1 (ko) * 2019-11-25 2021-08-02 주식회사 케이씨텍 수분량이 제어된 무기 산화물 분산액 및 이의 제조방법
CN114761497B (zh) * 2019-11-28 2024-02-20 东京应化工业株式会社 感光性油墨组合物、固化物、显示面板、及固化物的制造方法
WO2021260601A1 (en) 2020-06-25 2021-12-30 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions
CN116349428A (zh) * 2020-10-08 2023-06-27 3M创新有限公司 具有高折射率的金属-聚合物杂化材料
CN112322195B (zh) * 2020-11-03 2023-05-16 西安思摩威新材料有限公司 一种紫外光固化组合物胶水及其使用方法和应用
JPWO2022203081A1 (https=) * 2021-03-26 2022-09-29
US20230061791A1 (en) * 2021-08-16 2023-03-02 Vadient Optics Llc Grin lenses made by 3d printing monomer-based inks
CN113999565B (zh) * 2021-12-10 2023-10-20 西安思摩威新材料有限公司 一种紫外光可固化的高折射率油墨及材料层
WO2023153385A1 (ja) 2022-02-08 2023-08-17 三井化学株式会社 紫外線硬化性樹脂組成物及び表示装置
CN119032140A (zh) 2022-04-01 2024-11-26 3M创新有限公司 具有增粘剂的可固化组合物
KR20250006134A (ko) * 2022-04-29 2025-01-10 쓰리엠 이노베이티브 프로퍼티즈 컴파니 물-격리제를 갖는 경화성 고굴절률 잉크 조성물
JP2024010580A (ja) * 2022-07-12 2024-01-24 互応化学工業株式会社 インクジェット用硬化性樹脂組成物、硬化物、硬化物の製造方法、ソルダーレジスト、マーキングインキ、及びプリント配線板
KR20250029227A (ko) 2022-07-26 2025-03-04 덴카 주식회사 광경화성 조성물, 광경화성 조성물의 경화물 및 발광 표시장치
CN115216178B (zh) * 2022-08-11 2023-11-28 西安思摩威新材料有限公司 一种oled封装用的油墨组合物及其制备方法
US20240117095A1 (en) * 2022-09-21 2024-04-11 Vadient Optics, Llc Grin lenses made by 3d printing monomer-based inks
CN121532475A (zh) * 2023-06-19 2026-02-13 三星Sdi株式会社 可固化组合物、使用组合物制造的固化层和包括固化层的显示装置
JP2025022338A (ja) * 2023-08-03 2025-02-14 エア・ウォーター・パフォーマンスケミカル株式会社 新規なヘテロ環を有する単量体
WO2025037176A1 (en) 2023-08-11 2025-02-20 3M Innovative Properties Company Unsaturated trithiocyanurate derivatives for curable high refractive index compositions, articles thereof, and methods of making such articles
WO2025054893A1 (en) 2023-09-14 2025-03-20 Dow Global Technologies Llc Inkjet printable ultraviolet light curable composition
CN117603108B (zh) * 2023-10-23 2024-06-04 江苏集萃光敏电子材料研究所有限公司 一种高折射可固化单体
WO2025099511A1 (en) 2023-11-08 2025-05-15 3M Innovative Properties Company Hyperbranched polythioethers, curable high refractive index compositions and articles thereof and methods of making such compounds and articles
CN118126565A (zh) * 2024-02-28 2024-06-04 浙江福斯特新材料研究院有限公司 一种油墨组合物、油墨组合物的制备方法及固化层
EP4671284A1 (en) 2024-06-27 2025-12-31 Carl Zeiss Vision International GmbH HARDENABLE EYEGLASS MATERIAL
WO2026011343A1 (en) 2024-07-10 2026-01-15 Dow Global Technologies Llc Inkjet printable ultraviolet light curable composition with thermal shock resistance

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009084313A (ja) 2007-09-27 2009-04-23 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2013185040A (ja) 2012-03-07 2013-09-19 Jnc Corp 光硬化性インクジェットインク
JP2013189532A (ja) 2012-03-13 2013-09-26 Tamura Seisakusho Co Ltd 絶縁膜形成用透明樹脂組成物
US20150361284A1 (en) 2013-02-06 2015-12-17 Sun Chemical Corporation Digital printing inks
US20170114235A1 (en) 2014-06-26 2017-04-27 Agfa Graphics Nv Aqueous radiation curable inkjet inks
WO2018105177A1 (ja) 2016-12-06 2018-06-14 Jnc株式会社 インク組成物およびこれを用いた有機電界発光素子

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU550635B2 (en) 1982-11-11 1986-03-27 Showa Denko Kabushiki Kaisha Polymerizable (meth) acryloyloxyy aromatic ethers
JP2004333687A (ja) * 2003-05-02 2004-11-25 Fuji Photo Film Co Ltd 光学部材、光学部材用重合性組成物および光学部材の製造方法
US20060293463A1 (en) * 2005-06-28 2006-12-28 General Electric Company Compositions for brightness enhancing films
US20080221291A1 (en) 2007-03-07 2008-09-11 3M Innovative Properties Company Microstructured optical films comprising biphenyl difunctional monomers
JP2009074024A (ja) * 2007-08-30 2009-04-09 Nikon-Essilor Co Ltd 光学材料用組成物、光学材料、眼鏡レンズ用基材および眼鏡レンズ
JP2011170073A (ja) * 2010-02-18 2011-09-01 Jsr Corp 硬化性組成物及び光学部材
KR101254325B1 (ko) * 2010-10-20 2013-04-12 주식회사 한농화성 페닐티오기를 함유하는 아크릴레이트 화합물 및 그의 제조방법
EP2707424B1 (en) * 2011-05-13 2020-10-28 3M Innovative Properties Company Benzyl (meth)acrylate monomers suitable for microstructured optical films
JP5212577B1 (ja) * 2012-03-12 2013-06-19 Dic株式会社 ラジカル重合性組成物、その硬化物及びプラスチックレンズ
TWI601720B (zh) 2013-03-14 2017-10-11 三菱瓦斯化學股份有限公司 Novel episulfide and optical material compositions
KR102044923B1 (ko) * 2013-04-15 2019-11-15 삼성디스플레이 주식회사 유기발광 표시장치 및 그의 제조방법
US20150349295A1 (en) 2014-05-30 2015-12-03 Samsung Sdi Co., Ltd. Gas permeation multilayer barrier with tunable index decoupling layers
US9909022B2 (en) 2014-07-25 2018-03-06 Kateeva, Inc. Organic thin film ink compositions and methods
CN105254588B (zh) * 2015-11-10 2017-10-24 中国乐凯集团有限公司 一种高折射率化合物及其应用
US11834535B2 (en) * 2018-05-15 2023-12-05 3M Innovative Properties Company Curable high refractive index compositions and articles prepared from them

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009084313A (ja) 2007-09-27 2009-04-23 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2013185040A (ja) 2012-03-07 2013-09-19 Jnc Corp 光硬化性インクジェットインク
JP2013189532A (ja) 2012-03-13 2013-09-26 Tamura Seisakusho Co Ltd 絶縁膜形成用透明樹脂組成物
US20150361284A1 (en) 2013-02-06 2015-12-17 Sun Chemical Corporation Digital printing inks
JP2016513146A (ja) 2013-02-06 2016-05-12 サン・ケミカル・コーポレーション デジタル印刷インク
US20170114235A1 (en) 2014-06-26 2017-04-27 Agfa Graphics Nv Aqueous radiation curable inkjet inks
WO2018105177A1 (ja) 2016-12-06 2018-06-14 Jnc株式会社 インク組成物およびこれを用いた有機電界発光素子

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Publication number Publication date
JP2020506251A (ja) 2020-02-27
KR102533500B1 (ko) 2023-05-16
EP3562895B1 (en) 2021-08-18
KR20190098234A (ko) 2019-08-21
CN110121538A (zh) 2019-08-13
US11584863B2 (en) 2023-02-21
EP3562895A1 (en) 2019-11-06
CN110121538B (zh) 2023-05-26
US20190352520A1 (en) 2019-11-21
WO2018122748A1 (en) 2018-07-05

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