JP7203028B2 - 硬化性高屈折率インク組成物及びインク組成物から調製された物品 - Google Patents

硬化性高屈折率インク組成物及びインク組成物から調製された物品 Download PDF

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JP7203028B2
JP7203028B2 JP2019535937A JP2019535937A JP7203028B2 JP 7203028 B2 JP7203028 B2 JP 7203028B2 JP 2019535937 A JP2019535937 A JP 2019535937A JP 2019535937 A JP2019535937 A JP 2019535937A JP 7203028 B2 JP7203028 B2 JP 7203028B2
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group
ink composition
meth
acrylate
aromatic
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JP2020506251A (ja
JP2020506251A5 (https=
Inventor
エル． シュワルツ，エヴァン
ハートマン－トムソン，クレア
ブイ． ハント，ブライアン
ジェイ． シッター，ブレット
エー． ヴォルプ，ケリー
チャクラボーティ，サスワタ
エス． マホニー，ウェイン
エー． シリマン，タビサ
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/26—Esters of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C08F220/382—Esters containing sulfur and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/361—Temperature

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
JP2019535937A 2016-12-29 2017-12-27 硬化性高屈折率インク組成物及びインク組成物から調製された物品 Active JP7203028B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662439973P 2016-12-29 2016-12-29
US62/439,973 2016-12-29
PCT/IB2017/058440 WO2018122748A1 (en) 2016-12-29 2017-12-27 Curable high refractive index ink compositions and articles prepared from the ink compositions

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JP2020506251A JP2020506251A (ja) 2020-02-27
JP2020506251A5 JP2020506251A5 (https=) 2021-03-04
JP7203028B2 true JP7203028B2 (ja) 2023-01-12

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US (1) US11584863B2 (https=)
EP (1) EP3562895B1 (https=)
JP (1) JP7203028B2 (https=)
KR (1) KR102533500B1 (https=)
CN (1) CN110121538B (https=)
WO (1) WO2018122748A1 (https=)

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CN110945090A (zh) 2017-07-26 2020-03-31 3M创新有限公司 可固化的高折射率油墨组合物和由油墨组合物制备的制品
US11834535B2 (en) 2018-05-15 2023-12-05 3M Innovative Properties Company Curable high refractive index compositions and articles prepared from them
US11643494B2 (en) 2018-07-12 2023-05-09 3M Innovative Properties Company Composition comprising styrene isobutylene block copolymer and ethylenically unsaturated monomer
US20200339828A1 (en) * 2019-04-26 2020-10-29 Canon Kabushiki Kaisha Photocurable composition
KR20220062041A (ko) * 2019-09-12 2022-05-13 아르끄마 프랑스 3d 인쇄 적용 분야에 사용하기 위한 고굴절률 단량체를 함유하는 광경화성 조성물
CN114585604B (zh) * 2019-09-30 2024-02-02 3M创新有限公司 二羧酸化合物，用二羧酸化合物处理的无机颗粒及其组合物
KR102284512B1 (ko) * 2019-11-25 2021-08-02 주식회사 케이씨텍 수분량이 제어된 무기 산화물 분산액 및 이의 제조방법
WO2021106683A1 (ja) * 2019-11-28 2021-06-03 東京応化工業株式会社 感光性インク組成物、硬化物、ディスプレイパネル、及び硬化物の製造方法
WO2021260601A1 (en) 2020-06-25 2021-12-30 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions
CN116349428A (zh) * 2020-10-08 2023-06-27 3M创新有限公司 具有高折射率的金属-聚合物杂化材料
CN112322195B (zh) * 2020-11-03 2023-05-16 西安思摩威新材料有限公司 一种紫外光固化组合物胶水及其使用方法和应用
WO2022203081A1 (ja) * 2021-03-26 2022-09-29 パナソニックＩｐマネジメント株式会社 光硬化性樹脂組成物、光学部品、光学部品の製造方法、及び発光装置
US20230061791A1 (en) * 2021-08-16 2023-03-02 Vadient Optics Llc Grin lenses made by 3d printing monomer-based inks
CN113999565B (zh) * 2021-12-10 2023-10-20 西安思摩威新材料有限公司 一种紫外光可固化的高折射率油墨及材料层
WO2023153385A1 (ja) 2022-02-08 2023-08-17 三井化学株式会社 紫外線硬化性樹脂組成物及び表示装置
US20250215128A1 (en) 2022-04-01 2025-07-03 3M Innovative Properties Company Curable compositions with adhesion promotion agents
WO2023209545A1 (en) * 2022-04-29 2023-11-02 3M Innovative Properties Company Curable high refractive index ink compositions with water-sequestration agents
JP2024010580A (ja) * 2022-07-12 2024-01-24 互応化学工業株式会社 インクジェット用硬化性樹脂組成物、硬化物、硬化物の製造方法、ソルダーレジスト、マーキングインキ、及びプリント配線板
CN119604544A (zh) 2022-07-26 2025-03-11 电化株式会社 光固化性组合物、光固化性组合物的固化物和发光显示装置
CN115216178B (zh) * 2022-08-11 2023-11-28 西安思摩威新材料有限公司 一种oled封装用的油墨组合物及其制备方法
US20240117095A1 (en) * 2022-09-21 2024-04-11 Vadient Optics, Llc Grin lenses made by 3d printing monomer-based inks
WO2024262757A1 (ko) * 2023-06-19 2024-12-26 삼성에스디아이 주식회사 경화성 조성물, 상기 조성물을 이용하여 제조된 경화막, 상기 경화막을 포함하는 디스플레이 장치
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CN117603108B (zh) * 2023-10-23 2024-06-04 江苏集萃光敏电子材料研究所有限公司 一种高折射可固化单体
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CN118126565A (zh) * 2024-02-28 2024-06-04 浙江福斯特新材料研究院有限公司 一种油墨组合物、油墨组合物的制备方法及固化层
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KR20190098234A (ko) 2019-08-21
EP3562895A1 (en) 2019-11-06
JP2020506251A (ja) 2020-02-27
EP3562895B1 (en) 2021-08-18
US11584863B2 (en) 2023-02-21
KR102533500B1 (ko) 2023-05-16
WO2018122748A1 (en) 2018-07-05
CN110121538B (zh) 2023-05-26
CN110121538A (zh) 2019-08-13
US20190352520A1 (en) 2019-11-21

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