KR102533500B1 - 경화성 고굴절률 잉크 조성물 및 잉크 조성물로부터 제조된 물품 - Google Patents

경화성 고굴절률 잉크 조성물 및 잉크 조성물로부터 제조된 물품 Download PDF

Info

Publication number
KR102533500B1
KR102533500B1 KR1020197021734A KR20197021734A KR102533500B1 KR 102533500 B1 KR102533500 B1 KR 102533500B1 KR 1020197021734 A KR1020197021734 A KR 1020197021734A KR 20197021734 A KR20197021734 A KR 20197021734A KR 102533500 B1 KR102533500 B1 KR 102533500B1
Authority
KR
South Korea
Prior art keywords
group
ink composition
meth
acrylate
aromatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020197021734A
Other languages
English (en)
Korean (ko)
Other versions
KR20190098234A (ko
Inventor
에반 엘 슈왈츠
클레리 하트만-톰슨
브라이언 브이 헌트
브렛 제이 시터
켈리 에이 볼프
사스와타 차크라보르티
웨인 에스 마호니
타비타 에이 실리맨
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 컴파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 컴파니
Publication of KR20190098234A publication Critical patent/KR20190098234A/ko
Application granted granted Critical
Publication of KR102533500B1 publication Critical patent/KR102533500B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/26—Esters of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C08F220/382—Esters containing sulfur and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/361—Temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
KR1020197021734A 2016-12-29 2017-12-27 경화성 고굴절률 잉크 조성물 및 잉크 조성물로부터 제조된 물품 Active KR102533500B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662439973P 2016-12-29 2016-12-29
US62/439,973 2016-12-29
PCT/IB2017/058440 WO2018122748A1 (en) 2016-12-29 2017-12-27 Curable high refractive index ink compositions and articles prepared from the ink compositions

Publications (2)

Publication Number Publication Date
KR20190098234A KR20190098234A (ko) 2019-08-21
KR102533500B1 true KR102533500B1 (ko) 2023-05-16

Family

ID=61028099

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197021734A Active KR102533500B1 (ko) 2016-12-29 2017-12-27 경화성 고굴절률 잉크 조성물 및 잉크 조성물로부터 제조된 물품

Country Status (6)

Country Link
US (1) US11584863B2 (https=)
EP (1) EP3562895B1 (https=)
JP (1) JP7203028B2 (https=)
KR (1) KR102533500B1 (https=)
CN (1) CN110121538B (https=)
WO (1) WO2018122748A1 (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019023096A1 (en) 2017-07-26 2019-01-31 3M Innovative Properties Company HIGH-REFRACTIVE INDEX CURABLE INK COMPOSITIONS AND ARTICLES PREPARED THEREFROM INK COMPOSITIONS
US11834535B2 (en) 2018-05-15 2023-12-05 3M Innovative Properties Company Curable high refractive index compositions and articles prepared from them
EP3820920B1 (en) 2018-07-12 2025-05-14 3M Innovative Properties Company Composition comprising styrene isobutylene block copolymer and ethylenically unsaturated monomer
US20200339828A1 (en) * 2019-04-26 2020-10-29 Canon Kabushiki Kaisha Photocurable composition
US12492275B2 (en) 2019-09-12 2025-12-09 Arkema France Photo-curable compositions containing high refractive index monomers for use in 3D printing applications
WO2021064530A1 (en) * 2019-09-30 2021-04-08 3M Innovative Properties Company Dicarboxylic acid compounds. inorganic particles treated with the dicarboxylic acid compounds, and compositions thereof
KR102284512B1 (ko) * 2019-11-25 2021-08-02 주식회사 케이씨텍 수분량이 제어된 무기 산화물 분산액 및 이의 제조방법
CN114761497B (zh) * 2019-11-28 2024-02-20 东京应化工业株式会社 感光性油墨组合物、固化物、显示面板、及固化物的制造方法
WO2021260601A1 (en) 2020-06-25 2021-12-30 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions
CN116349428A (zh) * 2020-10-08 2023-06-27 3M创新有限公司 具有高折射率的金属-聚合物杂化材料
CN112322195B (zh) * 2020-11-03 2023-05-16 西安思摩威新材料有限公司 一种紫外光固化组合物胶水及其使用方法和应用
JPWO2022203081A1 (https=) * 2021-03-26 2022-09-29
US20230061791A1 (en) * 2021-08-16 2023-03-02 Vadient Optics Llc Grin lenses made by 3d printing monomer-based inks
CN113999565B (zh) * 2021-12-10 2023-10-20 西安思摩威新材料有限公司 一种紫外光可固化的高折射率油墨及材料层
WO2023153385A1 (ja) 2022-02-08 2023-08-17 三井化学株式会社 紫外線硬化性樹脂組成物及び表示装置
CN119032140A (zh) 2022-04-01 2024-11-26 3M创新有限公司 具有增粘剂的可固化组合物
KR20250006134A (ko) * 2022-04-29 2025-01-10 쓰리엠 이노베이티브 프로퍼티즈 컴파니 물-격리제를 갖는 경화성 고굴절률 잉크 조성물
JP2024010580A (ja) * 2022-07-12 2024-01-24 互応化学工業株式会社 インクジェット用硬化性樹脂組成物、硬化物、硬化物の製造方法、ソルダーレジスト、マーキングインキ、及びプリント配線板
KR20250029227A (ko) 2022-07-26 2025-03-04 덴카 주식회사 광경화성 조성물, 광경화성 조성물의 경화물 및 발광 표시장치
CN115216178B (zh) * 2022-08-11 2023-11-28 西安思摩威新材料有限公司 一种oled封装用的油墨组合物及其制备方法
US20240117095A1 (en) * 2022-09-21 2024-04-11 Vadient Optics, Llc Grin lenses made by 3d printing monomer-based inks
CN121532475A (zh) * 2023-06-19 2026-02-13 三星Sdi株式会社 可固化组合物、使用组合物制造的固化层和包括固化层的显示装置
JP2025022338A (ja) * 2023-08-03 2025-02-14 エア・ウォーター・パフォーマンスケミカル株式会社 新規なヘテロ環を有する単量体
WO2025037176A1 (en) 2023-08-11 2025-02-20 3M Innovative Properties Company Unsaturated trithiocyanurate derivatives for curable high refractive index compositions, articles thereof, and methods of making such articles
WO2025054893A1 (en) 2023-09-14 2025-03-20 Dow Global Technologies Llc Inkjet printable ultraviolet light curable composition
CN117603108B (zh) * 2023-10-23 2024-06-04 江苏集萃光敏电子材料研究所有限公司 一种高折射可固化单体
WO2025099511A1 (en) 2023-11-08 2025-05-15 3M Innovative Properties Company Hyperbranched polythioethers, curable high refractive index compositions and articles thereof and methods of making such compounds and articles
CN118126565A (zh) * 2024-02-28 2024-06-04 浙江福斯特新材料研究院有限公司 一种油墨组合物、油墨组合物的制备方法及固化层
EP4671284A1 (en) 2024-06-27 2025-12-31 Carl Zeiss Vision International GmbH HARDENABLE EYEGLASS MATERIAL
WO2026011343A1 (en) 2024-07-10 2026-01-15 Dow Global Technologies Llc Inkjet printable ultraviolet light curable composition with thermal shock resistance

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013185040A (ja) * 2012-03-07 2013-09-19 Jnc Corp 光硬化性インクジェットインク

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU550635B2 (en) 1982-11-11 1986-03-27 Showa Denko Kabushiki Kaisha Polymerizable (meth) acryloyloxyy aromatic ethers
JP2004333687A (ja) * 2003-05-02 2004-11-25 Fuji Photo Film Co Ltd 光学部材、光学部材用重合性組成物および光学部材の製造方法
US20060293463A1 (en) * 2005-06-28 2006-12-28 General Electric Company Compositions for brightness enhancing films
US20080221291A1 (en) 2007-03-07 2008-09-11 3M Innovative Properties Company Microstructured optical films comprising biphenyl difunctional monomers
JP2009074024A (ja) * 2007-08-30 2009-04-09 Nikon-Essilor Co Ltd 光学材料用組成物、光学材料、眼鏡レンズ用基材および眼鏡レンズ
JP2009084313A (ja) 2007-09-27 2009-04-23 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2011170073A (ja) * 2010-02-18 2011-09-01 Jsr Corp 硬化性組成物及び光学部材
KR101254325B1 (ko) * 2010-10-20 2013-04-12 주식회사 한농화성 페닐티오기를 함유하는 아크릴레이트 화합물 및 그의 제조방법
EP2707424B1 (en) * 2011-05-13 2020-10-28 3M Innovative Properties Company Benzyl (meth)acrylate monomers suitable for microstructured optical films
JP5212577B1 (ja) * 2012-03-12 2013-06-19 Ｄｉｃ株式会社 ラジカル重合性組成物、その硬化物及びプラスチックレンズ
JP5996894B2 (ja) * 2012-03-13 2016-09-21 株式会社タムラ製作所 絶縁膜形成用透明樹脂組成物
EP2945755B1 (en) 2013-02-06 2019-09-11 Sun Chemical Corporation Digital printing inks
TWI601720B (zh) 2013-03-14 2017-10-11 三菱瓦斯化學股份有限公司 Novel episulfide and optical material compositions
KR102044923B1 (ko) * 2013-04-15 2019-11-15 삼성디스플레이 주식회사 유기발광 표시장치 및 그의 제조방법
US20150349295A1 (en) 2014-05-30 2015-12-03 Samsung Sdi Co., Ltd. Gas permeation multilayer barrier with tunable index decoupling layers
EP2960306B1 (en) 2014-06-26 2020-12-23 Agfa Nv Aqueous radiation curable inkjet inks
US9909022B2 (en) 2014-07-25 2018-03-06 Kateeva, Inc. Organic thin film ink compositions and methods
CN105254588B (zh) * 2015-11-10 2017-10-24 中国乐凯集团有限公司 一种高折射率化合物及其应用
CN110024483A (zh) 2016-12-06 2019-07-16 捷恩智株式会社 油墨组合物及使用其的有机电场发光元件
US11834535B2 (en) * 2018-05-15 2023-12-05 3M Innovative Properties Company Curable high refractive index compositions and articles prepared from them

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013185040A (ja) * 2012-03-07 2013-09-19 Jnc Corp 光硬化性インクジェットインク

Also Published As

Publication number Publication date
JP2020506251A (ja) 2020-02-27
JP7203028B2 (ja) 2023-01-12
EP3562895B1 (en) 2021-08-18
KR20190098234A (ko) 2019-08-21
CN110121538A (zh) 2019-08-13
US11584863B2 (en) 2023-02-21
EP3562895A1 (en) 2019-11-06
CN110121538B (zh) 2023-05-26
US20190352520A1 (en) 2019-11-21
WO2018122748A1 (en) 2018-07-05

Similar Documents

Publication Publication Date Title
KR102533500B1 (ko) 경화성 고굴절률 잉크 조성물 및 잉크 조성물로부터 제조된 물품
EP1833862B1 (en) Compositions containing photosensitive fluorochemical and uses thereof
TWI373480B (en) Per-fluoro polyether compound, antifouling coating composition and film containing same
CN110945090A (zh) 可固化的高折射率油墨组合物和由油墨组合物制备的制品
KR102823243B1 (ko) 경화성 고굴절률 조성물 및 이로부터 제조된 물품
US11066517B2 (en) Processes for producing fluorinated ether compounds
WO2011129015A1 (ja) 防汚性付与剤
JP5789545B2 (ja) 含フッ素化合物、撥液性処理剤、及び硬化膜
TWI391374B (zh) 氟基化合物及包含其之塗佈組成物
TW201934680A (zh) 低介電常數可固化油墨組成物
US20050249956A1 (en) Stain repellent optical hard coating
WO2004108772A1 (ja) 硬化性表面改質剤およびそれを用いた硬化性表面改質用組成物
JPWO2011129426A1 (ja) 防汚性付与剤
EP3824325A2 (en) Vehicle sensors comprising repellent surface, protective films, repellent coating compositions, and methods
WO2013151187A1 (en) Process for producing article having fluorine-containing silane-based coating

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0901 Re-examination

St.27 status event code: A-2-3-E10-E12-rex-PX0901

PX0701 Decision of registration after re-examination

St.27 status event code: A-3-4-F10-F13-rex-PX0701

X701 Decision to grant (after re-examination)
GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601