JP7196074B2 - ポリオレフィンの製造のための触媒系並びに同触媒系を作製及び使用する方法 - Google Patents
ポリオレフィンの製造のための触媒系並びに同触媒系を作製及び使用する方法 Download PDFInfo
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- JP7196074B2 JP7196074B2 JP2019531590A JP2019531590A JP7196074B2 JP 7196074 B2 JP7196074 B2 JP 7196074B2 JP 2019531590 A JP2019531590 A JP 2019531590A JP 2019531590 A JP2019531590 A JP 2019531590A JP 7196074 B2 JP7196074 B2 JP 7196074B2
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- propylene
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- FYXKZNLBZKRYSS-UHFFFAOYSA-N benzene-1,2-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC=C1C(Cl)=O FYXKZNLBZKRYSS-UHFFFAOYSA-N 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
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- 230000015556 catabolic process Effects 0.000 description 1
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- 239000003153 chemical reaction reagent Substances 0.000 description 1
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- 238000005660 chlorination reaction Methods 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
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- 239000003426 co-catalyst Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
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- 238000001816 cooling Methods 0.000 description 1
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- 229930003836 cresol Natural products 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- SJJCABYOVIHNPZ-UHFFFAOYSA-N cyclohexyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C1CCCCC1 SJJCABYOVIHNPZ-UHFFFAOYSA-N 0.000 description 1
- QEPVYYOIYSITJK-UHFFFAOYSA-N cyclohexyl-ethyl-dimethoxysilane Chemical compound CC[Si](OC)(OC)C1CCCCC1 QEPVYYOIYSITJK-UHFFFAOYSA-N 0.000 description 1
- YRMPTIHEUZLTDO-UHFFFAOYSA-N cyclopentyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C1CCCC1 YRMPTIHEUZLTDO-UHFFFAOYSA-N 0.000 description 1
- VUIDTJAIQNUPRI-UHFFFAOYSA-N cyclopentyl-dimethoxy-pyrrolidin-1-ylsilane Chemical compound C1CCCN1[Si](OC)(OC)C1CCCC1 VUIDTJAIQNUPRI-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- FJBFPHVGVWTDIP-UHFFFAOYSA-N dibromomethane Chemical compound BrCBr FJBFPHVGVWTDIP-UHFFFAOYSA-N 0.000 description 1
- YPENMAABQGWRBR-UHFFFAOYSA-N dibutyl(dimethoxy)silane Chemical compound CCCC[Si](OC)(OC)CCCC YPENMAABQGWRBR-UHFFFAOYSA-N 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- UMNKXPULIDJLSU-UHFFFAOYSA-N dichlorofluoromethane Chemical compound FC(Cl)Cl UMNKXPULIDJLSU-UHFFFAOYSA-N 0.000 description 1
- 229940099364 dichlorofluoromethane Drugs 0.000 description 1
- JWCYDYZLEAQGJJ-UHFFFAOYSA-N dicyclopentyl(dimethoxy)silane Chemical compound C1CCCC1[Si](OC)(OC)C1CCCC1 JWCYDYZLEAQGJJ-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- JVUVKQDVTIIMOD-UHFFFAOYSA-N dimethoxy(dipropyl)silane Chemical compound CCC[Si](OC)(OC)CCC JVUVKQDVTIIMOD-UHFFFAOYSA-N 0.000 description 1
- DGSPRFRFGPAESC-UHFFFAOYSA-N dimethoxy(dipyrrolidin-1-yl)silane Chemical compound C1CCCN1[Si](OC)(OC)N1CCCC1 DGSPRFRFGPAESC-UHFFFAOYSA-N 0.000 description 1
- NHYFIJRXGOQNFS-UHFFFAOYSA-N dimethoxy-bis(2-methylpropyl)silane Chemical compound CC(C)C[Si](OC)(CC(C)C)OC NHYFIJRXGOQNFS-UHFFFAOYSA-N 0.000 description 1
- VHPUZTHRFWIGAW-UHFFFAOYSA-N dimethoxy-di(propan-2-yl)silane Chemical compound CO[Si](OC)(C(C)C)C(C)C VHPUZTHRFWIGAW-UHFFFAOYSA-N 0.000 description 1
- OANIYCQMEVXZCJ-UHFFFAOYSA-N ditert-butyl(dimethoxy)silane Chemical compound CO[Si](OC)(C(C)(C)C)C(C)(C)C OANIYCQMEVXZCJ-UHFFFAOYSA-N 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- LDLDYFCCDKENPD-UHFFFAOYSA-N ethenylcyclohexane Chemical compound C=CC1CCCCC1 LDLDYFCCDKENPD-UHFFFAOYSA-N 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000010812 external standard method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 230000002140 halogenating effect Effects 0.000 description 1
- 238000003988 headspace gas chromatography Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical class CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910001502 inorganic halide Inorganic materials 0.000 description 1
- 239000011872 intimate mixture Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 150000002681 magnesium compounds Chemical class 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- XDKQUSKHRIUJEO-UHFFFAOYSA-N magnesium;ethanolate Chemical compound [Mg+2].CC[O-].CC[O-] XDKQUSKHRIUJEO-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-M phenolate Chemical compound [O-]C1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-M 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 229920001384 propylene homopolymer Polymers 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000001953 sensory effect Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- UBZYKBZMAMTNKW-UHFFFAOYSA-J titanium tetrabromide Chemical compound Br[Ti](Br)(Br)Br UBZYKBZMAMTNKW-UHFFFAOYSA-J 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 description 1
- LGROXJWYRXANBB-UHFFFAOYSA-N trimethoxy(propan-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)C LGROXJWYRXANBB-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 150000003738 xylenes Chemical class 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
Classifications
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- C08F110/00—Homopolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
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- C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L23/10—Homopolymers or copolymers of propene
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- C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
- C08F4/60—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides together with refractory metals, iron group metals, platinum group metals, manganese, rhenium technetium or compounds thereof
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- C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
- C08F4/60—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides together with refractory metals, iron group metals, platinum group metals, manganese, rhenium technetium or compounds thereof
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- C08F4/60—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides together with refractory metals, iron group metals, platinum group metals, manganese, rhenium technetium or compounds thereof
- C08F4/62—Refractory metals or compounds thereof
- C08F4/64—Titanium, zirconium, hafnium or compounds thereof
- C08F4/65—Pretreating the metal or compound covered by group C08F4/64 before the final contacting with the metal or compound covered by group C08F4/44
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- C09D123/00—Coating compositions based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Coating compositions based on derivatives of such polymers
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Description
床蓄積試験:経時による触媒活性の減衰にフィッティングさせることができる、指数関数的減衰関数(e-kd.t)の指数関数的減衰定数(kd)を決定するために、床蓄積試験を比較例及び本発明の実施例において使用した。減衰定数から、触媒の寿命は式(4)により与えられる関係によって決定される。
Claims (24)
- ケイ素原子に結合したC1~C10アルコキシ基を少なくとも1つ有する少なくとも1つのケイ素含有化合物を含む選択性制御剤と;
脂肪族C2~C7モノカルボン酸のC2~C13モノカルボン酸エステル又はその不活性に置換された誘導体を含む、ある量の1つ又は複数の活性制限剤と
を含む、オレフィンを含む混合物の重合のための触媒と共に使用するための組成物。 - 前記活性制限剤の量が、100℃である第1の温度における正規化重合活性であって、
72℃である第2の温度における正規化重合活性;又は
選択性制御剤の存在下であるが、活性制限剤の非存在下であり、選択性制御剤が同じ総モル量である場合の、第1の温度における正規化重合活性;又は
選択性制御剤の存在下であるが、活性制限剤の非存在下であり、選択性制御剤が第2の温度における前記組成物と同等の第2の温度におけるキシレン可溶分を得るのに必要なモル量である場合の、第1の温度における正規化重合活性
の1つを下回る正規化重合活性を提供する量である、請求項1に記載の組成物。 - 活性制限剤が、オレフィンを含む混合物の重合の間の触媒の寿命を増加させる、請求項1に記載の組成物。
- 活性制限剤が、アセテート又はバレレートエステルを含む、請求項1に記載の組成物。
- 活性制限剤が、ヘキサノエートエステルを含む、請求項1に記載の組成物。
- 選択性制御剤が、n-プロピルトリメトキシシランを含む、請求項1に記載の組成物。
- 活性制限剤が、ブチルバレレート、イソブチルブチレート、プロピルブチレート、ペンチルバレレート、イソプロピルブチレート、オクチルアセテート、ペンチルアセテート、プロピルアセテート、及びそれらの組み合わせから成る群から選択される化合物を含む、請求項1に記載の組成物。
- 選択性制御剤の総量が、重合触媒中の遷移金属のモル数に対して、0.1~500のモル比を提供する量に制限されている、請求項1に記載の組成物。
- 選択性制御剤の活性制限剤に対するモル比が、99:1~0.1:99.9である、請求項1に記載の組成物。
- 1つ又は複数の重合触媒と;
ケイ素原子に結合したC1~C10アルコキシ基を少なくとも1つ有する少なくとも1つのケイ素含有化合物を含む選択性制御剤と;
脂肪族C2~C7モノカルボン酸のC2~C13モノカルボン酸エステル又はその不活性に置換された誘導体を含む、ある量の1つ又は複数の活性制限剤と
を含む、オレフィンを含む混合物の重合のための触媒組成物。 - 前記活性制限剤の量が、100℃である第1の温度における正規化重合活性であって、
72℃である第2の温度における正規化重合活性;又は
選択性制御剤の存在下であるが、活性制限剤の非存在下であり、選択性制御剤が同じ総モル量である場合の、第1の温度における正規化重合活性;又は
選択性制御剤の存在下であるが、活性制限剤の非存在下であり、選択性制御剤が第2の温度における前記触媒組成物と同等の第2の温度におけるキシレン可溶分を得るのに必要なモル量である場合の、第1の温度における正規化重合活性
のうちの1つを下回る正規化重合活性を提供する量である、請求項10に記載の触媒組成物。 - 活性制限剤が、オレフィンを含む混合物の重合の間の触媒の寿命を増加させる、請求項10に記載の触媒組成物。
- 活性制限剤が、アセテート又はバレレートエステルを含む、請求項10に記載の触媒組成物。
- 活性制限剤が、ヘキサノエートエステルを含む、請求項10に記載の触媒組成物。
- 選択性制御剤が、n-プロピルトリメトキシシランを含む、請求項10に記載の触媒組成物。
- 活性制限剤が、ブチルバレレート、イソブチルブチレート、プロピルブチレート、ペンチルバレレート、イソプロピルブチレート、オクチルアセテート、ペンチルアセテート、プロピルアセテート、及びそれらの組み合わせから成る群から選択される化合物を含む、請求項10に記載の触媒組成物。
- 重合触媒が、アルミニウム含有化合物を含む、請求項10に記載の触媒組成物。
- 選択性制御剤の総量が、重合触媒中の遷移金属のモル数に対して、0.1~500のモル比を提供する量に制限されている、請求項10に記載の触媒組成物。
- 選択性制御剤の活性制限剤に対するモル比が、99:1~0.1:99.9である、請求項10に記載の触媒組成物。
- オレフィン又はオレフィンの混合物及び1つ又は複数の共重合性コモノマーを、重合条件下で請求項10に記載の触媒組成物と接触させる工程を含む、重合方法。
- 重合条件下及び水素の存在下で、プロピレン、及び任意選択により1つ又は複数のコモノマーを、請求項10に記載の触媒組成物と接触させる工程と、
前記接触の間、0.0005~0.17のH2/プロピレンモル比を維持する工程と;
ASTM D-1238-01に従って230℃及び2.16質量kgを用いて測定して0.2g/10min~400g/10minのメルトフローレートを有するプロピレン系ポリマーを形成する工程と
を含む、
プロピレン系ポリマーを生産する重合方法。 - 重合条件下で、第1の重合反応器において、プロピレンを、請求項10に記載の触媒組成物と接触させて、活性プロピレン系ポリマーを形成する工程と;
重合条件下で、第2の重合反応器において、前記活性プロピレン系ポリマーを、プロピレン、エチレン、及び水素と接触させて、ホモポリマーマトリックス材料中に分散したプロピレン/エチレンゴム相を含むインパクトコポリマー(ICP)を形成する工程と
を含む、
プロピレンインパクトコポリマーを生産する重合方法。 - 請求項1に記載の組成物及びオレフィンを含む混合物の重合のための触媒を含む、触媒系。
- オレフィン又はオレフィンの混合物及び1つ又は複数の共重合性コモノマーを、重合条件下で請求項1に記載の組成物及びオレフィンを含む混合物の重合のための触媒と接触させる工程を含む、重合方法。
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