JP7152123B2 - サーキットボードおよび／または基板製造の部分ストリームからの金属塩含有溶媒を処理する方法 - Google Patents

サーキットボードおよび／または基板製造の部分ストリームからの金属塩含有溶媒を処理する方法 Download PDF

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JP7152123B2
JP7152123B2 JP2021033282A JP2021033282A JP7152123B2 JP 7152123 B2 JP7152123 B2 JP 7152123B2 JP 2021033282 A JP2021033282 A JP 2021033282A JP 2021033282 A JP2021033282 A JP 2021033282A JP 7152123 B2 JP7152123 B2 JP 7152123B2
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metal salt
metal
solvent
stream
treated
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JP2021137804A (ja
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クロチェク ジョランタ
エブナー クラウディア
フライ ゲーアハルト
シュライ マーティン
レドル アロイス
エビンガー クリストフ
ヘルツォーク ルネ
ザンカー アンドレアス
マンドル トーマス
グロス フリードリッヒ
カーン コンスタンティン
モイツィ ハインツ
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エーティーアンドエス オーストリア テクノロジー アンド システムテクニック アクツィエンゲゼルシャフト
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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/04—Extraction of metal compounds from ores or concentrates by wet processes by leaching
    • C22B3/06—Extraction of metal compounds from ores or concentrates by wet processes by leaching in inorganic acid solutions, e.g. with acids generated in situ; in inorganic salt solutions other than ammonium salt solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
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    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
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    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B11/00—Obtaining noble metals
    • C22B11/04—Obtaining noble metals by wet processes
    • C22B11/042—Recovery of noble metals from waste materials
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/20—Treatment or purification of solutions, e.g. obtained by leaching
    • C22B3/42—Treatment or purification of solutions, e.g. obtained by leaching by ion-exchange extraction
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/18—Acidic compositions for etching copper or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
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    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/02—Electrolytic production, recovery or refining of metals by electrolysis of solutions of light metals
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    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
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    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
    • C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt
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    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
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    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
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    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/16—Electrolytic production, recovery or refining of metals by electrolysis of solutions of zinc, cadmium or mercury
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    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
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    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/06—Operating or servicing
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    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
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    • C25D21/14—Controlled addition of electrolyte components
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    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
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    • C25D21/22—Regeneration of process solutions by ion-exchange
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
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    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
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    • H05K3/00—Apparatus or processes for manufacturing printed circuits
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    • H05K3/0055—After-treatment, e.g. cleaning or desmearing of holes
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    • C02F1/02—Treatment of water, waste water, or sewage by heating
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  • Chemical & Material Sciences (AREA)
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  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
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  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Water Supply & Treatment (AREA)
  • Automation & Control Theory (AREA)
  • Hydrology & Water Resources (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • ing And Chemical Polishing (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Water Treatment By Sorption (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Manufacturing Of Printed Wiring (AREA)
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  • Chemically Coating (AREA)
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JP2021033282A 2020-03-04 2021-03-03 サーキットボードおよび／または基板製造の部分ストリームからの金属塩含有溶媒を処理する方法 Active JP7152123B2 (ja)

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JP2022153249A JP2022191277A (ja) 2020-03-04 2022-09-27 有用材料サイクルにおけるサーキットボードおよび／または基板の製造

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Application Number Priority Date Filing Date Title
EP20160862 2020-03-04
EP20160862 2020-03-04
EP20172923.3A EP3875638A1 (de) 2020-03-04 2020-05-05 Verfahren zum aufbereiten eines fremdmetall- und metallsalz-haltigen mediums aus der leiterplatten- und/oder substrat-herstellung
EP20172960.5A EP3875640A1 (de) 2020-03-04 2020-05-05 Verfahren zum aufbereiten eines metallsalz-haltigen mediums aus teilströmen der leiterplatten- und/oder substrat-herstellung
EP20172906.8A EP3875637A1 (de) 2020-03-04 2020-05-05 Verfahren zum rückgewinnen eines elementaren metalls aus der leiterplatten- und/oder substrat-herstellung
EP20172960 2020-05-05
EP20172923 2020-05-05
EP20172981.1A EP3875642A1 (de) 2020-03-04 2020-05-05 Verfahren zum aufbereiten eines spülwassers aus der leiterplatten- und/oder substrat-herstellung
EP20172906 2020-05-05
EP20172928 2020-05-05
EP20172928.2A EP3875639A1 (de) 2020-03-04 2020-05-05 Verfahren zum herstellen von leiterplatten- und/oder substraten innerhalb eines wertstoffkreislaufs
EP20172981 2020-05-05
EP20172971.2A EP3875641A1 (de) 2020-03-04 2020-05-05 Verfahren zum aufbereiten eines metallsalz-haltigen mediums aus einem ätzprozess der leiterplatten- und/oder substrat-herstellung
EP20172971 2020-05-05

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JP2022153249A Pending JP2022191277A (ja) 2020-03-04 2022-09-27 有用材料サイクルにおけるサーキットボードおよび／または基板の製造

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EP (6) EP3875638A1 (enExample)
JP (2) JP7152123B2 (enExample)
KR (2) KR102558446B1 (enExample)
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TW (2) TWI795737B (enExample)

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JP7752087B2 (ja) * 2022-04-04 2025-10-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
EP4339165A1 (en) * 2022-09-16 2024-03-20 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Separating a foreign metal from a process fluid, method and apparatus

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