JP7128684B2 - 磁気ディスク基板用研磨剤組成物 - Google Patents

磁気ディスク基板用研磨剤組成物 Download PDF

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Publication number
JP7128684B2
JP7128684B2 JP2018146517A JP2018146517A JP7128684B2 JP 7128684 B2 JP7128684 B2 JP 7128684B2 JP 2018146517 A JP2018146517 A JP 2018146517A JP 2018146517 A JP2018146517 A JP 2018146517A JP 7128684 B2 JP7128684 B2 JP 7128684B2
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monomer
group
acid group
magnetic disk
essential
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JP2018146517A
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Japanese (ja)
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JP2020021527A (ja
JP2020021527A5 (enExample
Inventor
順一郎 安藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamaguchi Seiken Kogyo Co Ltd
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Yamaguchi Seiken Kogyo Co Ltd
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Priority to JP2018146517A priority Critical patent/JP7128684B2/ja
Priority to MYPI2019004367A priority patent/MY197950A/en
Priority to TW108127247A priority patent/TWI811414B/zh
Publication of JP2020021527A publication Critical patent/JP2020021527A/ja
Publication of JP2020021527A5 publication Critical patent/JP2020021527A5/ja
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  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2018146517A 2018-08-03 2018-08-03 磁気ディスク基板用研磨剤組成物 Active JP7128684B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018146517A JP7128684B2 (ja) 2018-08-03 2018-08-03 磁気ディスク基板用研磨剤組成物
MYPI2019004367A MY197950A (en) 2018-08-03 2019-07-31 Polishing composition for magnetic disk substrate
TW108127247A TWI811414B (zh) 2018-08-03 2019-07-31 磁碟基板用研磨劑組合物

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JP2018146517A JP7128684B2 (ja) 2018-08-03 2018-08-03 磁気ディスク基板用研磨剤組成物

Publications (3)

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JP2020021527A JP2020021527A (ja) 2020-02-06
JP2020021527A5 JP2020021527A5 (enExample) 2021-08-19
JP7128684B2 true JP7128684B2 (ja) 2022-08-31

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JP2018146517A Active JP7128684B2 (ja) 2018-08-03 2018-08-03 磁気ディスク基板用研磨剤組成物

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JP (1) JP7128684B2 (enExample)
MY (1) MY197950A (enExample)
TW (1) TWI811414B (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7440326B2 (ja) * 2020-04-01 2024-02-28 山口精研工業株式会社 研磨剤組成物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011131346A (ja) 2009-12-25 2011-07-07 Kao Corp 研磨液組成物
JP2014032718A (ja) 2012-08-01 2014-02-20 Kao Corp 磁気ディスク基板の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3856843B2 (ja) * 1996-11-14 2006-12-13 花王株式会社 磁気記録媒体基板用研磨材組成物及びこれを用いた磁気記録媒体基板の製造方法
KR102645587B1 (ko) * 2016-02-29 2024-03-11 가부시키가이샤 후지미인코퍼레이티드 연마용 조성물 및 이것을 사용한 연마 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011131346A (ja) 2009-12-25 2011-07-07 Kao Corp 研磨液組成物
JP2014032718A (ja) 2012-08-01 2014-02-20 Kao Corp 磁気ディスク基板の製造方法

Also Published As

Publication number Publication date
MY197950A (en) 2023-07-25
JP2020021527A (ja) 2020-02-06
TWI811414B (zh) 2023-08-11
TW202018053A (zh) 2020-05-16

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