TWI811414B - 磁碟基板用研磨劑組合物 - Google Patents

磁碟基板用研磨劑組合物 Download PDF

Info

Publication number
TWI811414B
TWI811414B TW108127247A TW108127247A TWI811414B TW I811414 B TWI811414 B TW I811414B TW 108127247 A TW108127247 A TW 108127247A TW 108127247 A TW108127247 A TW 108127247A TW I811414 B TWI811414 B TW I811414B
Authority
TW
Taiwan
Prior art keywords
monomer
monomers
group
essential
abrasive composition
Prior art date
Application number
TW108127247A
Other languages
English (en)
Chinese (zh)
Other versions
TW202018053A (zh
Inventor
安藤順一郎
Original Assignee
日商山口精研工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商山口精研工業股份有限公司 filed Critical 日商山口精研工業股份有限公司
Publication of TW202018053A publication Critical patent/TW202018053A/zh
Application granted granted Critical
Publication of TWI811414B publication Critical patent/TWI811414B/zh

Links

Images

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW108127247A 2018-08-03 2019-07-31 磁碟基板用研磨劑組合物 TWI811414B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-146517 2018-08-03
JP2018146517A JP7128684B2 (ja) 2018-08-03 2018-08-03 磁気ディスク基板用研磨剤組成物

Publications (2)

Publication Number Publication Date
TW202018053A TW202018053A (zh) 2020-05-16
TWI811414B true TWI811414B (zh) 2023-08-11

Family

ID=69589919

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108127247A TWI811414B (zh) 2018-08-03 2019-07-31 磁碟基板用研磨劑組合物

Country Status (3)

Country Link
JP (1) JP7128684B2 (enExample)
MY (1) MY197950A (enExample)
TW (1) TWI811414B (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7440326B2 (ja) * 2020-04-01 2024-02-28 山口精研工業株式会社 研磨剤組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6336945B1 (en) * 1996-11-14 2002-01-08 Kao Corporation Abrasive composition for the base of magnetic recording medium and process for producing the base by using the same
CN102108281A (zh) * 2009-12-25 2011-06-29 花王株式会社 研磨液组合物
TW201734160A (zh) * 2016-02-29 2017-10-01 Fujimi Inc 研磨用組成物及使用其之研磨方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014032718A (ja) 2012-08-01 2014-02-20 Kao Corp 磁気ディスク基板の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6336945B1 (en) * 1996-11-14 2002-01-08 Kao Corporation Abrasive composition for the base of magnetic recording medium and process for producing the base by using the same
CN102108281A (zh) * 2009-12-25 2011-06-29 花王株式会社 研磨液组合物
TW201734160A (zh) * 2016-02-29 2017-10-01 Fujimi Inc 研磨用組成物及使用其之研磨方法

Also Published As

Publication number Publication date
JP7128684B2 (ja) 2022-08-31
MY197950A (en) 2023-07-25
JP2020021527A (ja) 2020-02-06
TW202018053A (zh) 2020-05-16

Similar Documents

Publication Publication Date Title
TWI770197B (zh) 磁碟基板用拋光劑組成物
TWI784072B (zh) 磁碟基板用研磨劑組合物
TWI811414B (zh) 磁碟基板用研磨劑組合物
TWI770298B (zh) 磁碟基板用研磨劑組合物
TWI811415B (zh) 磁碟基板之研磨方法及磁碟基板用研磨劑組成物
TWI730161B (zh) 磁碟基板用研磨劑組合物
TW202033693A (zh) 用於磁碟基板之研磨劑組合物
TWI727039B (zh) 磁碟基板用研磨劑組合物
CN113493652B (zh) 研磨剂组合物
JP7161374B2 (ja) 磁気ディスク基板用研磨剤組成物
JP7441661B2 (ja) 磁気ディスク基板用研磨剤組成物
JP7356864B2 (ja) 磁気ディスク基板用研磨剤組成物、及び磁気ディスク基板の研磨方法
TWI820284B (zh) 磁碟基板用研磨劑組合物
JP7356865B2 (ja) 磁気ディスク基板用研磨剤組成物、及び磁気ディスク基板の研磨方法
TW202330824A (zh) 磁碟基板用研磨劑組合物及磁碟基板之研磨方法

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees