JP7108606B2 - スパッタリングターゲット - Google Patents

スパッタリングターゲット Download PDF

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Publication number
JP7108606B2
JP7108606B2 JP2019516711A JP2019516711A JP7108606B2 JP 7108606 B2 JP7108606 B2 JP 7108606B2 JP 2019516711 A JP2019516711 A JP 2019516711A JP 2019516711 A JP2019516711 A JP 2019516711A JP 7108606 B2 JP7108606 B2 JP 7108606B2
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Japan
Prior art keywords
sputtering target
niobium
atomic
average
matrix
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JP2019516711A
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English (en)
Japanese (ja)
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JP2019536897A5 (enExample
JP2019536897A (ja
Inventor
アイデンベルガー－ショーバー，ミヒャエル
ヴィンクラー，イェルク
オサリヴァン，ミヒャエル
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Plansee SE
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Plansee SE
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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/04—Alloys based on tungsten or molybdenum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H01J37/3429—Plural materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B22F3/15—Hot isostatic pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/18—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces by using pressure rollers
    • B22F2003/185—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces by using pressure rollers by hot rolling, below sintering temperature
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • B22F2003/248—Thermal after-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2201/00—Treatment under specific atmosphere
    • B22F2201/01—Reducing atmosphere
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2301/00—Metallic composition of the powder or its coating
    • B22F2301/20—Refractory metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
JP2019516711A 2016-09-29 2017-09-08 スパッタリングターゲット Active JP7108606B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ATGM229/2016U AT15356U1 (de) 2016-09-29 2016-09-29 Sputtering Target
ATGM229/2016 2016-09-29
PCT/AT2017/000062 WO2018058158A1 (de) 2016-09-29 2017-09-08 Sputtering target

Publications (3)

Publication Number Publication Date
JP2019536897A JP2019536897A (ja) 2019-12-19
JP2019536897A5 JP2019536897A5 (enExample) 2020-08-13
JP7108606B2 true JP7108606B2 (ja) 2022-07-28

Family

ID=59296190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019516711A Active JP7108606B2 (ja) 2016-09-29 2017-09-08 スパッタリングターゲット

Country Status (6)

Country Link
US (1) US11569075B2 (enExample)
JP (1) JP7108606B2 (enExample)
CN (1) CN109790617A (enExample)
AT (1) AT15356U1 (enExample)
TW (1) TWI791461B (enExample)
WO (1) WO2018058158A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2723479B2 (ja) 1994-02-25 1998-03-09 ゼムペリット ライフェン アクチェンゲゼルシャフト 空気入りタイヤ

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7110749B2 (ja) * 2017-07-05 2022-08-02 日立金属株式会社 ＭｏＮｂターゲット材
CN114990499B (zh) * 2021-07-19 2023-06-20 江苏钢研昊普科技有限公司 一种钼合金靶材的制备方法
CN114150279A (zh) * 2021-12-09 2022-03-08 株洲硬质合金集团有限公司 一种钼铌合金轧制靶材的热处理方法

Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002327264A (ja) 2001-04-26 2002-11-15 Hitachi Metals Ltd 薄膜形成用スパッタリングターゲット
JP2005240160A (ja) 2004-02-27 2005-09-08 Hitachi Metals Ltd Ｍｏ系ターゲット材の製造方法
JP2005290409A (ja) 2004-03-31 2005-10-20 Hitachi Metals Ltd スパッタリングターゲット材およびその製造方法
JP2006249578A (ja) 2005-01-21 2006-09-21 Hc Starck Hermsdorf Gmbh モリブデン合金
JP2008280570A (ja) 2007-05-09 2008-11-20 Hitachi Metals Ltd ＭｏＮｂ系焼結スパッタリングターゲット材の製造方法
JP2009512779A (ja) 2005-10-19 2009-03-26 ヴェー ツェー ヘレーウス ゲゼルシャフト ミット ベシュレンクテル ハフツング 多成分合金からなるスパッタターゲット及び製造方法
CN102337418A (zh) 2011-10-29 2012-02-01 西安瑞福莱钨钼有限公司 一种溅射靶材用钼铌合金板的制备方法
JP2013535571A (ja) 2010-06-30 2013-09-12 エイチ．シー．スターク インク． モリブデンを含有した標的
CN103302295A (zh) 2013-06-20 2013-09-18 安泰科技股份有限公司 一种轧制加工高纯度、高致密度钼合金靶材的方法
CN103320756A (zh) 2013-06-20 2013-09-25 安泰科技股份有限公司 高纯度、高致密度、大尺寸钼合金靶材的制备方法
US20150078950A1 (en) 2013-09-13 2015-03-19 Ametek, Inc. Process for making molybdenum or molybdenum-containing strip
CN104439247A (zh) 2014-12-30 2015-03-25 山东昊轩电子陶瓷材料有限公司 钼合金靶材的制备方法
CN104480437A (zh) 2014-12-30 2015-04-01 山东昊轩电子陶瓷材料有限公司 一体成型管靶的生产方法
CN105063558A (zh) 2015-08-17 2015-11-18 金堆城钼业股份有限公司 一种Mo-Ta合金靶材的制备方法
US20160254128A1 (en) 2013-10-29 2016-09-01 Plansee Se Sputtering target and process for producing it

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63241164A (ja) 1987-03-30 1988-10-06 Toshiba Corp スパッタリングターゲットおよび電気配線用合金膜
US7255757B2 (en) * 2003-12-22 2007-08-14 General Electric Company Nano particle-reinforced Mo alloys for x-ray targets and method to make
JP4721090B2 (ja) 2004-04-16 2011-07-13 日立金属株式会社 Ｍｏ系ターゲット材の製造方法
US20050230244A1 (en) 2004-03-31 2005-10-20 Hitachi Metals, Ltd Sputter target material and method of producing the same
DE102006003279B4 (de) * 2006-01-23 2010-03-25 W.C. Heraeus Gmbh Sputtertarget mit hochschmelzender Phase
JP2013083000A (ja) * 2011-09-28 2013-05-09 Hitachi Metals Ltd 焼結Ｍｏ合金スパッタリングターゲット材の製造方法
CN102560383B (zh) 2012-01-12 2013-10-23 宝鸡市科迪普有色金属加工有限公司 钼铌合金板靶材加工工艺
US20160203960A1 (en) * 2015-01-12 2016-07-14 H.C. Starck Inc. SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, and Ta, AND METHODS
CN105714253B (zh) * 2016-03-10 2017-11-24 洛阳爱科麦钨钼科技股份有限公司 大尺寸、细晶钼钽合金溅射靶材的制备方法

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002327264A (ja) 2001-04-26 2002-11-15 Hitachi Metals Ltd 薄膜形成用スパッタリングターゲット
JP2005240160A (ja) 2004-02-27 2005-09-08 Hitachi Metals Ltd Ｍｏ系ターゲット材の製造方法
JP2005290409A (ja) 2004-03-31 2005-10-20 Hitachi Metals Ltd スパッタリングターゲット材およびその製造方法
JP2006249578A (ja) 2005-01-21 2006-09-21 Hc Starck Hermsdorf Gmbh モリブデン合金
JP2009512779A (ja) 2005-10-19 2009-03-26 ヴェー ツェー ヘレーウス ゲゼルシャフト ミット ベシュレンクテル ハフツング 多成分合金からなるスパッタターゲット及び製造方法
JP2008280570A (ja) 2007-05-09 2008-11-20 Hitachi Metals Ltd ＭｏＮｂ系焼結スパッタリングターゲット材の製造方法
JP2013535571A (ja) 2010-06-30 2013-09-12 エイチ．シー．スターク インク． モリブデンを含有した標的
CN102337418A (zh) 2011-10-29 2012-02-01 西安瑞福莱钨钼有限公司 一种溅射靶材用钼铌合金板的制备方法
CN103302295A (zh) 2013-06-20 2013-09-18 安泰科技股份有限公司 一种轧制加工高纯度、高致密度钼合金靶材的方法
CN103320756A (zh) 2013-06-20 2013-09-25 安泰科技股份有限公司 高纯度、高致密度、大尺寸钼合金靶材的制备方法
US20150078950A1 (en) 2013-09-13 2015-03-19 Ametek, Inc. Process for making molybdenum or molybdenum-containing strip
US20160254128A1 (en) 2013-10-29 2016-09-01 Plansee Se Sputtering target and process for producing it
CN104439247A (zh) 2014-12-30 2015-03-25 山东昊轩电子陶瓷材料有限公司 钼合金靶材的制备方法
CN104480437A (zh) 2014-12-30 2015-04-01 山东昊轩电子陶瓷材料有限公司 一体成型管靶的生产方法
CN105063558A (zh) 2015-08-17 2015-11-18 金堆城钼业股份有限公司 一种Mo-Ta合金靶材的制备方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2723479B2 (ja) 1994-02-25 1998-03-09 ゼムペリット ライフェン アクチェンゲゼルシャフト 空気入りタイヤ

Also Published As

Publication number Publication date
US11569075B2 (en) 2023-01-31
US20190221408A1 (en) 2019-07-18
CN109790617A (zh) 2019-05-21
TWI791461B (zh) 2023-02-11
AT15356U1 (de) 2017-07-15
JP2019536897A (ja) 2019-12-19
TW201816159A (zh) 2018-05-01
WO2018058158A1 (de) 2018-04-05

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