JP7039096B2 - ガス分析装置、プロセスモニタリング装置、ガス分析装置の制御方法 - Google Patents

ガス分析装置、プロセスモニタリング装置、ガス分析装置の制御方法 Download PDF

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JP7039096B2
JP7039096B2 JP2021548210A JP2021548210A JP7039096B2 JP 7039096 B2 JP7039096 B2 JP 7039096B2 JP 2021548210 A JP2021548210 A JP 2021548210A JP 2021548210 A JP2021548210 A JP 2021548210A JP 7039096 B2 JP7039096 B2 JP 7039096B2
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plasma
potential
unit
chamber
gas
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JPWO2021200773A1 (https=
Inventor
直樹 高橋
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Atonarp Inc
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Atonarp Inc
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2431—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes using cylindrical electrodes, e.g. rotary drums
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/34—Dynamic spectrometers
    • H01J49/42—Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/34—Dynamic spectrometers
    • H01J49/42—Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
    • H01J49/4205—Device types
    • H01J49/421—Mass filters, i.e. deviating unwanted ions without trapping
    • H01J49/4215—Quadrupole mass filters

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  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Plasma Technology (AREA)
  • Manufacturing Of Tubular Articles Or Embedded Moulded Articles (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP2021548210A 2020-03-31 2021-03-29 ガス分析装置、プロセスモニタリング装置、ガス分析装置の制御方法 Active JP7039096B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2022031497A JP7602266B2 (ja) 2020-03-31 2022-03-02 プラズマ生成装置
JP2024208234A JP2025032173A (ja) 2020-03-31 2024-11-29 ガス分析装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020062862 2020-03-31
JP2020062862 2020-03-31
PCT/JP2021/013168 WO2021200773A1 (ja) 2020-03-31 2021-03-29 プラズマ生成装置

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JP2022031497A Division JP7602266B2 (ja) 2020-03-31 2022-03-02 プラズマ生成装置

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JPWO2021200773A1 JPWO2021200773A1 (https=) 2021-10-07
JP7039096B2 true JP7039096B2 (ja) 2022-03-22

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JP2022031497A Active JP7602266B2 (ja) 2020-03-31 2022-03-02 プラズマ生成装置
JP2024208234A Pending JP2025032173A (ja) 2020-03-31 2024-11-29 ガス分析装置

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JP2024208234A Pending JP2025032173A (ja) 2020-03-31 2024-11-29 ガス分析装置

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US (2) US11996278B2 (https=)
EP (1) EP4132228A4 (https=)
JP (3) JP7039096B2 (https=)
KR (1) KR102724709B1 (https=)
CN (1) CN115039516B (https=)
TW (1) TWI865755B (https=)
WO (1) WO2021200773A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115039516B (zh) * 2020-03-31 2024-01-02 Atonarp株式会社 等离子体生成装置
US20240355592A1 (en) * 2023-04-24 2024-10-24 Applied Materials, Inc. Uniform plasma processing with a linear plasma source

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006049922A (ja) 2005-08-24 2006-02-16 Ulvac Japan Ltd エッチング装置
JP2011249289A (ja) 2010-05-31 2011-12-08 Toyota Technological Institute 浮遊電極を持つ誘導結合型マイクロプラズマ源
JP2013161694A (ja) 2012-02-07 2013-08-19 Toyota Gakuen 浮遊電極の一部がガス流路内部に面している誘導結合型マイクロプラズマ源
JP2015162267A (ja) 2014-02-26 2015-09-07 学校法人トヨタ学園 浮遊電極がシールドされた誘導結合型マイクロプラズマ源
US20190011400A1 (en) 2017-07-07 2019-01-10 Teknoscan Systems Inc. Polarization dielectric discharge source for ims instrument

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GB8813149D0 (en) * 1988-06-03 1988-07-06 Vg Instr Group Mass spectrometer
US5650618A (en) 1995-11-30 1997-07-22 The Regents Of The University Of California Compact mass spectrometer for plasma discharge ion analysis
JP3550457B2 (ja) 1996-03-29 2004-08-04 株式会社アルバック 浮遊電位基板入射イオンのエネルギー及び質量の分析法及び装置
JP3774525B2 (ja) * 1997-01-06 2006-05-17 株式会社アルバック プラズマ中の負イオン測定法及び装置
JP3769341B2 (ja) 1997-01-06 2006-04-26 株式会社アルバック エッチングプラズマにおける基板入射負イオンの分析法及び装置
JPH11158638A (ja) * 1997-11-25 1999-06-15 Kao Corp 炭素薄膜の製造方法
JP4221235B2 (ja) * 2003-03-05 2009-02-12 キヤノンアネルバ株式会社 イオン付着質量分析方法、負イオン計測方法、および質量分析装置
US7460225B2 (en) 2004-03-05 2008-12-02 Vassili Karanassios Miniaturized source devices for optical and mass spectrometry
JP4865532B2 (ja) * 2006-12-22 2012-02-01 株式会社アルバック 質量分析ユニット、及び質量分析ユニットの使用方法
JP5233131B2 (ja) * 2007-02-23 2013-07-10 株式会社Ｉｈｉ 浸炭装置及び浸炭方法
KR100891376B1 (ko) * 2007-03-21 2009-04-02 차동호 셀프 플라즈마 챔버와 결합하여 플라즈마 공정장치에서공정진행상태를 실시간으로 모니터하고 이상 여부를검출하는 복합센서
CN101680856A (zh) * 2007-05-15 2010-03-24 株式会社爱发科 质谱分析单元
KR100905128B1 (ko) * 2008-07-29 2009-06-30 주식회사 나노텍 셀프 플라즈마 챔버의 오염 방지 장치 및 방법
JP6087056B2 (ja) * 2012-01-06 2017-03-01 アジレント・テクノロジーズ・インクＡｇｉｌｅｎｔ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． 誘導結合プラズマｍｓ／ｍｓ型質量分析装置
JP5759036B2 (ja) * 2014-03-06 2015-08-05 株式会社日立ハイテクノロジーズ 質量分析装置
JP2015204418A (ja) 2014-04-15 2015-11-16 株式会社東芝 プラズマ処理装置及びプラズマ処理方法
WO2015159714A1 (ja) * 2014-04-16 2015-10-22 株式会社日立ハイテクノロジーズ 質量分析装置および質量分析装置に用いられるカートリッジ
JP6518505B2 (ja) * 2015-05-12 2019-05-22 株式会社日立ハイテクノロジーズ プラズマ処理装置およびプラズマ処理方法
US9824941B2 (en) * 2015-11-17 2017-11-21 Lam Research Corporation Systems and methods for detection of plasma instability by electrical measurement
JP6505027B2 (ja) 2016-01-04 2019-04-24 株式会社日立ハイテクノロジーズ 試料の離脱方法およびプラズマ処理装置
JP6703425B2 (ja) * 2016-03-23 2020-06-03 株式会社栗田製作所 プラズマ処理方法及びプラズマ処理装置
JP6888455B2 (ja) * 2017-07-21 2021-06-16 三菱ケミカル株式会社 ガスバリア性プラスチック容器の製造方法
KR102023705B1 (ko) * 2018-01-30 2019-09-20 한국기계연구원 공정 모니터링을 위한 플라즈마 반응기
KR102046637B1 (ko) * 2018-01-30 2019-11-19 한국기계연구원 공정 모니터링을 위한 플라즈마 반응기
CN115039516B (zh) * 2020-03-31 2024-01-02 Atonarp株式会社 等离子体生成装置
JP7343944B2 (ja) * 2021-01-29 2023-09-13 アトナープ株式会社 ガス分析装置および制御方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006049922A (ja) 2005-08-24 2006-02-16 Ulvac Japan Ltd エッチング装置
JP2011249289A (ja) 2010-05-31 2011-12-08 Toyota Technological Institute 浮遊電極を持つ誘導結合型マイクロプラズマ源
JP2013161694A (ja) 2012-02-07 2013-08-19 Toyota Gakuen 浮遊電極の一部がガス流路内部に面している誘導結合型マイクロプラズマ源
JP2015162267A (ja) 2014-02-26 2015-09-07 学校法人トヨタ学園 浮遊電極がシールドされた誘導結合型マイクロプラズマ源
US20190011400A1 (en) 2017-07-07 2019-01-10 Teknoscan Systems Inc. Polarization dielectric discharge source for ims instrument

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Publication number Publication date
CN115039516A (zh) 2022-09-09
JP7602266B2 (ja) 2024-12-18
WO2021200773A1 (ja) 2021-10-07
JPWO2021200773A1 (https=) 2021-10-07
JP2022075719A (ja) 2022-05-18
KR102724709B1 (ko) 2024-10-30
TW202139286A (zh) 2021-10-16
US20240258092A1 (en) 2024-08-01
CN115039516B (zh) 2024-01-02
JP2025032173A (ja) 2025-03-11
US20230187195A1 (en) 2023-06-15
EP4132228A4 (en) 2024-05-15
US11996278B2 (en) 2024-05-28
KR20220123459A (ko) 2022-09-06
US12400849B2 (en) 2025-08-26
EP4132228A1 (en) 2023-02-08
TWI865755B (zh) 2024-12-11

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