JP7023808B2 - Ｅｕｖ光学ユニットを有する計測システム - Google Patents

Ｅｕｖ光学ユニットを有する計測システム Download PDF

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Publication number
JP7023808B2
JP7023808B2 JP2018128123A JP2018128123A JP7023808B2 JP 7023808 B2 JP7023808 B2 JP 7023808B2 JP 2018128123 A JP2018128123 A JP 2018128123A JP 2018128123 A JP2018128123 A JP 2018128123A JP 7023808 B2 JP7023808 B2 JP 7023808B2
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Prior art keywords
euv
filter
measurement system
pupil
grayscale
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Japanese (ja)
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JP2019015967A (ja
Inventor
ヘルヴェク ディルク
ミュラー シュテファン
ゲールケ ラルフ
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/205—Neutral density filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Optical Filters (AREA)
JP2018128123A 2017-07-05 2018-07-05 Ｅｕｖ光学ユニットを有する計測システム Active JP7023808B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102017211443.6 2017-07-05
DE102017211443.6A DE102017211443A1 (de) 2017-07-05 2017-07-05 Metrologiesystem mit einer EUV-Optik

Related Child Applications (1)

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JP2020117695A Division JP7216684B2 (ja) 2017-07-05 2020-07-08 Ｅｕｖ光学ユニットを有する計測システム

Publications (2)

Publication Number Publication Date
JP2019015967A JP2019015967A (ja) 2019-01-31
JP7023808B2 true JP7023808B2 (ja) 2022-02-22

Family

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JP2018128123A Active JP7023808B2 (ja) 2017-07-05 2018-07-05 Ｅｕｖ光学ユニットを有する計測システム
JP2020117695A Active JP7216684B2 (ja) 2017-07-05 2020-07-08 Ｅｕｖ光学ユニットを有する計測システム

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US (1) US10948637B2 (https=)
JP (2) JP7023808B2 (https=)
DE (1) DE102017211443A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019206648B4 (de) * 2019-05-08 2021-12-09 Carl Zeiss Smt Gmbh Verfahren zur Annäherung von Abbildungseigenschaften eines optischen Produktionssystems an diejenigen eines optischen Messsystems sowie Metrologiesystem hierfür
DE102019206651B4 (de) * 2019-05-08 2022-10-13 Carl Zeiss Smt Gmbh Verfahren zum dreidimensionalen Bestimmen eines Luftbildes einer Lithographiemaske
DE102019208552B4 (de) 2019-06-12 2025-10-09 Carl Zeiss Smt Gmbh Verfahren zum Ermitteln eines Produktions-Luftbildes eines zu vermessenden Objektes
KR102866527B1 (ko) 2020-11-26 2025-10-01 삼성전자주식회사 극자외선 발생 장치와 이의 제조 방법, 및 극자외선 시스템
DE102024205353A1 (de) * 2024-06-10 2025-12-11 Carl Zeiss Smt Gmbh Filter zum Trennen von EUV-Nutzlicht von mit dem EUV-Nutzlicht mitgeführtem Falschlicht und/oder mitgeführten Partikeln

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012522358A (ja) 2009-03-27 2012-09-20 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィ用の照明光学系、この種の照明光学系用のｅｕｖ減衰器、及びこの種の照明光学系を有する照明系及び投影露光装置

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63140530A (ja) 1986-08-01 1988-06-13 Fujitsu Ltd Ｘ線マスク
JPH02260414A (ja) * 1989-03-30 1990-10-23 Fujitsu Ltd Ｘ線露光マスク
EP0952491A3 (en) 1998-04-21 2001-05-09 Asm Lithography B.V. Lithography apparatus
US6404499B1 (en) * 1998-04-21 2002-06-11 Asml Netherlands B.V. Lithography apparatus with filters for optimizing uniformity of an image
DE10220816A1 (de) 2002-05-10 2003-11-20 Zeiss Carl Microelectronic Sys Reflektives Röntgenmikroskop und Inspektionssystem zur Untersuchung von Objekten mit Wellenlängen 100 nm
DE10220815A1 (de) 2002-05-10 2003-11-20 Zeiss Carl Microelectronic Sys Reflektives Röntgenmikroskop und Inspektionssystem zur Untersuchung von Objekten mit Wellenlängen 100 nm
JP2006073620A (ja) 2004-08-31 2006-03-16 Nikon Corp Ｅｕｖ露光装置
US7224430B2 (en) * 2004-10-29 2007-05-29 Asml Netherlands B.V. Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby
JP2008066345A (ja) 2006-09-04 2008-03-21 Nikon Corp 照明光学装置及び露光装置
JP5269079B2 (ja) 2007-08-20 2013-08-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射コーティングを備えたミラー要素を有する投影対物系
DE102008041436A1 (de) 2007-10-02 2009-04-09 Carl Zeiss Smt Ag Optisches Membranelement
DE102008021833B4 (de) 2007-12-19 2010-04-22 Carl Zeiss Smt Ag Verfahren zur Einstellung einer Beleuchtungswinkelverteilung und gleichzeitig einer Intensitätsverteilung über ein in ein Bildfeld abzubildendes Objektfeld
CN102395923B (zh) * 2009-04-13 2014-05-07 Asml控股股份有限公司 借助傅里叶滤光和图像比较的掩模检查
DE102010029049B4 (de) 2010-05-18 2014-03-13 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Metrologiesystem für die Untersuchung eines Objekts mit EUV-Beleuchtungslicht sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
US8842272B2 (en) 2011-01-11 2014-09-23 Kla-Tencor Corporation Apparatus for EUV imaging and methods of using same
WO2012125647A2 (en) * 2011-03-16 2012-09-20 Kla-Tencor Corporation Euv actinic reticle inspection system using imaging sensor with thin film spectral purity filter coating
JP2013026424A (ja) * 2011-07-21 2013-02-04 Renesas Electronics Corp 半導体装置の製造方法
JP2013080810A (ja) 2011-10-04 2013-05-02 Lasertec Corp Ｅｕｖマスク検査装置及びｅｕｖマスク検査方法
DE102012202057B4 (de) * 2012-02-10 2021-07-08 Carl Zeiss Smt Gmbh Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement
DE102012204295A1 (de) * 2012-03-19 2013-03-28 Carl Zeiss Smt Gmbh Filterelement
DE102012207866A1 (de) 2012-05-11 2013-11-14 Carl Zeiss Smt Gmbh Baugruppe für eine Projektionsbelichtungsanlage für die EUV-Projektionslithografie
JP5711703B2 (ja) 2012-09-03 2015-05-07 信越化学工業株式会社 Ｅｕｖ用ペリクル
DE102013202948A1 (de) * 2013-02-22 2014-09-11 Carl Zeiss Smt Gmbh Beleuchtungssystem für eine EUV-Lithographievorrichtung und Facettenspiegel dafür
DE102013217146A1 (de) 2013-08-28 2015-03-05 Carl Zeiss Smt Gmbh Optisches Bauelement
TWI646401B (zh) * 2013-12-19 2019-01-01 美商應用材料股份有限公司 帶有簡化光學元件的極紫外線（ｅｕｖ）基板檢查系統及其製造方法
US9958770B2 (en) * 2014-04-17 2018-05-01 Industry-University Cooperation Foundation Hanyang University Pellicle for EUV lithography
KR101882633B1 (ko) 2014-07-22 2018-07-26 칼 짜이스 에스엠티 게엠베하 리소그래피 마스크의 3d 에어리얼 이미지를 3차원으로 측정하는 방법
KR102242562B1 (ko) * 2014-09-04 2021-04-20 삼성전자주식회사 극자외선(euv) 마스크 보호장치 및 그 보호장치를 포함한 euv 노광 장치
DE102015221209A1 (de) * 2015-10-29 2017-05-04 Carl Zeiss Smt Gmbh Optische Baugruppe mit einem Schutzelement und optische Anordnung damit
JP6371022B1 (ja) * 2018-02-08 2018-08-08 レーザーテック株式会社 照明方法、検査方法、照明装置及び検査装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012522358A (ja) 2009-03-27 2012-09-20 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィ用の照明光学系、この種の照明光学系用のｅｕｖ減衰器、及びこの種の照明光学系を有する照明系及び投影露光装置

Also Published As

Publication number Publication date
US10948637B2 (en) 2021-03-16
JP2019015967A (ja) 2019-01-31
DE102017211443A1 (de) 2019-01-10
US20190011615A1 (en) 2019-01-10
JP2020197715A (ja) 2020-12-10
JP7216684B2 (ja) 2023-02-01

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