JP6986317B2 - マスクユニット及び露光装置 - Google Patents

マスクユニット及び露光装置 Download PDF

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Publication number
JP6986317B2
JP6986317B2 JP2017233853A JP2017233853A JP6986317B2 JP 6986317 B2 JP6986317 B2 JP 6986317B2 JP 2017233853 A JP2017233853 A JP 2017233853A JP 2017233853 A JP2017233853 A JP 2017233853A JP 6986317 B2 JP6986317 B2 JP 6986317B2
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JP
Japan
Prior art keywords
mask
edge
transparent plate
film
film mask
Prior art date
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Active
Application number
JP2017233853A
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English (en)
Japanese (ja)
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JP2019101306A (ja
Inventor
淳 名古屋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Engineering Co Ltd
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Adtec Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Engineering Co Ltd filed Critical Adtec Engineering Co Ltd
Priority to JP2017233853A priority Critical patent/JP6986317B2/ja
Priority to TW111136667A priority patent/TWI812492B/zh
Priority to TW107140995A priority patent/TWI782139B/zh
Priority to KR1020180153624A priority patent/KR102691639B1/ko
Priority to CN201811477894.8A priority patent/CN110018609B/zh
Publication of JP2019101306A publication Critical patent/JP2019101306A/ja
Priority to JP2021192035A priority patent/JP7091544B2/ja
Priority to JP2021192039A priority patent/JP7196269B2/ja
Application granted granted Critical
Publication of JP6986317B2 publication Critical patent/JP6986317B2/ja
Active legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2017233853A 2017-12-05 2017-12-05 マスクユニット及び露光装置 Active JP6986317B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2017233853A JP6986317B2 (ja) 2017-12-05 2017-12-05 マスクユニット及び露光装置
TW111136667A TWI812492B (zh) 2017-12-05 2018-11-19 薄膜光罩交換方法及光罩維護程式
TW107140995A TWI782139B (zh) 2017-12-05 2018-11-19 光罩單元及曝光裝置
KR1020180153624A KR102691639B1 (ko) 2017-12-05 2018-12-03 마스크 유닛 및 노광 장치
CN201811477894.8A CN110018609B (zh) 2017-12-05 2018-12-05 掩模单元及曝光装置
JP2021192035A JP7091544B2 (ja) 2017-12-05 2021-11-26 露光装置におけるフィルムマスク交換方法
JP2021192039A JP7196269B2 (ja) 2017-12-05 2021-11-26 マスクメンテナンスプログラム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017233853A JP6986317B2 (ja) 2017-12-05 2017-12-05 マスクユニット及び露光装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2021192039A Division JP7196269B2 (ja) 2017-12-05 2021-11-26 マスクメンテナンスプログラム
JP2021192035A Division JP7091544B2 (ja) 2017-12-05 2021-11-26 露光装置におけるフィルムマスク交換方法

Publications (2)

Publication Number Publication Date
JP2019101306A JP2019101306A (ja) 2019-06-24
JP6986317B2 true JP6986317B2 (ja) 2021-12-22

Family

ID=66847702

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017233853A Active JP6986317B2 (ja) 2017-12-05 2017-12-05 マスクユニット及び露光装置

Country Status (4)

Country Link
JP (1) JP6986317B2 (zh)
KR (1) KR102691639B1 (zh)
CN (1) CN110018609B (zh)
TW (2) TWI812492B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112462575A (zh) * 2019-09-06 2021-03-09 台湾恒基股份有限公司 光刻制程的方法及其板材定位装置
CN113885298B (zh) * 2021-09-22 2022-06-17 哈尔滨工业大学 一种磁悬浮式光刻机掩模台
KR102473207B1 (ko) * 2022-09-06 2022-11-30 정동훈 노광장치용 기판 마스크 배치 장치

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0221652U (zh) * 1988-07-29 1990-02-14
JPH0627674A (ja) * 1992-04-07 1994-02-04 Adtec Eng:Kk 露光装置
JPH10161320A (ja) * 1996-11-28 1998-06-19 Sanee Giken Kk 露光装置
JPH1130851A (ja) 1997-07-10 1999-02-02 Nec Toyama Ltd フォトマスク用フィルム並びにフォトマスク及びその製造方法
KR20020071841A (ko) * 1999-09-01 2002-09-13 산에이 기껜 가부시키가이샤 노광장치의 기판 지지대
JP2004271952A (ja) * 2003-03-10 2004-09-30 Semiconductor Leading Edge Technologies Inc ガス置換機構及びガス置換方法
KR100578262B1 (ko) * 2003-11-13 2006-05-11 주식회사 디엠에스 진공을 이용한 대면적 마스크 고정장치 및 그를 이용한노광장치와 노광방법
JP2005300753A (ja) * 2004-04-08 2005-10-27 Toray Eng Co Ltd プロキシミティ露光装置
JP5057647B2 (ja) * 2004-07-02 2012-10-24 東京エレクトロン株式会社 半導体装置の製造方法および半導体装置の製造装置
KR100671658B1 (ko) * 2005-01-05 2007-01-19 삼성에스디아이 주식회사 마스크 프레임 및 이를 사용한 마스크 고정방법
GB0620955D0 (en) * 2006-10-20 2006-11-29 Speakman Stuart P Methods and apparatus for the manufacture of microstructures
US7807001B2 (en) * 2007-06-28 2010-10-05 Eastman Kodak Company Lamination device method for flexographic plate manufacturing
JP2009157249A (ja) * 2007-12-27 2009-07-16 Orc Mfg Co Ltd 露光装置
KR100946996B1 (ko) * 2008-06-27 2010-03-10 한양대학교 산학협력단 마스크 밀착장치 및 이를 구비한 노광 장비
JP5163401B2 (ja) * 2008-09-29 2013-03-13 ウシオ電機株式会社 光照射装置のマスク保持手段
JP2009009166A (ja) * 2008-10-14 2009-01-15 Toray Eng Co Ltd プロキシミティ露光装置
JP5126091B2 (ja) * 2009-02-02 2013-01-23 ウシオ電機株式会社 ワークステージ及び該ワークステージを使用した露光装置
JP5472616B2 (ja) * 2010-01-27 2014-04-16 ウシオ電機株式会社 光照射装置
KR101402861B1 (ko) * 2012-06-01 2014-06-02 (주)세명백트론 노광용 마스크 스테이지와 그 마스크 스테이지를 이용한 노광장치 및 노광방법
JP2014092768A (ja) * 2012-11-07 2014-05-19 Adtec Engineeng Co Ltd 吸着プレート
CN103092007B (zh) * 2013-02-06 2015-06-17 京东方科技集团股份有限公司 曝光机掩膜版安装装置
KR20160064923A (ko) * 2014-11-28 2016-06-08 삼성전자주식회사 펠리클 및 이를 포함하는 노광마스크

Also Published As

Publication number Publication date
JP2019101306A (ja) 2019-06-24
TWI812492B (zh) 2023-08-11
CN110018609B (zh) 2024-03-26
TW201937271A (zh) 2019-09-16
TW202305501A (zh) 2023-02-01
CN110018609A (zh) 2019-07-16
KR20190066584A (ko) 2019-06-13
KR102691639B1 (ko) 2024-08-05
TWI782139B (zh) 2022-11-01

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