JP6797951B2 - パワー半導体モジュール装置及びその製造方法 - Google Patents
パワー半導体モジュール装置及びその製造方法 Download PDFInfo
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- JP6797951B2 JP6797951B2 JP2019012161A JP2019012161A JP6797951B2 JP 6797951 B2 JP6797951 B2 JP 6797951B2 JP 2019012161 A JP2019012161 A JP 2019012161A JP 2019012161 A JP2019012161 A JP 2019012161A JP 6797951 B2 JP6797951 B2 JP 6797951B2
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- contact element
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- metallization layer
- power semiconductor
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- Engineering & Computer Science (AREA)
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- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
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- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
また、本願は以下に記載する態様を含む。
(態様1)
側壁及びカバーを含むハウジング(40)と、
前記ハウジング(40)内に配置された基板(10)であって、前記基板(10)は、誘電絶縁層(11)と、前記誘電絶縁層(11)の第1の側に配置された第1のメタライゼーション層(111)と、前記誘電絶縁層(11)の第2の側に配置された第2のメタライゼーション層(112)と、を含み、前記誘電絶縁層(11)は、前記第1のメタライゼーション層(111)と前記第2のメタライゼーション層(112)との間に配置される、前記基板(10)と、
前記第1のメタライゼーション層(111)の、前記誘電絶縁層(11)と反対側の第1の面にマウントされた少なくとも1つの半導体ボディ(20)と、
前記第1のメタライゼーション層(111)の前記第1の面に配置されて電気的に接続されている接続素子(32)と、
前記接続素子(32)に挿入されて電気的に接続されている接点素子(30)であって、前記接点素子(30)は、前記接続素子(32)から、前記ハウジング(40)の内部を通り抜け、前記ハウジング(40)の前記カバーにある開口を通り抜け、前記ハウジング(40)の外側へ、前記第1の面に垂直な方向に延びる、前記接点素子(30)と、
前記第1のメタライゼーション層(111)に隣接して配置され、前記ハウジング(40)の内部の少なくとも一部に充填される硬質カプセル封じ(60)と、
を含むパワー半導体モジュール装置。
(態様2)
前記硬質カプセル封じ(60)は、硬度が少なくとも40ショアA、少なくとも60ショアA、又は少なくとも50ショアDである、態様1に記載のパワー半導体モジュール装置。
(態様3)
前記硬質カプセル封じ(60)は、ゴム、ポリウレタン、及びプラスチックのうちの少なくとも1つを含む、態様1又は2に記載のパワー半導体モジュール装置。
(態様4)
前記接点素子(30)は、前記基板(10)と前記ハウジング(40)の前記カバーとの間で、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第1の長さ(x1)を有し、
前記硬質カプセル封じ(60)は、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第1の厚さ(x2)を有し、
前記硬質カプセル封じ(60)の前記第1の厚さ(x2)は、前記接点素子(30)の前記第1の長さ(x1)の20%から80%、又は前記接点素子(30)の前記第1の長さ(x1)の40%から60%である、
態様1〜3のいずれか一項に記載のパワー半導体モジュール装置。
(態様5)
前記接点素子(30)は、前記基板(10)と前記ハウジング(40)の前記カバーとの間で、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第1の長さ(x1)を有し、
前記硬質カプセル封じ(60)は、前記接点素子(30)を中心とする半径(r)以内の領域において、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第1の厚さ(x2)を有し、
前記硬質カプセル封じ(60)は、前記接点素子(30)を中心とする前記半径(r)の領域の外側の領域において、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第2の厚さ(x3)を有し、
前記第1の厚さ(x2)は前記第2の厚さ(x3)より厚い、
態様1〜3のいずれか一項に記載のパワー半導体モジュール装置。
(態様6)
前記硬質カプセル封じ(60)の前記第1の厚さ(x2)は、前記接点素子(30)の前記第1の長さ(x1)の20%から80%、又は前記接点素子(30)の前記第1の長さ(x1)の40%から60%であり、
前記硬質カプセル封じ(60)の前記第2の厚さ(x3)は、前記接点素子(30)の前記第1の長さ(x1)の10%から60%、又は20%から40%である、
態様5に記載のパワー半導体モジュール装置。
(態様7)
前記硬質カプセル封じ(60)は、腐食性ガスに対する障壁を与えるように構成されている、態様1〜6のいずれか一項に記載のパワー半導体モジュール装置。
(態様8)
前記硬質カプセル封じ(60)は、酸素透過係数が10 −10 未満、又は10 −12 未満である、態様7に記載のパワー半導体モジュール装置。
(態様9)
前記硬質カプセル封じ(60)は、前記硬質カプセル封じ(60)の中に均一に分布する充填材を含む、態様1〜8のいずれか一項に記載のパワー半導体モジュール装置。
(態様10)
前記充填材は、Al 2 O 3 、SiO 2 、及び不活性多孔質プラスチックボディのうちの少なくとも1つを含む、態様9に記載のパワー半導体モジュール装置。
(態様11)
前記接続素子(32)は、前記接点素子(30)の第1の端部をぴったり覆って包み込むように構成された管状部分を含む、態様1〜10のいずれか一項に記載のパワー半導体モジュール装置。
(態様12)
前記接点素子(30)は、その第1の端部に圧入ピンを含み、
前記接続素子(32)は、前記接点素子(30)の前記圧入ピンに対応する相手側部品を含み、
前記接点素子(30)の前記第1の端部と前記接続素子(32)は、前記接点素子(30)が前記接続素子(32)に挿入された場合に圧入接続を形成する、
態様11に記載のパワー半導体モジュール装置。
(態様13)
パワー半導体モジュール装置の製造方法であって、前記パワー半導体モジュール装置は、基板(10)と、少なくとも1つの半導体ボディ(20)と、接続素子(32)と、接点素子(30)とを含み、前記基板(10)は、誘電絶縁層(11)と、前記誘電絶縁層(11)の第1の側に配置された第1のメタライゼーション層(111)と、前記誘電絶縁層(11)の第2の側に配置された第2のメタライゼーション層(112)と、を含み、前記誘電絶縁層(11)は、前記第1のメタライゼーション層(111)と前記第2のメタライゼーション層(112)との間に配置され、前記少なくとも1つの半導体ボディ(20)は、前記第1のメタライゼーション層(111)の、前記誘電絶縁層(11)と反対側の第1の面にマウントされ、前記接続素子(32)は、前記第1のメタライゼーション層(111)の前記第1の面に配置されて電気的に接続され、前記接点素子(30)は、前記接続素子(32)に挿入されて電気的に接続されているものであり、
壁(42)を含むハウジング(40)の中に前記基板(10)を配置するステップと、
前記ハウジング(40)の前記壁(42)と前記基板(10)とで形成される容量空間の少なくとも一部にカプセル封じ材料(62)を充填するステップと、
前記カプセル封じ材料(62)を硬化させて硬質カプセル封じ(60)を形成するステップと、
前記ハウジング(40)を閉じるステップであって、前記接点素子(30)は、前記接続素子(32)から、前記ハウジング(40)の内部を通り抜け、前記ハウジング(40)のカバーにある開口を通り抜け、前記ハウジング(40)の外側へ、前記第1の面に垂直な方向に延びる、前記閉じるステップと、
を含む方法。
(態様14)
前記カプセル封じ材料(62)は、液体を含み、稠度が液状稠度、粘性稠度、又はゲル状稠度であり、前記カプセル封じ材料(62)を硬化させるステップは、前記液体の一部又は全てを前記カプセル封じ材料(62)から除去することを含む、態様13に記載の方法。
(態様15)
前記ハウジング(40)を閉じるステップは、
前記ハウジングをカバー(44)で閉じること、又は、
前記ハウジング(40)のカバーにある開口を閉じること
を含む、
態様13又は14に記載の方法。
11 誘電絶縁層
111 第1のメタライゼーション層
112 第2のメタライゼーション層
20 半導体ボディ
30 接点素子
32 接続素子
40 ハウジング
42 壁
44 カバー
50 プリント回路基板
51 開口
60 硬質カプセル封じ
62 カプセル封じ材料
Claims (13)
- 側壁及びカバーを含むハウジング(40)と、
前記ハウジング(40)内に配置された基板(10)であって、前記基板(10)は、誘電絶縁層(11)と、前記誘電絶縁層(11)の第1の側に配置された第1のメタライゼーション層(111)と、前記誘電絶縁層(11)の第2の側に配置された第2のメタライゼーション層(112)と、を含み、前記誘電絶縁層(11)は、前記第1のメタライゼーション層(111)と前記第2のメタライゼーション層(112)との間に配置される、前記基板(10)と、
前記第1のメタライゼーション層(111)の、前記誘電絶縁層(11)と反対側の第1の面にマウントされた少なくとも1つの半導体ボディ(20)と、
前記第1のメタライゼーション層(111)の前記第1の面に配置されて電気的に接続されている接続素子(32)と、
前記接続素子(32)に挿入されて電気的に接続されている接点素子(30)であって、前記接点素子(30)は、前記接続素子(32)から、前記ハウジング(40)の内部を通り抜け、前記ハウジング(40)の前記カバーにある開口を通り抜け、前記ハウジング(40)の外側へ、前記第1の面に垂直な方向に延びる、前記接点素子(30)と、
前記第1のメタライゼーション層(111)に隣接して配置され、前記ハウジング(40)の内部の少なくとも一部に充填される硬質カプセル封じ(60)と、
を含み、
前記接点素子(30)は、前記基板(10)と前記ハウジング(40)の前記カバーとの間で、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第1の長さ(x1)を有し、
前記硬質カプセル封じ(60)は、前記接点素子(30)を中心とする半径(r)以内の領域において、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第1の厚さ(x2)を有し、
前記硬質カプセル封じ(60)は、前記接点素子(30)を中心とする前記半径(r)の領域の外側の領域において、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第2の厚さ(x3)を有し、
前記第1の厚さ(x2)は前記第2の厚さ(x3)より厚い、パワー半導体モジュール装置。 - 前記硬質カプセル封じ(60)は、硬度が少なくとも40ショアA、少なくとも60ショアA、又は少なくとも50ショアDである、請求項1に記載のパワー半導体モジュール装置。
- 前記硬質カプセル封じ(60)は、ゴム、ポリウレタン、及びプラスチックのうちの少なくとも1つを含む、請求項1又は2に記載のパワー半導体モジュール装置。
- 前記硬質カプセル封じ(60)の前記第1の厚さ(x2)は、前記接点素子(30)の前記第1の長さ(x1)の20%から80%、又は前記接点素子(30)の前記第1の長さ(x1)の40%から60%であり、
前記硬質カプセル封じ(60)の前記第2の厚さ(x3)は、前記接点素子(30)の前記第1の長さ(x1)の10%から60%、又は20%から40%である、
請求項1に記載のパワー半導体モジュール装置。 - 前記硬質カプセル封じ(60)は、腐食性ガスに対する障壁を与えるように構成されている、請求項1から4のいずれか一項に記載のパワー半導体モジュール装置。
- 前記硬質カプセル封じ(60)は、酸素透過係数が10−10未満、又は10−12未満である、請求項5に記載のパワー半導体モジュール装置。
- 前記硬質カプセル封じ(60)は、前記硬質カプセル封じ(60)の中に均一に分布する充填材を含む、請求項1から6のいずれか一項に記載のパワー半導体モジュール装置。
- 前記充填材は、Al2O3、SiO2、及び不活性多孔質プラスチックボディのうちの少なくとも1つを含む、請求項7に記載のパワー半導体モジュール装置。
- 前記接続素子(32)は、前記接点素子(30)の第1の端部をぴったり覆って包み込むように構成された管状部分を含む、請求項1から8のいずれか一項に記載のパワー半導体モジュール装置。
- 前記接点素子(30)は、その第1の端部に圧入ピンを含み、
前記接続素子(32)は、前記接点素子(30)の前記圧入ピンに対応する相手側部品を含み、
前記接点素子(30)の前記第1の端部と前記接続素子(32)は、前記接点素子(30)が前記接続素子(32)に挿入された場合に圧入接続を形成する、
請求項9に記載のパワー半導体モジュール装置。 - パワー半導体モジュール装置の製造方法であって、前記パワー半導体モジュール装置は、基板(10)と、少なくとも1つの半導体ボディ(20)と、接続素子(32)と、接点素子(30)とを含み、前記基板(10)は、誘電絶縁層(11)と、前記誘電絶縁層(11)の第1の側に配置された第1のメタライゼーション層(111)と、前記誘電絶縁層(11)の第2の側に配置された第2のメタライゼーション層(112)と、を含み、前記誘電絶縁層(11)は、前記第1のメタライゼーション層(111)と前記第2のメタライゼーション層(112)との間に配置され、前記少なくとも1つの半導体ボディ(20)は、前記第1のメタライゼーション層(111)の、前記誘電絶縁層(11)と反対側の第1の面にマウントされ、前記接続素子(32)は、前記第1のメタライゼーション層(111)の前記第1の面に配置されて電気的に接続され、前記接点素子(30)は、前記接続素子(32)に挿入されて電気的に接続されているものであり、
壁(42)を含むハウジング(40)の中に前記基板(10)を配置するステップと、
前記ハウジング(40)の前記壁(42)と前記基板(10)とで形成される容量空間の少なくとも一部にカプセル封じ材料(62)を充填するステップと、
前記カプセル封じ材料(62)を硬化させて硬質カプセル封じ(60)を形成するステップと、
前記ハウジング(40)を閉じるステップであって、前記接点素子(30)は、前記接続素子(32)から、前記ハウジング(40)の内部を通り抜け、前記ハウジング(40)のカバーにある開口を通り抜け、前記ハウジング(40)の外側へ、前記第1の面に垂直な方向に延びる、前記閉じるステップと、
を含み、
前記接点素子(30)は、前記基板(10)と前記ハウジング(40)の前記カバーとの間で、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第1の長さ(x1)を有し、
前記硬質カプセル封じ(60)は、前記接点素子(30)を中心とする半径(r)以内の領域において、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第1の厚さ(x2)を有し、
前記硬質カプセル封じ(60)は、前記接点素子(30)を中心とする前記半径(r)の領域の外側の領域において、前記第1のメタライゼーション層(111)の前記第1の面に垂直な方向に第2の厚さ(x3)を有し、
前記第1の厚さ(x2)は前記第2の厚さ(x3)より厚い、方法。 - 前記カプセル封じ材料(62)は、液体を含み、稠度が液状稠度、粘性稠度、又はゲル状稠度であり、前記カプセル封じ材料(62)を硬化させるステップは、前記液体の一部又は全てを前記カプセル封じ材料(62)から除去することを含む、請求項11に記載の方法。
- 前記ハウジング(40)を閉じるステップは、
前記ハウジングをカバー(44)で閉じること、又は、
前記ハウジング(40)のカバーにある開口を閉じること
を含む、
請求項11又は12に記載の方法。
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- 2018-01-30 EP EP24171908.7A patent/EP4401126A3/en active Pending
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US20210335682A1 (en) | 2021-10-28 |
EP4401126A2 (en) | 2024-07-17 |
JP2019153782A (ja) | 2019-09-12 |
US20190237372A1 (en) | 2019-08-01 |
US11557522B2 (en) | 2023-01-17 |
CN110098159A (zh) | 2019-08-06 |
US11081414B2 (en) | 2021-08-03 |
EP4401126A3 (en) | 2024-09-25 |
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