JP6723648B2 - 位置検出装置及び位置検出方法 - Google Patents
位置検出装置及び位置検出方法 Download PDFInfo
- Publication number
- JP6723648B2 JP6723648B2 JP2016146855A JP2016146855A JP6723648B2 JP 6723648 B2 JP6723648 B2 JP 6723648B2 JP 2016146855 A JP2016146855 A JP 2016146855A JP 2016146855 A JP2016146855 A JP 2016146855A JP 6723648 B2 JP6723648 B2 JP 6723648B2
- Authority
- JP
- Japan
- Prior art keywords
- image
- substrate
- corner
- imaging
- supported
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0095—Detecting means for copy material, e.g. for detecting or sensing presence of copy material or its leading or trailing end
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016146855A JP6723648B2 (ja) | 2016-07-27 | 2016-07-27 | 位置検出装置及び位置検出方法 |
TW106123224A TWI681265B (zh) | 2016-07-27 | 2017-07-11 | 位置檢測裝置及位置檢測方法 |
KR1020170094735A KR102320369B1 (ko) | 2016-07-27 | 2017-07-26 | 위치검출장치 및 위치검출방법 |
CN201710621072.1A CN107662415B (zh) | 2016-07-27 | 2017-07-27 | 位置检测装置及位置检测方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016146855A JP6723648B2 (ja) | 2016-07-27 | 2016-07-27 | 位置検出装置及び位置検出方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018017562A JP2018017562A (ja) | 2018-02-01 |
JP6723648B2 true JP6723648B2 (ja) | 2020-07-15 |
Family
ID=61075700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016146855A Active JP6723648B2 (ja) | 2016-07-27 | 2016-07-27 | 位置検出装置及び位置検出方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6723648B2 (zh) |
KR (1) | KR102320369B1 (zh) |
CN (1) | CN107662415B (zh) |
TW (1) | TWI681265B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019196511A (ja) * | 2018-05-08 | 2019-11-14 | 住友重機械工業株式会社 | 板処理装置及び板処理方法 |
CN113791524A (zh) * | 2021-09-30 | 2021-12-14 | 深圳迈塔兰斯科技有限公司 | 用于超表面加工的光刻系统及方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4189820A (en) * | 1978-02-21 | 1980-02-26 | Slack Otto G | Template pattern alignment |
JPS6414917A (en) * | 1987-07-09 | 1989-01-19 | Canon Kk | Alignment accuracy measuring mark and measuring method for accuracy using the same |
JP2988680B2 (ja) * | 1990-02-13 | 1999-12-13 | 株式会社東芝 | 変位測定装置 |
JP2919994B2 (ja) * | 1991-04-08 | 1999-07-19 | 株式会社東芝 | 半導体装置 |
JP3352761B2 (ja) * | 1993-06-01 | 2002-12-03 | 武藤工業株式会社 | 画像データの位置変換方法 |
JP3849363B2 (ja) * | 1999-08-30 | 2006-11-22 | 松下電器産業株式会社 | 半導体チップのピックアップ方法 |
US6701197B2 (en) | 2000-11-08 | 2004-03-02 | Orbotech Ltd. | System and method for side to side registration in a printed circuit imager |
JP4768731B2 (ja) * | 2005-04-28 | 2011-09-07 | 東レエンジニアリング株式会社 | フリップチップ実装ずれ検査方法および実装装置 |
KR20100107019A (ko) * | 2008-03-31 | 2010-10-04 | 후지쯔 가부시끼가이샤 | 면형체의 얼라이먼트 장치, 제조 장치, 면형체의 얼라이먼트 방법 및 제조 방법 |
JP5374909B2 (ja) | 2008-04-10 | 2013-12-25 | 株式会社Ihi | マーキング装置 |
CN102198751A (zh) * | 2010-03-23 | 2011-09-28 | 株式会社东芝 | 喷墨图像形成装置和喷墨图像形成方法 |
JP2012049326A (ja) * | 2010-08-26 | 2012-03-08 | Nsk Technology Co Ltd | マスクの位置決め装置及びマスクの回転中心算出方法 |
JP5609513B2 (ja) | 2010-10-05 | 2014-10-22 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
JP5554228B2 (ja) * | 2010-12-28 | 2014-07-23 | 三星ダイヤモンド工業株式会社 | 基板加工方法 |
KR20160044587A (ko) * | 2011-07-27 | 2016-04-25 | 스미도모쥬기가이고교 가부시키가이샤 | 기판제조장치 및 기판제조방법 |
CN103029452B (zh) * | 2011-09-30 | 2014-12-24 | 北大方正集团有限公司 | 双面打印方法和装置 |
TWI421972B (zh) * | 2011-12-08 | 2014-01-01 | Metal Ind Res & Dev Ct | 無標記異空間基板組裝對位方法及系統 |
JP5907110B2 (ja) * | 2013-04-12 | 2016-04-20 | 信越化学工業株式会社 | スクリーン印刷方法及びスクリーン印刷装置 |
JP6351992B2 (ja) * | 2014-02-17 | 2018-07-04 | 株式会社Screenホールディングス | 変位検出装置、基板処理装置、変位検出方法および基板処理方法 |
-
2016
- 2016-07-27 JP JP2016146855A patent/JP6723648B2/ja active Active
-
2017
- 2017-07-11 TW TW106123224A patent/TWI681265B/zh active
- 2017-07-26 KR KR1020170094735A patent/KR102320369B1/ko active IP Right Grant
- 2017-07-27 CN CN201710621072.1A patent/CN107662415B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
KR20180012710A (ko) | 2018-02-06 |
CN107662415B (zh) | 2019-10-22 |
KR102320369B1 (ko) | 2021-11-01 |
TW201804266A (zh) | 2018-02-01 |
JP2018017562A (ja) | 2018-02-01 |
TWI681265B (zh) | 2020-01-01 |
CN107662415A (zh) | 2018-02-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8023112B2 (en) | Alignment apparatus and fabrication apparatus for planar member and alignment method and fabrication method for planar member | |
JP6862068B2 (ja) | 位置検出装置及び位置検出方法 | |
JP6278451B2 (ja) | マーキング装置およびパターン生成装置 | |
JP2014136216A (ja) | 印刷装置 | |
JP6723648B2 (ja) | 位置検出装置及び位置検出方法 | |
TW202018422A (zh) | 標記位置檢測裝置、描繪裝置以及標記位置檢測方法 | |
JP5728065B2 (ja) | レーザ加工機 | |
KR102034481B1 (ko) | 전자 부품의 실장 방법 및 실장 장치 | |
JP2015010900A (ja) | 位置合わせ装置、真空装置、位置合わせ方法 | |
JP2008171873A (ja) | 位置決め装置、位置決め方法、加工装置及び加工方法 | |
JP2007315882A (ja) | 基板位置決め装置、基板位置決め方法、カラーフィルタ製造装置、カラーフィルタ製造方法 | |
CN110453221B (zh) | 板处理装置及板处理方法 | |
WO2016147977A1 (ja) | 描画装置 | |
JP6085433B2 (ja) | 描画装置、露光描画装置、プログラム及び描画方法 | |
JP6313148B2 (ja) | マーキング装置 | |
JP2011181675A (ja) | 回路部品の実装装置 | |
JP2004281983A (ja) | 位置決め装置および位置決め方法並びに塗布装置および塗布方法 | |
JP6979312B2 (ja) | アライメントパターンの設定方法 | |
JP4960266B2 (ja) | 透明基板のエッジ位置検出方法及びエッジ位置検出装置 | |
JP5826087B2 (ja) | 転写方法および転写装置 | |
JP7349841B2 (ja) | チップの製造方法 | |
JP2010227962A (ja) | レーザ加工方法 | |
JP2009223447A (ja) | 加工装置 | |
JP2005116966A (ja) | 位置合わせ装置及び位置合わせ方法 | |
JP2010015234A (ja) | 工程処理装置および工程処理方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190122 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20191121 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20191203 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200130 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200623 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200623 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6723648 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |