JP6668506B2 - 重合体の連続製造装置および連続製造方法 - Google Patents
重合体の連続製造装置および連続製造方法 Download PDFInfo
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Description
図1は、本発明に係る重合体連続製造装置の一実施形態(以下、「実施形態1」という。)を示す部分断面図である。また、図3は、本発明に係る重合体連続製造装置において用いられる撹拌翼および仕切板の一実施形態を示す図である。以下、図1および図3に基づき、実施形態1の構成を説明する。
図4は、本発明に係る重合体連続製造装置の別の実施形態(以下、「実施形態2」という。)を示す部分断面図である。以下、図4に基づき、実施形態2の構成および動作を説明する。なお、説明の便宜上、上記実施形態にて説明した部材と同じ機能を有する部材については、同じ符号を付記し、その説明を繰り返さない。
本発明の第1の態様によれば、本発明に係る溶液重縮合による重合体の連続製造装置は、反応容器本体と、前記反応容器本体内を複数の反応槽に隔てる1以上の仕切板と、原料が供給される原料供給部と、を備え、前記1以上の仕切板のそれぞれは回転中心を有し、隣接する前記反応槽の気相部どうしおよび液相部どうしは連通しており、少なくとも1つの前記反応槽において生じた反応混合物が、各反応槽を順次移動するものである。
ポリマーの重量平均分子量(Mw)は、日本分光製のゲルパーミエーションクロマトグラフ(GPC)EXTREMAを用いて、以下の条件で測定した。重量平均分子量はポリスチレン換算値として算出した。
溶媒: LiBr0.01M NMP溶液
温度: 40℃
検出器: RI検出器
サンプル注入量: 100μl(濃度:1mg/1ml)、
流速: 1.0ml/分、
標準ポリスチレン: 427,000、96,400、37,900、17,400、及び5,560の5種類の標準ポリスチレン。
ポリマーの重量平均分子量(Mw)は、株式会社センシュー科学製の高温ゲルパーミエーションクロマトグラフ(GPC)SSC−7101を用いて、以下の条件で測定した。重量平均分子量はポリスチレン換算値として算出した。
溶媒: 1−クロロナフタレン、
温度: 210℃、
検出器: UV検出器(360nm)、
サンプル注入量: 200μl(濃度:0.05質量%)、
流速: 0.7ml/分、
標準ポリスチレン: 616,000、113,000、26,000、8,200、及び600の5種類の標準ポリスチレン。
反応容器本体が、10枚の円盤型仕切板により仕切られて形成された11個の反応槽を有する以外は、図4に示すのと同様の重合体連続製造装置を用いた。この重合体連続装置において、反応容器本体は、内径108mm×長さ300mmの寸法を有するチタン製反応装置であった。10枚の仕切板はいずれも同一形状であり、径5mmの回転軸上に設けられた。それぞれの仕切板について、反応混合物の移動方向の上流側の面に、図3に示されるように、2枚のアンカー型撹拌翼を十字に設けた。仕切板の直径は100mmであり、アンカー型撹拌翼の長手軸方向の長さaは90mmであり、短手軸方向の長さbは40mmであった。仕切板を設けた位置において、反応容器の内部空間の鉛直断面に対し、クリアランスの断面積が占める割合は、約14%であった。
反応混合物の移動方向の上流側から数えて第11番目の反応槽の底部に、副生塩を沈降分離するとともに副生塩を向流連続洗浄する洗浄部を設けた以外は、実施例1と同様の構造の重合体連続製造装置を用いた。
収容室が、9枚の円盤型仕切板により仕切られて形成された10個の反応槽を有する以外は、実施例1と同様の重合体連続製造装置を用いた。連続製造装置に、N−メチル−2−ピロリドン(NMP)1500gを仕込んだ後、反応混合物の移動方向の上流側から数えて第10番目の反応槽の下流側から窒素ガスを流しながら、収容室の底部に設置した外部ヒーターにより、上流側から数えて第3番目の反応槽の温度1を210℃、第5番目の反応槽の温度2を240℃、第9番目の反応槽の温度3を260℃、第10番目の反応槽の温度4を260℃に保持した。ここで、窒素ガスの流量は1NL/minであり、標準状態において、仕切板のクリアランスを通過する窒素ガス線速度は8cm/sであった。
PEEK0.1gおよび4−クロロフェノール10mLをオイルバスで180℃、20分間、加熱および撹拌して溶解させた。室温になるまで冷却したのち、該溶液3mLをo−ジクロロベンゼン7mLで希釈した。
35℃においてウベローデ粘度計で測定した。
溶媒の粘度(η0)を、オストワルド型粘度管を用いて測定した。調整した溶液の粘度(η)と溶媒の粘度(η0)から、比粘性率((η−η0)/η0)を求め、この比粘性率を、溶液の濃度(0.3g/dL)で割ることにより、還元粘度(dL/g)を求めた。
2、2a、2b、2c、2d 反応槽
3 回転駆動装置
4 回転軸
5、5a、5b、5c 撹拌翼
6、6a、6b、6c 仕切板
7 反応混合物
8 温度制御装置
9 供給ライン
10 反応混合物回収ライン
11 送気部
12 送気ライン
13 排気ライン
14 脱水部
15 溶媒回収ライン
16 蒸気回収ライン
17 気液分離部
18 気体回収ライン
19、24 反応原料分離回収部
20 廃ガスライン
21、26 反応原料再供給ライン
22、27 反応原料再供給部
23 液体回収ライン
25 廃水ライン
30a、30b 側壁
100、200 連続製造装置
Claims (13)
- 溶液重縮合による重合体の連続製造装置であって、
反応容器本体と、
前記反応容器本体内を複数の反応槽に隔てる1以上の仕切板と、
原料が供給される原料供給部と、反応混合物を回収する反応混合物回収部とを備え、
前記1以上の仕切板のそれぞれは、回転中心を有し、
隣接する前記反応槽の気相部どうしおよび液相部どうしは連通しており、
少なくとも1つの前記反応槽において生じた反応混合物が、各反応槽を順次移動し、
前記溶液重縮合が、脱塩重縮合である、連続製造装置。 - 前記回転中心が回転軸である、請求項1に記載の連続製造装置。
- 前記回転中心が、前記複数の反応槽にまたがる1つの回転軸であり、
前記1以上の仕切板が、前記1つの回転軸上に設けられている、請求項1または2に記載の連続製造装置。 - 前記仕切板と同じ回転中心を有する撹拌翼をさらに備える、請求項1〜3のいずれか1項に記載の連続製造装置。
- 前記撹拌翼が、前記仕切板に連結されている、請求項4に記載の連続製造装置。
- 前記反応容器本体の内壁と前記仕切板との間のクリアランス、および前記仕切板に設けられた開口部の少なくとも何れか一方により、隣接する前記反応槽の気相部どうしおよび液相部どうしが連通している、請求項1〜5のいずれか1項に記載の連続製造装置。
- 前記反応容器の内部空間の鉛直断面に占める、前記クリアランスまたは開口部の断面積の割合は、1〜50%である、請求項6に記載の連続製造装置。
- 前記クリアランスが、少なくとも前記反応容器本体の下部に存在する、請求項6に記載の連続製造装置。
- 前記反応容器本体における各反応槽の気相部と連通し、前記反応混合物の移動方向の下流側から上流側に向けて、前記気相部に不活性ガスを送り込む送気ラインと、
前記不活性ガスを排出する排気ラインと、
を更に備える、請求項1〜8のいずれか1項に記載の連続製造装置。 - 前記仕切板が、2以上設けられており、全て同一の形状である、請求項1〜9のいずれか1項に記載の連続製造装置。
- 水分を前記気相部から取り除く脱水部をさらに備える、請求項1〜10のいずれか1項に記載の連続製造装置。
- 請求項1に記載の連続製造装置を用いた、溶液重縮合による重合体の連続製造方法であって、
前記連続製造装置内の前記反応容器本体に、溶媒およびモノマーを供給する工程と、
少なくとも1つの反応槽において、前記溶媒中で前記モノマーの重合反応を行うことにより反応混合物を形成する工程と、
前記反応容器本体内の反応生成物の少なくとも一部を、前記反応容器本体から除去する工程と、
各反応槽に、前記反応混合物を順次移動させる工程と、
を並行して行い、
前記溶液重縮合が、脱塩重縮合である、重合体の連続製造方法。 - 水分を、前記気相部から取り除く、請求項12に記載の連続製造方法。
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