JP6590829B2 - マイクロリソグラフィ投影露光装置のミラー - Google Patents

マイクロリソグラフィ投影露光装置のミラー Download PDF

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Publication number
JP6590829B2
JP6590829B2 JP2016556940A JP2016556940A JP6590829B2 JP 6590829 B2 JP6590829 B2 JP 6590829B2 JP 2016556940 A JP2016556940 A JP 2016556940A JP 2016556940 A JP2016556940 A JP 2016556940A JP 6590829 B2 JP6590829 B2 JP 6590829B2
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Japan
Prior art keywords
layer
mirror
protective layer
effective surface
projection exposure
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JP2016556940A
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Japanese (ja)
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JP2017509920A (ja
JP2017509920A5 (enExample
Inventor
エンキッシュ ハルトムット
エンキッシュ ハルトムット
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2016556940A 2014-03-13 2015-02-19 マイクロリソグラフィ投影露光装置のミラー Active JP6590829B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014204660.2 2014-03-13
DE102014204660.2A DE102014204660A1 (de) 2014-03-13 2014-03-13 Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
PCT/EP2015/053471 WO2015135726A1 (en) 2014-03-13 2015-02-19 Mirror for a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2017509920A JP2017509920A (ja) 2017-04-06
JP2017509920A5 JP2017509920A5 (enExample) 2018-03-29
JP6590829B2 true JP6590829B2 (ja) 2019-10-16

Family

ID=52682669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016556940A Active JP6590829B2 (ja) 2014-03-13 2015-02-19 マイクロリソグラフィ投影露光装置のミラー

Country Status (7)

Country Link
US (1) US10061204B2 (enExample)
EP (1) EP3117257A1 (enExample)
JP (1) JP6590829B2 (enExample)
KR (1) KR102380961B1 (enExample)
DE (1) DE102014204660A1 (enExample)
TW (1) TWI659224B (enExample)
WO (1) WO2015135726A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015213253A1 (de) 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102016212361A1 (de) * 2016-07-06 2018-01-11 Carl Zeiss Smt Gmbh Optisches Gitter und optische Anordnung damit
DE102016212373A1 (de) * 2016-07-07 2018-01-11 Carl Zeiss Smt Gmbh Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102017200667A1 (de) * 2017-01-17 2018-07-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage oder ein Inspektionssystem
DE102017208302A1 (de) * 2017-05-17 2018-06-07 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Substrats und Substrat
WO2019003284A1 (ja) * 2017-06-26 2019-01-03 ギガフォトン株式会社 極端紫外光生成装置
NL2022644A (en) * 2018-03-05 2019-09-10 Asml Netherlands Bv Prolonging optical element lifetime in an euv lithography system
DE102021214366A1 (de) 2021-12-15 2023-06-15 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Vermeidung einer Degradation einer optischen Nutzoberfläche eines Spiegelmoduls, Projektionssystem, Beleuchtungssystem sowie Projektionsbelichtungsanlage

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10016008A1 (de) * 2000-03-31 2001-10-11 Zeiss Carl Villagensystem und dessen Herstellung
JP2003303756A (ja) * 2002-04-09 2003-10-24 Sony Corp 極短紫外光の反射体
JP2005268359A (ja) * 2004-03-17 2005-09-29 Nikon Corp ミラー及び照明光学装置
US7235801B2 (en) 2004-06-04 2007-06-26 Asml Netherlands B.V. Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing EUV reflection of a grazing incidence mirror, device manufacturing method and device manufactured thereby
DE102005017262B3 (de) * 2005-04-12 2006-10-12 Xtreme Technologies Gmbh Kollektorspiegel für plasmabasierte kurzwellige Strahlungsquellen
US8194322B2 (en) * 2007-04-23 2012-06-05 Nikon Corporation Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
NL2003299A (en) * 2008-08-28 2010-03-11 Asml Netherlands Bv Spectral purity filter and lithographic apparatus.
WO2012041697A1 (en) * 2010-09-27 2012-04-05 Carl Zeiss Smt Gmbh Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
DE102011075579A1 (de) * 2011-05-10 2012-11-15 Carl Zeiss Smt Gmbh Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel
DE102011083461A1 (de) * 2011-09-27 2013-03-28 Carl Zeiss Smt Gmbh Verfahren zum Erzeugen einer Deckschicht aus Siliziumoxid an einem EUV-Spiegel
DE102012202057B4 (de) * 2012-02-10 2021-07-08 Carl Zeiss Smt Gmbh Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement
DE102012202675A1 (de) 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik

Also Published As

Publication number Publication date
KR20160132392A (ko) 2016-11-18
EP3117257A1 (en) 2017-01-18
DE102014204660A1 (de) 2015-09-17
TWI659224B (zh) 2019-05-11
US10061204B2 (en) 2018-08-28
US20160377984A1 (en) 2016-12-29
TW201546478A (zh) 2015-12-16
WO2015135726A1 (en) 2015-09-17
JP2017509920A (ja) 2017-04-06
KR102380961B1 (ko) 2022-04-01

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