JP2017509920A5 - - Google Patents
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- Publication number
- JP2017509920A5 JP2017509920A5 JP2016556940A JP2016556940A JP2017509920A5 JP 2017509920 A5 JP2017509920 A5 JP 2017509920A5 JP 2016556940 A JP2016556940 A JP 2016556940A JP 2016556940 A JP2016556940 A JP 2016556940A JP 2017509920 A5 JP2017509920 A5 JP 2017509920A5
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- layer
- mirror according
- protective layer
- optically effective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims 20
- 239000011241 protective layer Substances 0.000 claims 13
- 239000000463 material Substances 0.000 claims 8
- 230000007704 transition Effects 0.000 claims 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 6
- 239000010955 niobium Substances 0.000 claims 6
- 230000000737 periodic effect Effects 0.000 claims 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 4
- 229910052750 molybdenum Inorganic materials 0.000 claims 4
- 239000011733 molybdenum Substances 0.000 claims 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 229910052790 beryllium Inorganic materials 0.000 claims 3
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims 3
- 229910052796 boron Inorganic materials 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 3
- 230000005670 electromagnetic radiation Effects 0.000 claims 3
- 229910052758 niobium Inorganic materials 0.000 claims 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 3
- 229910052757 nitrogen Inorganic materials 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 238000002310 reflectometry Methods 0.000 claims 3
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- 238000010521 absorption reaction Methods 0.000 claims 2
- 238000005286 illumination Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 239000010948 rhodium Substances 0.000 claims 2
- 229910052707 ruthenium Inorganic materials 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- 230000004888 barrier function Effects 0.000 claims 1
- 229910052747 lanthanoid Inorganic materials 0.000 claims 1
- 150000002602 lanthanoids Chemical class 0.000 claims 1
- 238000001393 microlithography Methods 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052703 rhodium Inorganic materials 0.000 claims 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014204660.2 | 2014-03-13 | ||
| DE102014204660.2A DE102014204660A1 (de) | 2014-03-13 | 2014-03-13 | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| PCT/EP2015/053471 WO2015135726A1 (en) | 2014-03-13 | 2015-02-19 | Mirror for a microlithographic projection exposure apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017509920A JP2017509920A (ja) | 2017-04-06 |
| JP2017509920A5 true JP2017509920A5 (enExample) | 2018-03-29 |
| JP6590829B2 JP6590829B2 (ja) | 2019-10-16 |
Family
ID=52682669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016556940A Active JP6590829B2 (ja) | 2014-03-13 | 2015-02-19 | マイクロリソグラフィ投影露光装置のミラー |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10061204B2 (enExample) |
| EP (1) | EP3117257A1 (enExample) |
| JP (1) | JP6590829B2 (enExample) |
| KR (1) | KR102380961B1 (enExample) |
| DE (1) | DE102014204660A1 (enExample) |
| TW (1) | TWI659224B (enExample) |
| WO (1) | WO2015135726A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015213253A1 (de) | 2015-07-15 | 2017-01-19 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| DE102016212361A1 (de) * | 2016-07-06 | 2018-01-11 | Carl Zeiss Smt Gmbh | Optisches Gitter und optische Anordnung damit |
| DE102016212373A1 (de) * | 2016-07-07 | 2018-01-11 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| DE102017200667A1 (de) * | 2017-01-17 | 2018-07-19 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage oder ein Inspektionssystem |
| DE102017208302A1 (de) * | 2017-05-17 | 2018-06-07 | Carl Zeiss Smt Gmbh | Verfahren zur Herstellung eines Substrats und Substrat |
| WO2019003284A1 (ja) * | 2017-06-26 | 2019-01-03 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| NL2022644A (en) * | 2018-03-05 | 2019-09-10 | Asml Netherlands Bv | Prolonging optical element lifetime in an euv lithography system |
| DE102021214366A1 (de) | 2021-12-15 | 2023-06-15 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zur Vermeidung einer Degradation einer optischen Nutzoberfläche eines Spiegelmoduls, Projektionssystem, Beleuchtungssystem sowie Projektionsbelichtungsanlage |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10016008A1 (de) * | 2000-03-31 | 2001-10-11 | Zeiss Carl | Villagensystem und dessen Herstellung |
| JP2003303756A (ja) * | 2002-04-09 | 2003-10-24 | Sony Corp | 極短紫外光の反射体 |
| JP2005268359A (ja) * | 2004-03-17 | 2005-09-29 | Nikon Corp | ミラー及び照明光学装置 |
| US7235801B2 (en) | 2004-06-04 | 2007-06-26 | Asml Netherlands B.V. | Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing EUV reflection of a grazing incidence mirror, device manufacturing method and device manufactured thereby |
| DE102005017262B3 (de) * | 2005-04-12 | 2006-10-12 | Xtreme Technologies Gmbh | Kollektorspiegel für plasmabasierte kurzwellige Strahlungsquellen |
| US8194322B2 (en) * | 2007-04-23 | 2012-06-05 | Nikon Corporation | Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror |
| NL2003299A (en) * | 2008-08-28 | 2010-03-11 | Asml Netherlands Bv | Spectral purity filter and lithographic apparatus. |
| WO2012041697A1 (en) * | 2010-09-27 | 2012-04-05 | Carl Zeiss Smt Gmbh | Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective |
| DE102011075579A1 (de) * | 2011-05-10 | 2012-11-15 | Carl Zeiss Smt Gmbh | Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel |
| DE102011083461A1 (de) * | 2011-09-27 | 2013-03-28 | Carl Zeiss Smt Gmbh | Verfahren zum Erzeugen einer Deckschicht aus Siliziumoxid an einem EUV-Spiegel |
| DE102012202057B4 (de) * | 2012-02-10 | 2021-07-08 | Carl Zeiss Smt Gmbh | Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement |
| DE102012202675A1 (de) | 2012-02-22 | 2013-01-31 | Carl Zeiss Smt Gmbh | Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik |
-
2014
- 2014-03-13 DE DE102014204660.2A patent/DE102014204660A1/de not_active Ceased
-
2015
- 2015-02-19 JP JP2016556940A patent/JP6590829B2/ja active Active
- 2015-02-19 KR KR1020167024835A patent/KR102380961B1/ko active Active
- 2015-02-19 EP EP15709856.7A patent/EP3117257A1/en not_active Withdrawn
- 2015-02-19 WO PCT/EP2015/053471 patent/WO2015135726A1/en not_active Ceased
- 2015-03-12 TW TW104107877A patent/TWI659224B/zh active
-
2016
- 2016-09-13 US US15/264,054 patent/US10061204B2/en active Active
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