JP6546391B2 - 多層膜反射鏡およびeuv光装置 - Google Patents
多層膜反射鏡およびeuv光装置 Download PDFInfo
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- JP6546391B2 JP6546391B2 JP2014243709A JP2014243709A JP6546391B2 JP 6546391 B2 JP6546391 B2 JP 6546391B2 JP 2014243709 A JP2014243709 A JP 2014243709A JP 2014243709 A JP2014243709 A JP 2014243709A JP 6546391 B2 JP6546391 B2 JP 6546391B2
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- multilayer film
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- euv light
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- 239000000463 material Substances 0.000 claims description 17
- 239000002245 particle Substances 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 6
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 89
- 238000004544 sputter deposition Methods 0.000 description 17
- 239000010955 niobium Substances 0.000 description 16
- 150000002500 ions Chemical class 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 229910016006 MoSi Inorganic materials 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910021332 silicide Inorganic materials 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910001182 Mo alloy Inorganic materials 0.000 description 2
- 229910001257 Nb alloy Inorganic materials 0.000 description 2
- -1 carbide Chemical compound 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 150000002822 niobium compounds Chemical class 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 238000012916 structural analysis Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000929 Ru alloy Inorganic materials 0.000 description 1
- 229910019895 RuSi Inorganic materials 0.000 description 1
- 229910006249 ZrSi Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000007170 pathology Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
Images
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
Claims (2)
- 基板上に重元素層と前記重元素層よりも密度の小さい材料からなる軽元素層とが交互に積層されたブラッグ回折効果を有するNb/Si多層膜を備え、
前記重元素層と前記軽元素層との間の中間層として、SiO2層が積層されている
多層膜反射鏡であって、
発生するEUV光の波長に基づいて選択された単元素もしくは化合物の固体、液体もし
くは気体に、粒子もしくは電磁波を照射することにより発生したEUV光を反射する
EUV光用多層膜反射鏡。 - 請求項1に記載のEUV光用多層膜反射鏡と、
発生するEUV光の波長に基づいて選択された単元素もしくは化合物の固体、液体もし
くは気体に、粒子もしくは電磁波を照射することによりEUV光を発生させる光源と
を有するEUV光装置。
Priority Applications (1)
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JP2014243709A JP6546391B2 (ja) | 2014-12-02 | 2014-12-02 | 多層膜反射鏡およびeuv光装置 |
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JP2014243709A JP6546391B2 (ja) | 2014-12-02 | 2014-12-02 | 多層膜反射鏡およびeuv光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016111035A JP2016111035A (ja) | 2016-06-20 |
JP6546391B2 true JP6546391B2 (ja) | 2019-07-17 |
Family
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JP2014243709A Active JP6546391B2 (ja) | 2014-12-02 | 2014-12-02 | 多層膜反射鏡およびeuv光装置 |
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JP (1) | JP6546391B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JPWO2023054145A1 (ja) * | 2021-09-30 | 2023-04-06 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09230098A (ja) * | 1996-02-21 | 1997-09-05 | Nippon Telegr & Teleph Corp <Ntt> | 多層膜x線反射鏡 |
JP2002277589A (ja) * | 2001-03-16 | 2002-09-25 | Japan Atom Energy Res Inst | Mo/Si多層膜及びその耐熱性を向上させる方法 |
JP2011007501A (ja) * | 2009-06-23 | 2011-01-13 | Canon Inc | 多層膜ミラー |
JP2011175107A (ja) * | 2010-02-24 | 2011-09-08 | Sony Corp | 光学素子および光学機器 |
JP2012009537A (ja) * | 2010-06-23 | 2012-01-12 | Dainippon Printing Co Ltd | 反射型マスクブランクス、反射型マスク、反射型マスクブランクスの製造方法、および、反射型マスクの製造方法 |
JP5196507B2 (ja) * | 2011-01-05 | 2013-05-15 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及び多層膜反射鏡 |
CN102621815B (zh) * | 2011-01-26 | 2016-12-21 | Asml荷兰有限公司 | 用于光刻设备的反射光学部件及器件制造方法 |
KR101993322B1 (ko) * | 2011-09-28 | 2019-06-26 | 호야 가부시키가이샤 | 마스크블랭크용 유리기판, 다층 반사막 부착 기판, 마스크블랭크 및 마스크, 그리고 그것들의 제조방법 |
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- 2014-12-02 JP JP2014243709A patent/JP6546391B2/ja active Active
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