JP6578489B2 - カーボン薄膜、それを製造するプラズマ装置および製造方法 - Google Patents

カーボン薄膜、それを製造するプラズマ装置および製造方法 Download PDF

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Publication number
JP6578489B2
JP6578489B2 JP2016538266A JP2016538266A JP6578489B2 JP 6578489 B2 JP6578489 B2 JP 6578489B2 JP 2016538266 A JP2016538266 A JP 2016538266A JP 2016538266 A JP2016538266 A JP 2016538266A JP 6578489 B2 JP6578489 B2 JP 6578489B2
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Prior art keywords
carbon
cathode member
arc
substrate
discharge
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Japanese (ja)
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JPWO2016017438A1 (ja
Inventor
加藤 健治
健治 加藤
高橋 正人
正人 高橋
西村 和也
和也 西村
浩 石塚
浩 石塚
森口 秀樹
秀樹 森口
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Nippon ITF Inc
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Nippon ITF Inc
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/05Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
JP2016538266A 2014-07-28 2015-07-16 カーボン薄膜、それを製造するプラズマ装置および製造方法 Active JP6578489B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014152626 2014-07-28
JP2014152626 2014-07-28
PCT/JP2015/070413 WO2016017438A1 (ja) 2014-07-28 2015-07-16 カーボン薄膜、それを製造するプラズマ装置および製造方法

Publications (2)

Publication Number Publication Date
JPWO2016017438A1 JPWO2016017438A1 (ja) 2017-06-08
JP6578489B2 true JP6578489B2 (ja) 2019-09-25

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JP2016538266A Active JP6578489B2 (ja) 2014-07-28 2015-07-16 カーボン薄膜、それを製造するプラズマ装置および製造方法

Country Status (3)

Country Link
JP (1) JP6578489B2 (zh)
CN (1) CN106661715B (zh)
WO (1) WO2016017438A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH715878A1 (de) 2019-02-26 2020-08-31 Oerlikon Surface Solutions Ag Pfaeffikon Magnetanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen.
CN115418610A (zh) * 2022-09-01 2022-12-02 深圳市商德先进陶瓷股份有限公司 陶瓷劈刀及其制备方法和应用

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3214891B2 (ja) * 1992-05-15 2001-10-02 日本特殊陶業株式会社 ダイヤモンド類被覆部材
JPH06240451A (ja) * 1993-02-18 1994-08-30 Seiko Instr Inc 硬質炭素膜被覆部材の製造方法
JPH10130865A (ja) * 1996-09-06 1998-05-19 Sanyo Electric Co Ltd 硬質炭素被膜基板及びその形成方法
EP1067210A3 (en) * 1996-09-06 2002-11-13 Sanyo Electric Co., Ltd. Method for providing a hard carbon film on a substrate and electric shaver blade
JP4251738B2 (ja) * 1998-12-25 2009-04-08 住友電気工業株式会社 硬質被膜及び被覆部材
EP2000560B1 (en) * 1999-07-08 2013-10-02 Sumitomo Electric Industries, Ltd Hard coating and coated member
JP2002256414A (ja) * 2001-03-06 2002-09-11 Mitsubishi Heavy Ind Ltd 硬質炭素膜被覆材およびその製造方法
JP2014133912A (ja) * 2013-01-09 2014-07-24 Nissin Electric Co Ltd プラズマ装置およびそれを用いたカーボン薄膜の製造方法
WO2014115733A1 (ja) * 2013-01-22 2014-07-31 日新電機株式会社 プラズマ装置、それを用いたカーボン薄膜の製造方法およびコーティング方法
JP5669117B2 (ja) * 2013-11-05 2015-02-12 国立大学法人豊橋技術科学大学 Dlc膜の製造方法

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Publication number Publication date
JPWO2016017438A1 (ja) 2017-06-08
CN106661715A (zh) 2017-05-10
CN106661715B (zh) 2019-11-19
WO2016017438A1 (ja) 2016-02-04

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