JP6560670B2 - 特にマイクロリソグラフィ投影露光装置のミラー - Google Patents

特にマイクロリソグラフィ投影露光装置のミラー Download PDF

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Publication number
JP6560670B2
JP6560670B2 JP2016532276A JP2016532276A JP6560670B2 JP 6560670 B2 JP6560670 B2 JP 6560670B2 JP 2016532276 A JP2016532276 A JP 2016532276A JP 2016532276 A JP2016532276 A JP 2016532276A JP 6560670 B2 JP6560670 B2 JP 6560670B2
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Japan
Prior art keywords
mirror
layer
gallium nitride
nitride
projection exposure
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JP2016532276A
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English (en)
Japanese (ja)
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JP2016531319A5 (enExample
JP2016531319A (ja
Inventor
ハーマン マルティン
ハーマン マルティン
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
JP2016532276A 2013-08-07 2014-06-25 特にマイクロリソグラフィ投影露光装置のミラー Active JP6560670B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013215541.7A DE102013215541A1 (de) 2013-08-07 2013-08-07 Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102013215541.7 2013-08-07
PCT/EP2014/063349 WO2015018560A2 (de) 2013-08-07 2014-06-25 Spiegel, insbesondere für eine mikrolithographische projektionsbelichtungsanlage

Publications (3)

Publication Number Publication Date
JP2016531319A JP2016531319A (ja) 2016-10-06
JP2016531319A5 JP2016531319A5 (enExample) 2017-08-03
JP6560670B2 true JP6560670B2 (ja) 2019-08-14

Family

ID=51178880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016532276A Active JP6560670B2 (ja) 2013-08-07 2014-06-25 特にマイクロリソグラフィ投影露光装置のミラー

Country Status (7)

Country Link
US (1) US10310382B2 (enExample)
EP (1) EP3030936B1 (enExample)
JP (1) JP6560670B2 (enExample)
KR (1) KR102265041B1 (enExample)
CN (1) CN105518532B (enExample)
DE (1) DE102013215541A1 (enExample)
WO (1) WO2015018560A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015213253A1 (de) * 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
CN109070459B (zh) * 2016-05-12 2021-08-20 惠普发展公司，有限责任合伙企业 经由打印试剂施加的温度修正
DE102016213831A1 (de) * 2016-07-27 2018-02-01 Carl Zeiss Smt Gmbh Reflektives optisches Element für die EUV-Lithographie
DE102016224113A1 (de) * 2016-12-05 2018-06-07 Carl Zeiss Smt Gmbh Intensitätsanpassungsfilter für die euv - mikrolithographie und verfahren zur herstellung desselben sowie beleuchtungssystem mit einem entsprechenden filter
DE102018211499A1 (de) 2018-07-11 2020-01-16 Carl Zeiss Smt Gmbh Reflektives optisches Element und Verfahren zum Herstellen eines reflektiven optischen Elements

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US4870648A (en) * 1987-08-07 1989-09-26 The United States Department Of Energy X-ray beamsplitter
JPH04164291A (ja) 1990-10-29 1992-06-09 Toshiba Corp 原子炉用制御棒
JPH04164297A (ja) * 1990-10-29 1992-06-09 Seiko Instr Inc Ｘ線反射鏡
JPH06109907A (ja) * 1992-09-25 1994-04-22 Asahi Glass Co Ltd 高精度光学反射鏡
JPH06308294A (ja) * 1993-04-28 1994-11-04 Kyocera Corp Ｘ線反射用ミラー
JPH0868897A (ja) * 1994-08-29 1996-03-12 Nikon Corp 反射鏡およびその製造方法
JPH1073705A (ja) * 1996-08-30 1998-03-17 Mitsubishi Materials Corp 反射鏡
JPH11326598A (ja) * 1998-05-08 1999-11-26 Nikon Corp 反射鏡およびその製造方法
US6377655B1 (en) 1998-05-08 2002-04-23 Nikon Corporation Reflective mirror for soft x-ray exposure apparatus
US6778404B1 (en) * 2000-06-02 2004-08-17 Micron Technology Inc Stackable ball grid array
US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
US6710351B2 (en) * 2001-09-18 2004-03-23 Euv, Llc EUV mirror based absolute incident flux detector
US20080004332A1 (en) * 2002-03-07 2008-01-03 Alkon Daniel L Methods for alzheimer's disease treatment and cognitive enhancement
JP3919599B2 (ja) * 2002-05-17 2007-05-30 キヤノン株式会社 光学素子、当該光学素子を有する光源装置及び露光装置
JP2004177587A (ja) * 2002-11-26 2004-06-24 Taiheiyo Cement Corp 低熱膨張ミラーおよびその製造方法
DE102004002757A1 (de) * 2004-01-20 2005-08-11 U-L-M Photonics Gmbh Aluminiumhaltiger Verbundhalbleiter und Verfahren zur Herstellung eines aluminiumhaltigen Verbundhalbleiters
US7193228B2 (en) * 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
JP4460325B2 (ja) * 2004-02-20 2010-05-12 太平洋セメント株式会社 天体望遠鏡用ミラー
JP4926523B2 (ja) * 2006-03-31 2012-05-09 Ｈｏｙａ株式会社 反射型マスクブランクス及び反射型マスク並びに半導体装置の製造方法
CN1900745B (zh) * 2006-07-07 2011-02-09 南京大学 用于紫外探测器的高反射率分布布拉格反射镜结构和生长方法
JP5269079B2 (ja) * 2007-08-20 2013-08-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射コーティングを備えたミラー要素を有する投影対物系
JP2010031660A (ja) * 2008-07-25 2010-02-12 Honda Motor Co Ltd インバータ発電機
CN102150218B (zh) * 2008-09-12 2014-04-16 旭硝子株式会社 Euvl用光学部件的平滑化方法及光学面平滑化后的euvl用光学部件
DE102009040785A1 (de) 2009-09-09 2011-03-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung
JP2011108942A (ja) 2009-11-19 2011-06-02 Renesas Electronics Corp 反射型露光用マスク、反射型露光用マスクの製造方法、および、半導体装置の製造方法
DE102011079933A1 (de) 2010-08-19 2012-02-23 Carl Zeiss Smt Gmbh Optisches Element für die UV- oder EUV-Lithographie
EP2606141A2 (en) * 2010-08-20 2013-06-26 Zuchem, Inc. Activated sugars
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US9377695B2 (en) * 2011-02-24 2016-06-28 Asml Netherlands B.V. Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device
EP2689427B1 (en) 2011-03-23 2017-05-03 Carl Zeiss SMT GmbH Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
JP2012222349A (ja) * 2011-04-05 2012-11-12 Asml Netherlands Bv 多層ミラーおよびリソグラフィ装置
US9488760B2 (en) * 2013-02-28 2016-11-08 Corning Incorporated Enhanced, durable silver coating stacks for highly reflective mirrors

Also Published As

Publication number Publication date
KR20160040560A (ko) 2016-04-14
DE102013215541A1 (de) 2015-02-12
EP3030936A2 (de) 2016-06-15
KR102265041B1 (ko) 2021-06-16
US20160154317A1 (en) 2016-06-02
EP3030936B1 (de) 2019-02-27
WO2015018560A2 (de) 2015-02-12
CN105518532B (zh) 2018-10-09
WO2015018560A3 (de) 2015-04-09
US10310382B2 (en) 2019-06-04
CN105518532A (zh) 2016-04-20
JP2016531319A (ja) 2016-10-06

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