JP6552383B2 - 自動化されたtem試料調製 - Google Patents
自動化されたtem試料調製 Download PDFInfo
- Publication number
- JP6552383B2 JP6552383B2 JP2015215353A JP2015215353A JP6552383B2 JP 6552383 B2 JP6552383 B2 JP 6552383B2 JP 2015215353 A JP2015215353 A JP 2015215353A JP 2015215353 A JP2015215353 A JP 2015215353A JP 6552383 B2 JP6552383 B2 JP 6552383B2
- Authority
- JP
- Japan
- Prior art keywords
- probe
- sample
- image
- tip
- charged particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 0 *CC1C*CCC1 Chemical compound *CC1C*CCC1 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/285—Emission microscopes, e.g. field-emission microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/31—Electron-beam or ion-beam tubes for localised treatment of objects for cutting or drilling
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
- G01N2001/2873—Cutting or cleaving
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/208—Elements or methods for movement independent of sample stage for influencing or moving or contacting or transferring the sample or parts thereof, e.g. prober needles or transfer needles in FIB/SEM systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3174—Etching microareas
- H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Sampling And Sample Adjustment (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462077148P | 2014-11-07 | 2014-11-07 | |
| US62/077,148 | 2014-11-07 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016105077A JP2016105077A (ja) | 2016-06-09 |
| JP2016105077A5 JP2016105077A5 (enExample) | 2018-12-13 |
| JP6552383B2 true JP6552383B2 (ja) | 2019-07-31 |
Family
ID=54476768
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015215353A Active JP6552383B2 (ja) | 2014-11-07 | 2015-11-01 | 自動化されたtem試料調製 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US9601313B2 (enExample) |
| EP (1) | EP3018693B1 (enExample) |
| JP (1) | JP6552383B2 (enExample) |
| KR (1) | KR101970478B1 (enExample) |
| CN (1) | CN105588742A (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102383571B1 (ko) * | 2014-06-30 | 2022-04-06 | 가부시키가이샤 히다치 하이테크 사이언스 | 자동 시료 제작 장치 |
| JP6552383B2 (ja) * | 2014-11-07 | 2019-07-31 | エフ・イ−・アイ・カンパニー | 自動化されたtem試料調製 |
| US9837246B1 (en) | 2016-07-22 | 2017-12-05 | Fei Company | Reinforced sample for transmission electron microscope |
| JP7113613B2 (ja) | 2016-12-21 | 2022-08-05 | エフ イー アイ カンパニ | 欠陥分析 |
| JP6931214B2 (ja) * | 2017-01-19 | 2021-09-01 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
| JP6885576B2 (ja) * | 2017-01-19 | 2021-06-16 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
| DE102017202339B3 (de) | 2017-02-14 | 2018-05-24 | Carl Zeiss Microscopy Gmbh | Strahlsystem mit geladenen Teilchen und Verfahren dafür |
| US10303829B2 (en) | 2017-05-31 | 2019-05-28 | International Business Machines Corporation | Automated method for integrated analysis of back end of the line yield, line resistance/capacitance and process performance |
| DE102017212020B3 (de) | 2017-07-13 | 2018-05-30 | Carl Zeiss Microscopy Gmbh | Verfahren zur In-situ-Präparation und zum Transfer mikroskopischer Proben, Computerprogrammprodukt sowie mikroskopische Probe |
| JP7109051B2 (ja) * | 2018-03-30 | 2022-07-29 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
| DE102018108974B3 (de) | 2018-04-16 | 2019-05-09 | Carl Zeiss Microscopy Gmbh | Verfahren zum Herstellen einer TEM-Probe |
| DE102018206278A1 (de) | 2018-04-24 | 2019-10-24 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Entfernen eines Partikels von einer photolithographischen Maske |
| DE102018010436B4 (de) | 2018-06-21 | 2025-01-23 | Carl Zeiss Smt Gmbh | Vorrichtung zum Untersuchen und/oder zum Bearbeiten einer Probe |
| DE102018210098B4 (de) | 2018-06-21 | 2022-02-03 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zum Untersuchen und/oder zum Bearbeiten einer Probe |
| CN109011030B (zh) * | 2018-08-08 | 2021-02-09 | 长沙理工大学 | 自动注射仪器针头的位置检测矫正方法及装置 |
| CN110514679B (zh) * | 2019-09-16 | 2021-04-30 | 南京大学 | 一种带有活动拉曼针尖探头的透射电镜原位反应舱芯片及其使用方法 |
| US11355305B2 (en) * | 2019-10-08 | 2022-06-07 | Fei Company | Low keV ion beam image restoration by machine learning for object localization |
| CN110554063B (zh) * | 2019-10-21 | 2021-10-12 | 长江存储科技有限责任公司 | 一种tem样品以及制备tem样品的方法 |
| CN111537533B (zh) * | 2020-03-24 | 2023-06-30 | 天津华慧芯科技集团有限公司 | 一种尖晶石微米颗粒的球差矫正tem样品制备方法 |
| DE102020112220B9 (de) * | 2020-05-06 | 2022-05-25 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlgerät zum Abtragen mindestens eines Materials von einer Materialeinheit und Anordnen des Materials an einem Objekt |
| GB202013591D0 (en) * | 2020-08-28 | 2020-10-14 | Oxford Instr Nanotechnology Ltd | Sample preparation and method aparatus |
| EP4068333A1 (en) * | 2021-03-31 | 2022-10-05 | FEI Company | Sample carrier for use in a charged particle microscope, and a method of using such a sample carrier in a charged particle microscope |
| DE102021205001B4 (de) * | 2021-05-18 | 2023-07-27 | Carl Zeiss Microscopy Gmbh | Verfahren zum Positionieren von Objekten in einem Teilchenstrahlmikroskop mithilfe einer flexiblen Teilchenstrahlschranke sowie Computerprogrammprodukt |
| CN114858828A (zh) * | 2022-02-23 | 2022-08-05 | 厦门士兰集科微电子有限公司 | 透射电子显微镜样品的制备方法 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0542524Y2 (enExample) * | 1987-11-18 | 1993-10-26 | ||
| JPH03230696A (ja) * | 1990-02-05 | 1991-10-14 | Nec Corp | 移動体速度検知装置 |
| JP2774884B2 (ja) * | 1991-08-22 | 1998-07-09 | 株式会社日立製作所 | 試料の分離方法及びこの分離方法で得た分離試料の分析方法 |
| JP3613039B2 (ja) * | 1998-12-02 | 2005-01-26 | 株式会社日立製作所 | 試料作製装置 |
| US6405584B1 (en) * | 1999-10-05 | 2002-06-18 | Agere Systems Guardian Corp. | Probe for scanning probe microscopy and related methods |
| WO2002095378A1 (en) * | 2000-05-22 | 2002-11-28 | Moore Thomas M | Method for sample separation and lift-out |
| EP1425729B1 (en) | 2001-08-23 | 2014-06-11 | Fei Company | Graphical automated machine control and metrology |
| JP2003156539A (ja) * | 2001-11-26 | 2003-05-30 | Hitachi Ltd | 評価装置および評価方法 |
| KR100984608B1 (ko) * | 2003-09-23 | 2010-09-30 | 지벡스 인스투르먼츠, 엘엘시 | 집속 이온빔으로 준비한 샘플을 파지하는 파지 요소를 사용한 현미경 검사 방법, 시스템 및 장치 |
| JP2005147671A (ja) * | 2003-11-11 | 2005-06-09 | Hitachi Ltd | 荷電粒子線調整方法および装置 |
| JP4130798B2 (ja) * | 2003-12-05 | 2008-08-06 | 株式会社日立ハイテクノロジーズ | プローブ付き複合顕微鏡及びプローブ駆動方法 |
| US20090138995A1 (en) * | 2005-06-16 | 2009-05-28 | Kelly Thomas F | Atom probe component treatments |
| JP2007018935A (ja) * | 2005-07-08 | 2007-01-25 | Hitachi High-Technologies Corp | プローブ付き顕微鏡及びプローブ接触方法 |
| EP2095134B1 (en) * | 2006-10-20 | 2017-02-22 | FEI Company | Method and apparatus for sample extraction and handling |
| JP5959139B2 (ja) | 2006-10-20 | 2016-08-02 | エフ・イ−・アイ・カンパニー | S/temのサンプルを分析する方法 |
| JP2008210732A (ja) * | 2007-02-28 | 2008-09-11 | Hitachi High-Technologies Corp | 荷電粒子ビーム装置 |
| US7834315B2 (en) * | 2007-04-23 | 2010-11-16 | Omniprobe, Inc. | Method for STEM sample inspection in a charged particle beam instrument |
| JP5537058B2 (ja) * | 2009-03-30 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | 試料作製装置、及び試料作製装置における制御方法 |
| JP5537653B2 (ja) * | 2010-04-16 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | イオンビーム装置およびイオンビーム加工方法 |
| WO2013082496A1 (en) * | 2011-12-01 | 2013-06-06 | Fei Company | High throughput tem preparation processes and hardware for backside thinning of cross-sectional view lamella |
| US10465293B2 (en) * | 2012-08-31 | 2019-11-05 | Fei Company | Dose-based end-pointing for low-kV FIB milling TEM sample preparation |
| KR102383571B1 (ko) * | 2014-06-30 | 2022-04-06 | 가부시키가이샤 히다치 하이테크 사이언스 | 자동 시료 제작 장치 |
| JP6552383B2 (ja) * | 2014-11-07 | 2019-07-31 | エフ・イ−・アイ・カンパニー | 自動化されたtem試料調製 |
-
2015
- 2015-11-01 JP JP2015215353A patent/JP6552383B2/ja active Active
- 2015-11-04 EP EP15192862.9A patent/EP3018693B1/en active Active
- 2015-11-06 US US14/934,837 patent/US9601313B2/en active Active
- 2015-11-06 CN CN201510749549.5A patent/CN105588742A/zh active Pending
- 2015-11-06 KR KR1020150155516A patent/KR101970478B1/ko active Active
-
2017
- 2017-03-20 US US15/464,307 patent/US10340119B2/en active Active
-
2019
- 2019-05-13 US US16/410,774 patent/US10825651B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR101970478B1 (ko) | 2019-04-19 |
| EP3018693B1 (en) | 2018-12-26 |
| US20160141147A1 (en) | 2016-05-19 |
| KR20160055076A (ko) | 2016-05-17 |
| US9601313B2 (en) | 2017-03-21 |
| US20190272975A1 (en) | 2019-09-05 |
| US20170256380A1 (en) | 2017-09-07 |
| CN105588742A (zh) | 2016-05-18 |
| EP3018693A1 (en) | 2016-05-11 |
| US10340119B2 (en) | 2019-07-02 |
| US10825651B2 (en) | 2020-11-03 |
| JP2016105077A (ja) | 2016-06-09 |
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